JPS5457876A - Charge transfer device - Google Patents
Charge transfer deviceInfo
- Publication number
- JPS5457876A JPS5457876A JP12402277A JP12402277A JPS5457876A JP S5457876 A JPS5457876 A JP S5457876A JP 12402277 A JP12402277 A JP 12402277A JP 12402277 A JP12402277 A JP 12402277A JP S5457876 A JPS5457876 A JP S5457876A
- Authority
- JP
- Japan
- Prior art keywords
- diffusion region
- transfer device
- charge transfer
- phid
- gates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 101150103383 phiA gene Proteins 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/762—Charge transfer devices
- H01L29/765—Charge-coupled devices
- H01L29/768—Charge-coupled devices with field effect produced by an insulated gate
- H01L29/76816—Output structures
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
PURPOSE:To obtain a high S/N ratio, by enabling a charge transfer device to hold signal charges in a floating diffusion region during a two-bit interval. CONSTITUTION:The output part of the charge-coupled device on P-type silicon substrate P-Si is provided with four gates phiA to phiD, the substrate between gates phiB and phiC is provided with n<+>-type diffusion region FD, and the n<+>-type diffusion region as a drain is made close to under gate phiD. Gate E of a MOSFET is connected to the above-mentioned FD and used as a cathode follower.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12402277A JPS5457876A (en) | 1977-10-18 | 1977-10-18 | Charge transfer device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12402277A JPS5457876A (en) | 1977-10-18 | 1977-10-18 | Charge transfer device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5457876A true JPS5457876A (en) | 1979-05-10 |
Family
ID=14875084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12402277A Pending JPS5457876A (en) | 1977-10-18 | 1977-10-18 | Charge transfer device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5457876A (en) |
-
1977
- 1977-10-18 JP JP12402277A patent/JPS5457876A/en active Pending
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