JPS5456367A - Target for position detection of wafers - Google Patents
Target for position detection of wafersInfo
- Publication number
- JPS5456367A JPS5456367A JP12235277A JP12235277A JPS5456367A JP S5456367 A JPS5456367 A JP S5456367A JP 12235277 A JP12235277 A JP 12235277A JP 12235277 A JP12235277 A JP 12235277A JP S5456367 A JPS5456367 A JP S5456367A
- Authority
- JP
- Japan
- Prior art keywords
- regions
- position detection
- wafer
- mask
- boundaries
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain target patterns permitting easy position detection even when high viscosity resist is used by forming the targets of crossing boundaries and mutually different light nesses of adjoining regions by photoetching techniques on wafer surface.
CONSTITUTION: In the case of forming targets for position detection of the oxide film regions 15 and silion regions 16 of a wafer 14, a mask 10 formed by photoetching techniques is used. Transparent regions 11 which transmit colors and non- transparent regions 12 which do not transmit light are formed on the surface of said mask 10 and the boundaries thereof are formed by the two diagonal lines of the mask 10, whereby the mutually adjoining regions are made different regions. The mutually opposing regions are made the same regions and in the case of performing the position detection of the wafer 14, the boundaries are optically detected, whereby the position of the wafer 14 is accurately detected
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12235277A JPS5456367A (en) | 1977-10-14 | 1977-10-14 | Target for position detection of wafers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12235277A JPS5456367A (en) | 1977-10-14 | 1977-10-14 | Target for position detection of wafers |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5456367A true JPS5456367A (en) | 1979-05-07 |
Family
ID=14833790
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12235277A Pending JPS5456367A (en) | 1977-10-14 | 1977-10-14 | Target for position detection of wafers |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5456367A (en) |
-
1977
- 1977-10-14 JP JP12235277A patent/JPS5456367A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5218132A (en) | Binary circuit | |
JPS5332759A (en) | Precision coordinate position detection and position control unit by composite diffration grating method | |
JPS5456367A (en) | Target for position detection of wafers | |
JPS5421753A (en) | Linear pattern projector | |
JPS52155985A (en) | Semiconductor device | |
JPS5389673A (en) | Fine pattern forming method of semiconductor device | |
JPS5361280A (en) | Pattern projector | |
JPS5340285A (en) | Detection method for position-matching error | |
JPS53127266A (en) | Forming method of marker | |
JPS51139268A (en) | Method of producing pattern | |
JPS5421273A (en) | Manufacture for photo mask | |
JPS5387668A (en) | Forming method of patterns | |
JPS53117384A (en) | Photoetching mask | |
JPS53117385A (en) | Exposure mask for patterning | |
JPS5254379A (en) | Method of registering front and rear patterns | |
JPS52143770A (en) | Mask aligning method | |
JPS52152171A (en) | Wafer alignment method | |
JPS5421275A (en) | Photo mask for semiconductor wafer manufacture | |
JPS5488083A (en) | Manufacture for semiconductor device | |
JPS5364477A (en) | Aligning device of semiconductor wafer and exposure mask | |
JPS5555528A (en) | Mask aligner | |
JPS53135844A (en) | Photochemical etching procee | |
JPS54983A (en) | Photo mask for semiconductor manufacture | |
JPS5543843A (en) | Semiconductor wafer and exposure mask for process thereof | |
JPS53144271A (en) | Process system for mask alignment signal |