JPS55109300A - Evaluation of insb single crystal - Google Patents

Evaluation of insb single crystal

Info

Publication number
JPS55109300A
JPS55109300A JP1388579A JP1388579A JPS55109300A JP S55109300 A JPS55109300 A JP S55109300A JP 1388579 A JP1388579 A JP 1388579A JP 1388579 A JP1388579 A JP 1388579A JP S55109300 A JPS55109300 A JP S55109300A
Authority
JP
Japan
Prior art keywords
crystal
bands
grown
insb
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1388579A
Other languages
Japanese (ja)
Inventor
Kazutaka Terajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP1388579A priority Critical patent/JPS55109300A/en
Publication of JPS55109300A publication Critical patent/JPS55109300A/en
Pending legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To make it possible to grow a crystal for observing grown bands within the routine of the actual production of devices, by employing as a dope an impurity which does not affect the carrier concentration.
CONSTITUTION: In growing an InSb crystal by a pulling method, InP or InS is added as a dope and the crystal is pulled in the direction of (211). Then, the crystal is cut across (111) surface, parallel to the direction of the pulling. The cut-off surface is mirror-finished, washed with water and then etched, forming grown bands. The InSb single crystal is evaluated by observation of the bunds. In the above etching treatment, a simple etching solution of a HF-H2O2-H2O system can give satisfactory grown bands.
COPYRIGHT: (C)1980,JPO&Japio
JP1388579A 1979-02-09 1979-02-09 Evaluation of insb single crystal Pending JPS55109300A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1388579A JPS55109300A (en) 1979-02-09 1979-02-09 Evaluation of insb single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1388579A JPS55109300A (en) 1979-02-09 1979-02-09 Evaluation of insb single crystal

Publications (1)

Publication Number Publication Date
JPS55109300A true JPS55109300A (en) 1980-08-22

Family

ID=11845649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1388579A Pending JPS55109300A (en) 1979-02-09 1979-02-09 Evaluation of insb single crystal

Country Status (1)

Country Link
JP (1) JPS55109300A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0297500A (en) * 1988-10-05 1990-04-10 Sumitomo Electric Ind Ltd Gaas single crystal specular wafer and its production
CN102154705A (en) * 2011-03-15 2011-08-17 上海大学 Preparation method of indium antimonide nanocrystal
CN108166060A (en) * 2017-12-25 2018-06-15 云南北方昆物光电科技发展有限公司 A kind of indium antimonide<211>The preparation method of direction monocrystalline
CN108166061A (en) * 2017-12-25 2018-06-15 云南北方昆物光电科技发展有限公司 A kind of method for reducing Insb Single Crystals dislocation
CN109280978A (en) * 2018-11-29 2019-01-29 云南北方昆物光电科技发展有限公司 A kind of preparation method of low dislocation indium antimonide<111>direction monocrystalline

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0297500A (en) * 1988-10-05 1990-04-10 Sumitomo Electric Ind Ltd Gaas single crystal specular wafer and its production
CN102154705A (en) * 2011-03-15 2011-08-17 上海大学 Preparation method of indium antimonide nanocrystal
CN108166060A (en) * 2017-12-25 2018-06-15 云南北方昆物光电科技发展有限公司 A kind of indium antimonide<211>The preparation method of direction monocrystalline
CN108166061A (en) * 2017-12-25 2018-06-15 云南北方昆物光电科技发展有限公司 A kind of method for reducing Insb Single Crystals dislocation
CN109280978A (en) * 2018-11-29 2019-01-29 云南北方昆物光电科技发展有限公司 A kind of preparation method of low dislocation indium antimonide<111>direction monocrystalline

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