JPS5432143A - Etching process - Google Patents

Etching process

Info

Publication number
JPS5432143A
JPS5432143A JP9789477A JP9789477A JPS5432143A JP S5432143 A JPS5432143 A JP S5432143A JP 9789477 A JP9789477 A JP 9789477A JP 9789477 A JP9789477 A JP 9789477A JP S5432143 A JPS5432143 A JP S5432143A
Authority
JP
Japan
Prior art keywords
etching process
etching
molybdenum
etched
followed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9789477A
Other languages
English (en)
Other versions
JPS6031909B2 (ja
Inventor
Fumio Murai
Masaru Miyazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP52097894A priority Critical patent/JPS6031909B2/ja
Publication of JPS5432143A publication Critical patent/JPS5432143A/ja
Publication of JPS6031909B2 publication Critical patent/JPS6031909B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP52097894A 1977-08-17 1977-08-17 エツチング加工法 Expired JPS6031909B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52097894A JPS6031909B2 (ja) 1977-08-17 1977-08-17 エツチング加工法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52097894A JPS6031909B2 (ja) 1977-08-17 1977-08-17 エツチング加工法

Publications (2)

Publication Number Publication Date
JPS5432143A true JPS5432143A (en) 1979-03-09
JPS6031909B2 JPS6031909B2 (ja) 1985-07-25

Family

ID=14204446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52097894A Expired JPS6031909B2 (ja) 1977-08-17 1977-08-17 エツチング加工法

Country Status (1)

Country Link
JP (1) JPS6031909B2 (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5635774A (en) * 1979-08-29 1981-04-08 Chiyou Lsi Gijutsu Kenkyu Kumiai Dry etching method
JPS5696076A (en) * 1979-12-28 1981-08-03 Fujitsu Ltd Formation of metallic mask for ion etching
JPS5696078A (en) * 1979-12-28 1981-08-03 Fujitsu Ltd Ion etching method
JPS5846641A (ja) * 1981-09-14 1983-03-18 Fujitsu Ltd 半導体装置の製造方法
US4448865A (en) * 1981-10-30 1984-05-15 International Business Machines Corporation Shadow projection mask for ion implantation and ion beam lithography
JPS61138256A (ja) * 1984-12-10 1986-06-25 Toshiba Corp マスクパタ−ンの形成方法
JPS61138257A (ja) * 1984-12-10 1986-06-25 Toshiba Corp マスク基板
JPS6362892A (ja) * 1986-09-03 1988-03-19 Sharp Corp 導電体パタ−ンの形成方法
JPS63166231A (ja) * 1986-12-27 1988-07-09 Hoya Corp フオトマスクの製造方法

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6227155B2 (ja) * 1979-08-29 1987-06-12 Cho Eru Esu Ai Gijutsu Kenkyu Kumiai
JPS5635774A (en) * 1979-08-29 1981-04-08 Chiyou Lsi Gijutsu Kenkyu Kumiai Dry etching method
JPS6227156B2 (ja) * 1979-12-28 1987-06-12 Fujitsu Ltd
JPS5696076A (en) * 1979-12-28 1981-08-03 Fujitsu Ltd Formation of metallic mask for ion etching
JPS5696078A (en) * 1979-12-28 1981-08-03 Fujitsu Ltd Ion etching method
JPS5846641A (ja) * 1981-09-14 1983-03-18 Fujitsu Ltd 半導体装置の製造方法
US4448865A (en) * 1981-10-30 1984-05-15 International Business Machines Corporation Shadow projection mask for ion implantation and ion beam lithography
JPS61138257A (ja) * 1984-12-10 1986-06-25 Toshiba Corp マスク基板
JPS61138256A (ja) * 1984-12-10 1986-06-25 Toshiba Corp マスクパタ−ンの形成方法
JPS6339893B2 (ja) * 1984-12-10 1988-08-08 Tokyo Shibaura Electric Co
JPS6339892B2 (ja) * 1984-12-10 1988-08-08 Tokyo Shibaura Electric Co
JPS6362892A (ja) * 1986-09-03 1988-03-19 Sharp Corp 導電体パタ−ンの形成方法
JPS63166231A (ja) * 1986-12-27 1988-07-09 Hoya Corp フオトマスクの製造方法

Also Published As

Publication number Publication date
JPS6031909B2 (ja) 1985-07-25

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