JPS5455462A - Masking accuracy measurement - Google Patents
Masking accuracy measurementInfo
- Publication number
- JPS5455462A JPS5455462A JP12276477A JP12276477A JPS5455462A JP S5455462 A JPS5455462 A JP S5455462A JP 12276477 A JP12276477 A JP 12276477A JP 12276477 A JP12276477 A JP 12276477A JP S5455462 A JPS5455462 A JP S5455462A
- Authority
- JP
- Japan
- Prior art keywords
- resistances
- difference
- mask
- discrepancy
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE: To accomplish the mask registration highly accurately and efficiently at a high speed by detecting the discrepancy in the mask registration as the difference of resistances in a parallel diffusion region.
CONSTITUTION: A gate electrode 4 is formed through a separate oxidized film 2 from a portion of a semiconductor substrate region 1 to the other semiconductor substrate region 1 which is in parallel with the former. An imprurity is diffused by using the gate electrode 4 and the separate oxidized film 2 as a mask so that the resistances of the diffused regions 5 and 6 of a semiconductor device are measured by means of AI elctrodes 8 to 12. The discrepancy in the mask registration is electrically measured in accordance with the difference between the resistances between the electrodes 9 and 11 and the Al electrodes 10 and 12. Since the detection is accomplished through the difference in the resistance, the detecting accuracy is improved. Since, moreover, the detection is carried out in an electrically measuring manner, many measurements can be accomplished easily and promptly
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12276477A JPS5455462A (en) | 1977-10-12 | 1977-10-12 | Masking accuracy measurement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12276477A JPS5455462A (en) | 1977-10-12 | 1977-10-12 | Masking accuracy measurement |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5455462A true JPS5455462A (en) | 1979-05-02 |
Family
ID=14844027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12276477A Pending JPS5455462A (en) | 1977-10-12 | 1977-10-12 | Masking accuracy measurement |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5455462A (en) |
-
1977
- 1977-10-12 JP JP12276477A patent/JPS5455462A/en active Pending
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