JPS5423473A - Photomask and method of inspecting mask pattern using same - Google Patents

Photomask and method of inspecting mask pattern using same

Info

Publication number
JPS5423473A
JPS5423473A JP8842777A JP8842777A JPS5423473A JP S5423473 A JPS5423473 A JP S5423473A JP 8842777 A JP8842777 A JP 8842777A JP 8842777 A JP8842777 A JP 8842777A JP S5423473 A JPS5423473 A JP S5423473A
Authority
JP
Japan
Prior art keywords
photomask
same
mask pattern
inspecting mask
inspecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8842777A
Other languages
English (en)
Inventor
Kouichirou Mizukami
Masatoshi Utaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP8842777A priority Critical patent/JPS5423473A/ja
Priority to US05/925,791 priority patent/US4256778A/en
Priority to DE2832151A priority patent/DE2832151C2/de
Publication of JPS5423473A publication Critical patent/JPS5423473A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G03F1/86—Inspecting by charged particle beam [CPB]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP8842777A 1977-07-25 1977-07-25 Photomask and method of inspecting mask pattern using same Pending JPS5423473A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP8842777A JPS5423473A (en) 1977-07-25 1977-07-25 Photomask and method of inspecting mask pattern using same
US05/925,791 US4256778A (en) 1977-07-25 1978-07-18 Method of inspecting and retouching a photo mask
DE2832151A DE2832151C2 (de) 1977-07-25 1978-07-21 Verfahren zum Prüfen eines Musters aus einem elektrisch leitfähigen Film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8842777A JPS5423473A (en) 1977-07-25 1977-07-25 Photomask and method of inspecting mask pattern using same

Publications (1)

Publication Number Publication Date
JPS5423473A true JPS5423473A (en) 1979-02-22

Family

ID=13942476

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8842777A Pending JPS5423473A (en) 1977-07-25 1977-07-25 Photomask and method of inspecting mask pattern using same

Country Status (3)

Country Link
US (1) US4256778A (ja)
JP (1) JPS5423473A (ja)
DE (1) DE2832151C2 (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2449291A1 (fr) * 1979-02-15 1980-09-12 Carenco Alain Procede d'equilibrage d'un dispositif optique integre a l'aide d'une couche metallique mince et dispositif obtenu par ce procede
JPS55129347A (en) * 1979-03-28 1980-10-07 Chiyou Lsi Gijutsu Kenkyu Kumiai Photomask
US4444801A (en) * 1981-01-14 1984-04-24 Hitachi, Ltd. Method and apparatus for correcting transparent defects on a photomask
US4411972A (en) * 1981-12-30 1983-10-25 International Business Machines Corporation Integrated circuit photomask
US4636403A (en) * 1985-04-29 1987-01-13 At&T Technologies, Inc. Method of repairing a defective photomask
EP0203215B1 (de) * 1985-05-29 1990-02-21 Ibm Deutschland Gmbh Verfahren zur Reparatur von Transmissionsmasken
JPS63210845A (ja) * 1987-02-27 1988-09-01 Hitachi Ltd 欠陥修正方法
AT392857B (de) * 1987-07-13 1991-06-25 Ims Ionen Mikrofab Syst Vorrichtung und verfahren zur inspektion einer maske
US5260150A (en) * 1987-09-30 1993-11-09 Sharp Kabushiki Kaisha Photo-mask with light shielding film buried in substrate
CA1315023C (en) * 1987-09-30 1993-03-23 Kenji Ohta Photo-mask
US4906326A (en) * 1988-03-25 1990-03-06 Canon Kabushiki Kaisha Mask repair system
US5057642A (en) * 1991-04-18 1991-10-15 Phillips Petroleum Company Removal of basic impurities from olefin streams
US20030000921A1 (en) * 2001-06-29 2003-01-02 Ted Liang Mask repair with electron beam-induced chemical etching

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL297262A (ja) * 1962-09-04
BE793605A (fr) * 1972-01-03 1973-05-02 Rca Corp Appareil et procede pour corriger un masque photographique defectueux
US4109029A (en) * 1977-01-24 1978-08-22 Hughes Aircraft Company High resolution electron beam microfabrication process for fabricating small geometry semiconductor devices

Also Published As

Publication number Publication date
DE2832151C2 (de) 1982-05-06
DE2832151A1 (de) 1979-02-15
US4256778A (en) 1981-03-17

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