JPS55110251A - Production of resist image - Google Patents

Production of resist image

Info

Publication number
JPS55110251A
JPS55110251A JP1722479A JP1722479A JPS55110251A JP S55110251 A JPS55110251 A JP S55110251A JP 1722479 A JP1722479 A JP 1722479A JP 1722479 A JP1722479 A JP 1722479A JP S55110251 A JPS55110251 A JP S55110251A
Authority
JP
Japan
Prior art keywords
substrate
photosensitive resin
film
resist image
negative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1722479A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0440704B2 (https=
Inventor
Isamu Yoshiura
Mitsuhiro Seki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Somar Corp
Original Assignee
Somar Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Somar Corp filed Critical Somar Corp
Priority to JP1722479A priority Critical patent/JPS55110251A/ja
Publication of JPS55110251A publication Critical patent/JPS55110251A/ja
Publication of JPH0440704B2 publication Critical patent/JPH0440704B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP1722479A 1979-02-19 1979-02-19 Production of resist image Granted JPS55110251A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1722479A JPS55110251A (en) 1979-02-19 1979-02-19 Production of resist image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1722479A JPS55110251A (en) 1979-02-19 1979-02-19 Production of resist image

Publications (2)

Publication Number Publication Date
JPS55110251A true JPS55110251A (en) 1980-08-25
JPH0440704B2 JPH0440704B2 (https=) 1992-07-03

Family

ID=11937972

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1722479A Granted JPS55110251A (en) 1979-02-19 1979-02-19 Production of resist image

Country Status (1)

Country Link
JP (1) JPS55110251A (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4988608A (https=) * 1972-12-15 1974-08-24
JPS5211402U (https=) * 1975-07-14 1977-01-26
JPS53104306A (en) * 1977-02-23 1978-09-11 Kansai Paint Co Ltd Photosensitive resin plate for thick film screen print
JPS5412908A (en) * 1977-06-27 1979-01-31 Nippon Electric Co Screen for printing thick film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4988608A (https=) * 1972-12-15 1974-08-24
JPS5211402U (https=) * 1975-07-14 1977-01-26
JPS53104306A (en) * 1977-02-23 1978-09-11 Kansai Paint Co Ltd Photosensitive resin plate for thick film screen print
JPS5412908A (en) * 1977-06-27 1979-01-31 Nippon Electric Co Screen for printing thick film

Also Published As

Publication number Publication date
JPH0440704B2 (https=) 1992-07-03

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