JPS5493361A - Manufacture for x-ray exposure mask - Google Patents
Manufacture for x-ray exposure maskInfo
- Publication number
- JPS5493361A JPS5493361A JP15841977A JP15841977A JPS5493361A JP S5493361 A JPS5493361 A JP S5493361A JP 15841977 A JP15841977 A JP 15841977A JP 15841977 A JP15841977 A JP 15841977A JP S5493361 A JPS5493361 A JP S5493361A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- pattern
- mask
- window
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To form the though hole for marker with good accuracy, by forming the device pattern and the alignment mark pattern on the Si substrate, and opening the window at the back of the substrate opposing to the alignment pattern, and performing etching through taking the alignment pattern as a mask.
CONSTITUTION: On the surface of Si substrate, the device pattern 2 and the alignment mark pattern 3 are formed, and the rear side of the substrate opposing to these regions is covered with the protective film 7. Next, while clipping the substrate 1 with the protector 8, etching is made by taking the film 7 as a mask, window 6 is opened on the rear side of the substrate, and the substrate 1 for this part is made to the thin film 1'. After that, the protector 8 is removed, the resist 10 is coated other than the window 6 corresponding to the pattern 3, and it is reinforced with the film 11 such as Ti, Cu, Au and Co. Next, the part other than the pattern 3 is covered with the resist 12, forming the through hole 9 with etching by fleon gas for the thin layer 1' and 11 and the mask having the hole 9 can be obtained by removing the resists 9 and 10.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15841977A JPS5493361A (en) | 1977-12-30 | 1977-12-30 | Manufacture for x-ray exposure mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15841977A JPS5493361A (en) | 1977-12-30 | 1977-12-30 | Manufacture for x-ray exposure mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5493361A true JPS5493361A (en) | 1979-07-24 |
Family
ID=15671334
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15841977A Pending JPS5493361A (en) | 1977-12-30 | 1977-12-30 | Manufacture for x-ray exposure mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5493361A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4817921B1 (en) * | 1969-02-20 | 1973-06-01 |
-
1977
- 1977-12-30 JP JP15841977A patent/JPS5493361A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4817921B1 (en) * | 1969-02-20 | 1973-06-01 |
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