JPS55108988A - Production of magnetic detector - Google Patents
Production of magnetic detectorInfo
- Publication number
- JPS55108988A JPS55108988A JP1666779A JP1666779A JPS55108988A JP S55108988 A JPS55108988 A JP S55108988A JP 1666779 A JP1666779 A JP 1666779A JP 1666779 A JP1666779 A JP 1666779A JP S55108988 A JPS55108988 A JP S55108988A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- insulating film
- detector
- film
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To produce a thin film magnetic detector with steps cancelled, by causing a soft magnetic material thin film and an insulating film to adhere to the substrate after removing a conductor thin film on the substrate with masking and by causing the second insulating film to adhere to the substrate after forming a detector from with masking.
CONSTITUTION: Insulating film 3 and conductor thin film 1 are caused to adhere to a magnetic garnet by evaporation, and resistor pattern 2 is used as a mask to remove thin film 1 by dimensions larger than those of a detector form. Without removal of pattern 2, soft magnetic material thin film 4 and insulating film 5 are caused to adhere onto pattern 2 in order by evaporation, and after evaporation adhesion, pattern 2 is lifted off to remove thin film 4 and insulating film 5 outside the detector form region. Next, after a resistor pattern in formed, insulating film 5 is processed into the detector form, and next, conductor film 1 and thin film 4 are processed into the detector form by etching. Next, without exfoliation of the resistor, the second insulating film 6 is caused to adhere onto insulating film 3 with a thickness slightly smaller or larger than that of conductor film 1 and (thin film 4+ insulating film 5) by evaporation. Finally, the resistor is exfoliated to complete the form of the detector.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1666779A JPS55108988A (en) | 1979-02-14 | 1979-02-14 | Production of magnetic detector |
US06/036,983 US4302822A (en) | 1978-05-12 | 1979-05-08 | Thin-film magnetic bubble domain detection device and process for manufacturing the same |
US06/266,105 US4390404A (en) | 1978-05-12 | 1981-05-21 | Process for manufacture of thin-film magnetic bubble domain detection device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1666779A JPS55108988A (en) | 1979-02-14 | 1979-02-14 | Production of magnetic detector |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55108988A true JPS55108988A (en) | 1980-08-21 |
JPS6135626B2 JPS6135626B2 (en) | 1986-08-14 |
Family
ID=11922667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1666779A Granted JPS55108988A (en) | 1978-05-12 | 1979-02-14 | Production of magnetic detector |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55108988A (en) |
-
1979
- 1979-02-14 JP JP1666779A patent/JPS55108988A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6135626B2 (en) | 1986-08-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5548935A (en) | Forming of electrode pattern | |
JPS5669835A (en) | Method for forming thin film pattern | |
JPS5656636A (en) | Processing method of fine pattern | |
JPS556844A (en) | Method of formating wiring pattern | |
JPS52120782A (en) | Manufacture of semiconductor device | |
JPS55108988A (en) | Production of magnetic detector | |
JPS55108989A (en) | Production of magnetic detector | |
JPS57198632A (en) | Fine pattern formation | |
JPS54107277A (en) | Production of semiconductor device | |
JPS563679A (en) | Formation of metallic pattern | |
JPS51126384A (en) | A method of forming a thin film by sputtering | |
JPS5273713A (en) | Production of magnetoresistive thin film head | |
JPS54154232A (en) | Manufacture of magnetic bubble element | |
JPS5597021A (en) | Thin-film magnetic head and its manufacture | |
JPS5421278A (en) | Plasma etching method | |
JPS5421272A (en) | Metal photo mask | |
JPS55105331A (en) | Method for forming electronic-beam resist pattern on electrical insulating material | |
JPS55130140A (en) | Fabricating method of semiconductor device | |
JPS5539645A (en) | Dry taper etching | |
JPS5492179A (en) | Removing method for photo resist film | |
JPS57116773A (en) | Production of metallic mask | |
JPS5797629A (en) | Manufacture of semiconductor device | |
JPS54162460A (en) | Electrode forming method | |
JPS5416189A (en) | Production of semiconductor substrate | |
JPS55107781A (en) | Etching method for metal film |