JPS5456367A - Target for position detection of wafers - Google Patents

Target for position detection of wafers

Info

Publication number
JPS5456367A
JPS5456367A JP12235277A JP12235277A JPS5456367A JP S5456367 A JPS5456367 A JP S5456367A JP 12235277 A JP12235277 A JP 12235277A JP 12235277 A JP12235277 A JP 12235277A JP S5456367 A JPS5456367 A JP S5456367A
Authority
JP
Japan
Prior art keywords
regions
position detection
wafer
mask
boundaries
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12235277A
Other languages
Japanese (ja)
Inventor
Isao Miyashita
Isao Shimura
Kousuke Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12235277A priority Critical patent/JPS5456367A/en
Publication of JPS5456367A publication Critical patent/JPS5456367A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain target patterns permitting easy position detection even when high viscosity resist is used by forming the targets of crossing boundaries and mutually different light nesses of adjoining regions by photoetching techniques on wafer surface.
CONSTITUTION: In the case of forming targets for position detection of the oxide film regions 15 and silion regions 16 of a wafer 14, a mask 10 formed by photoetching techniques is used. Transparent regions 11 which transmit colors and non- transparent regions 12 which do not transmit light are formed on the surface of said mask 10 and the boundaries thereof are formed by the two diagonal lines of the mask 10, whereby the mutually adjoining regions are made different regions. The mutually opposing regions are made the same regions and in the case of performing the position detection of the wafer 14, the boundaries are optically detected, whereby the position of the wafer 14 is accurately detected
COPYRIGHT: (C)1979,JPO&Japio
JP12235277A 1977-10-14 1977-10-14 Target for position detection of wafers Pending JPS5456367A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12235277A JPS5456367A (en) 1977-10-14 1977-10-14 Target for position detection of wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12235277A JPS5456367A (en) 1977-10-14 1977-10-14 Target for position detection of wafers

Publications (1)

Publication Number Publication Date
JPS5456367A true JPS5456367A (en) 1979-05-07

Family

ID=14833790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12235277A Pending JPS5456367A (en) 1977-10-14 1977-10-14 Target for position detection of wafers

Country Status (1)

Country Link
JP (1) JPS5456367A (en)

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