JPS5265673A - Photomask and method of manufacture thereof - Google Patents
Photomask and method of manufacture thereofInfo
- Publication number
- JPS5265673A JPS5265673A JP14173475A JP14173475A JPS5265673A JP S5265673 A JPS5265673 A JP S5265673A JP 14173475 A JP14173475 A JP 14173475A JP 14173475 A JP14173475 A JP 14173475A JP S5265673 A JPS5265673 A JP S5265673A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14173475A JPS5265673A (en) | 1975-11-26 | 1975-11-26 | Photomask and method of manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14173475A JPS5265673A (en) | 1975-11-26 | 1975-11-26 | Photomask and method of manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5265673A true JPS5265673A (en) | 1977-05-31 |
Family
ID=15298955
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14173475A Pending JPS5265673A (en) | 1975-11-26 | 1975-11-26 | Photomask and method of manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5265673A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55146928A (en) * | 1979-05-02 | 1980-11-15 | Ulvac Corp | Manufacturing of photomask substrate |
JPS6033555A (en) * | 1983-08-04 | 1985-02-20 | Konishiroku Photo Ind Co Ltd | Material of mask for dry etching |
JPS60107651A (en) * | 1983-11-17 | 1985-06-13 | Arubatsuku Seimaku Kk | Photomask |
-
1975
- 1975-11-26 JP JP14173475A patent/JPS5265673A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55146928A (en) * | 1979-05-02 | 1980-11-15 | Ulvac Corp | Manufacturing of photomask substrate |
JPS6055827B2 (en) * | 1979-05-02 | 1985-12-06 | 日本真空技術株式会社 | Photomask substrate processing method |
JPS6033555A (en) * | 1983-08-04 | 1985-02-20 | Konishiroku Photo Ind Co Ltd | Material of mask for dry etching |
JPH0444735B2 (en) * | 1983-08-04 | 1992-07-22 | Konishiroku Photo Ind | |
JPS60107651A (en) * | 1983-11-17 | 1985-06-13 | Arubatsuku Seimaku Kk | Photomask |
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