JPS55107234A - Method of monitoring deposition film quality - Google Patents

Method of monitoring deposition film quality

Info

Publication number
JPS55107234A
JPS55107234A JP1422679A JP1422679A JPS55107234A JP S55107234 A JPS55107234 A JP S55107234A JP 1422679 A JP1422679 A JP 1422679A JP 1422679 A JP1422679 A JP 1422679A JP S55107234 A JPS55107234 A JP S55107234A
Authority
JP
Japan
Prior art keywords
plasma
ratio
flow
film quality
substances
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1422679A
Other languages
English (en)
Japanese (ja)
Other versions
JPS646536B2 (https=
Inventor
Takashi Tsuchimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1422679A priority Critical patent/JPS55107234A/ja
Publication of JPS55107234A publication Critical patent/JPS55107234A/ja
Publication of JPS646536B2 publication Critical patent/JPS646536B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
JP1422679A 1979-02-13 1979-02-13 Method of monitoring deposition film quality Granted JPS55107234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1422679A JPS55107234A (en) 1979-02-13 1979-02-13 Method of monitoring deposition film quality

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1422679A JPS55107234A (en) 1979-02-13 1979-02-13 Method of monitoring deposition film quality

Publications (2)

Publication Number Publication Date
JPS55107234A true JPS55107234A (en) 1980-08-16
JPS646536B2 JPS646536B2 (https=) 1989-02-03

Family

ID=11855143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1422679A Granted JPS55107234A (en) 1979-02-13 1979-02-13 Method of monitoring deposition film quality

Country Status (1)

Country Link
JP (1) JPS55107234A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5989768A (ja) * 1982-11-12 1984-05-24 Fujitsu Ltd 薄膜の形成方法
JPS59115561A (ja) * 1982-12-23 1984-07-04 Stanley Electric Co Ltd 薄膜トランジスタの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5989768A (ja) * 1982-11-12 1984-05-24 Fujitsu Ltd 薄膜の形成方法
JPS59115561A (ja) * 1982-12-23 1984-07-04 Stanley Electric Co Ltd 薄膜トランジスタの製造方法

Also Published As

Publication number Publication date
JPS646536B2 (https=) 1989-02-03

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