JPS5458365A - Mask aligner - Google Patents

Mask aligner

Info

Publication number
JPS5458365A
JPS5458365A JP12452477A JP12452477A JPS5458365A JP S5458365 A JPS5458365 A JP S5458365A JP 12452477 A JP12452477 A JP 12452477A JP 12452477 A JP12452477 A JP 12452477A JP S5458365 A JPS5458365 A JP S5458365A
Authority
JP
Japan
Prior art keywords
wafer
mask
chuck
plate
contacted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12452477A
Other languages
English (en)
Inventor
Hiroshi Maejima
Susumu Komoriya
Hiroshi Nishizuka
Mitsuhiro Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12452477A priority Critical patent/JPS5458365A/ja
Publication of JPS5458365A publication Critical patent/JPS5458365A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
JP12452477A 1977-10-19 1977-10-19 Mask aligner Pending JPS5458365A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12452477A JPS5458365A (en) 1977-10-19 1977-10-19 Mask aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12452477A JPS5458365A (en) 1977-10-19 1977-10-19 Mask aligner

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP59005562A Division JPS6057623A (ja) 1984-01-18 1984-01-18 非接触シ−ル装置
JP59005561A Division JPS59155130A (ja) 1984-01-18 1984-01-18 マスクアライナ

Publications (1)

Publication Number Publication Date
JPS5458365A true JPS5458365A (en) 1979-05-11

Family

ID=14887609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12452477A Pending JPS5458365A (en) 1977-10-19 1977-10-19 Mask aligner

Country Status (1)

Country Link
JP (1) JPS5458365A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57109330A (en) * 1980-12-26 1982-07-07 Hitachi Ltd Mask aliner
US5529626A (en) * 1994-10-24 1996-06-25 Nec Electronics, Inc. Spincup with a wafer backside deposition reduction apparatus
US5536559A (en) * 1994-11-22 1996-07-16 Wisconsin Alumni Research Foundation Stress-free mount for imaging mask
US6744054B2 (en) 2000-12-08 2004-06-01 Hitachi, Ltd. Evacuation use sample chamber and circuit pattern forming apparatus using the same
CN103309178A (zh) * 2013-07-04 2013-09-18 扬州杰利半导体有限公司 一种用于半导体晶片的双面对线曝光装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5177072A (ja) * 1974-12-27 1976-07-03 Fujitsu Ltd Handotaikibannoshashinshorihoho oyobisochi
JPS5240072A (en) * 1975-09-26 1977-03-28 Hitachi Ltd Atmosphere gas substitution method at exposure of photoresist

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5177072A (ja) * 1974-12-27 1976-07-03 Fujitsu Ltd Handotaikibannoshashinshorihoho oyobisochi
JPS5240072A (en) * 1975-09-26 1977-03-28 Hitachi Ltd Atmosphere gas substitution method at exposure of photoresist

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57109330A (en) * 1980-12-26 1982-07-07 Hitachi Ltd Mask aliner
US5529626A (en) * 1994-10-24 1996-06-25 Nec Electronics, Inc. Spincup with a wafer backside deposition reduction apparatus
US5536559A (en) * 1994-11-22 1996-07-16 Wisconsin Alumni Research Foundation Stress-free mount for imaging mask
US5675403A (en) * 1994-11-22 1997-10-07 Wisconsin Alumni Research Foundation Stress-free mount for imaging mask
US6744054B2 (en) 2000-12-08 2004-06-01 Hitachi, Ltd. Evacuation use sample chamber and circuit pattern forming apparatus using the same
CN103309178A (zh) * 2013-07-04 2013-09-18 扬州杰利半导体有限公司 一种用于半导体晶片的双面对线曝光装置
CN103309178B (zh) * 2013-07-04 2015-08-26 扬州杰利半导体有限公司 一种用于半导体晶片的双面对线曝光装置

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