JPS55100976A - Deposition of aluminium - Google Patents

Deposition of aluminium

Info

Publication number
JPS55100976A
JPS55100976A JP713579A JP713579A JPS55100976A JP S55100976 A JPS55100976 A JP S55100976A JP 713579 A JP713579 A JP 713579A JP 713579 A JP713579 A JP 713579A JP S55100976 A JPS55100976 A JP S55100976A
Authority
JP
Japan
Prior art keywords
aluminium
evaporation
film
amount
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP713579A
Other languages
Japanese (ja)
Inventor
Hirobumi Yoshida
Tatsuo Itagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP713579A priority Critical patent/JPS55100976A/en
Publication of JPS55100976A publication Critical patent/JPS55100976A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To raise the amount of evaporation per unit of time by using aluminium ingot containing less than a specified amount of Si as a vaporizing source in the formation of aluminium film on electrode, wire, etc., of semiconductor device. CONSTITUTION:In the deposition by evaporation of aluminium using electron beam, an aluminium ingot containing 30% or less Si as a vaporizing source is used. The addition of Si lowers the melting point and makes the thermal conductivity worse and thereby the amount of evaporation per unit of time is made greater than that of pure aluminium. Also, because Si has lower vapor pressure than that of Al, deposited film by evaporation becomes a nearly pure Al film and therefore no adverse influence is exerted on the electrode, wire, etc., of semiconductor device.
JP713579A 1979-01-26 1979-01-26 Deposition of aluminium Pending JPS55100976A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP713579A JPS55100976A (en) 1979-01-26 1979-01-26 Deposition of aluminium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP713579A JPS55100976A (en) 1979-01-26 1979-01-26 Deposition of aluminium

Publications (1)

Publication Number Publication Date
JPS55100976A true JPS55100976A (en) 1980-08-01

Family

ID=11657626

Family Applications (1)

Application Number Title Priority Date Filing Date
JP713579A Pending JPS55100976A (en) 1979-01-26 1979-01-26 Deposition of aluminium

Country Status (1)

Country Link
JP (1) JPS55100976A (en)

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