JPS55101002A - Inspecting method for mirror face body - Google Patents
Inspecting method for mirror face bodyInfo
- Publication number
- JPS55101002A JPS55101002A JP708979A JP708979A JPS55101002A JP S55101002 A JPS55101002 A JP S55101002A JP 708979 A JP708979 A JP 708979A JP 708979 A JP708979 A JP 708979A JP S55101002 A JPS55101002 A JP S55101002A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- inspected
- strike
- reflected
- distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
PURPOSE: To inspect the mirror face quality of a plane mirror, wafer mirror face, etc., with high precision by measuring the distribution of reflected-light intensity by causing a diffused light ray from a spot light source to strike a mirror face to be inspected.
CONSTITUTION: To inspect mirror-face quality such as the reflection-coefficient distribution and flatness of a plane mirror, wafer mirror surface, etc., a diffused light ray from a spot light source is caused to strike mirror surface 3 to be inspected and the distribution of reflected-light intensity within the section of the reflected light ray is measured for the inspection. For example, diffused beams which never cross mutually are generated by pinholes 7 for spot light sources, halogen lamp 1a, and achromat condenser lenses 6a and 6b and then caused to strike silicon wafer mirror surface 3 to obtain inspection image 5. Then, inspection image 5 is inspected to judge a scratch, mirror-surface waviness, claw-track, flaw of the surface, etc. by a light and shade pattern with neither aberration nor strain.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP708979A JPS55101002A (en) | 1979-01-26 | 1979-01-26 | Inspecting method for mirror face body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP708979A JPS55101002A (en) | 1979-01-26 | 1979-01-26 | Inspecting method for mirror face body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55101002A true JPS55101002A (en) | 1980-08-01 |
Family
ID=11656346
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP708979A Pending JPS55101002A (en) | 1979-01-26 | 1979-01-26 | Inspecting method for mirror face body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55101002A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57134612U (en) * | 1981-02-17 | 1982-08-21 | ||
JPS5886408A (en) * | 1981-11-18 | 1983-05-24 | Matsushita Electric Ind Co Ltd | Detector and extractor for surface strain or the like |
JPS58179303A (en) * | 1982-04-14 | 1983-10-20 | Matsushita Electric Ind Co Ltd | Micro-observing device of surface |
JPS6148751A (en) * | 1984-08-17 | 1986-03-10 | Sumitomo Metal Ind Ltd | Method for detecting surface defect |
JPS6463845A (en) * | 1987-09-02 | 1989-03-09 | Asahi Optical Co Ltd | Method for inspecting surface to be inspected having linear defect |
JP2016156822A (en) * | 2015-02-25 | 2016-09-01 | 株式会社昭和電気研究所 | Wafer defect inspection device |
-
1979
- 1979-01-26 JP JP708979A patent/JPS55101002A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57134612U (en) * | 1981-02-17 | 1982-08-21 | ||
JPS6313446Y2 (en) * | 1981-02-17 | 1988-04-16 | ||
JPS5886408A (en) * | 1981-11-18 | 1983-05-24 | Matsushita Electric Ind Co Ltd | Detector and extractor for surface strain or the like |
JPH0311403B2 (en) * | 1981-11-18 | 1991-02-15 | Matsushita Electric Ind Co Ltd | |
JPS58179303A (en) * | 1982-04-14 | 1983-10-20 | Matsushita Electric Ind Co Ltd | Micro-observing device of surface |
JPH044526B2 (en) * | 1982-04-14 | 1992-01-28 | ||
JPS6148751A (en) * | 1984-08-17 | 1986-03-10 | Sumitomo Metal Ind Ltd | Method for detecting surface defect |
JPS6463845A (en) * | 1987-09-02 | 1989-03-09 | Asahi Optical Co Ltd | Method for inspecting surface to be inspected having linear defect |
JP2016156822A (en) * | 2015-02-25 | 2016-09-01 | 株式会社昭和電気研究所 | Wafer defect inspection device |
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