JPS5421089B2 - - Google Patents

Info

Publication number
JPS5421089B2
JPS5421089B2 JP6007473A JP6007473A JPS5421089B2 JP S5421089 B2 JPS5421089 B2 JP S5421089B2 JP 6007473 A JP6007473 A JP 6007473A JP 6007473 A JP6007473 A JP 6007473A JP S5421089 B2 JPS5421089 B2 JP S5421089B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6007473A
Other languages
Japanese (ja)
Other versions
JPS5011022A (US06312121-20011106-C00033.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6007473A priority Critical patent/JPS5421089B2/ja
Priority to GB179277A priority patent/GB1478334A/en
Priority to GB2367474A priority patent/GB1478333A/en
Priority to DE19742426159 priority patent/DE2426159A1/de
Publication of JPS5011022A publication Critical patent/JPS5011022A/ja
Priority to US05/746,555 priority patent/US4217407A/en
Priority to US05/847,884 priority patent/US4197128A/en
Priority to US05/904,655 priority patent/US4207106A/en
Publication of JPS5421089B2 publication Critical patent/JPS5421089B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP6007473A 1973-05-29 1973-05-29 Expired JPS5421089B2 (US06312121-20011106-C00033.png)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP6007473A JPS5421089B2 (US06312121-20011106-C00033.png) 1973-05-29 1973-05-29
GB179277A GB1478334A (en) 1973-05-29 1974-05-28 Light-sensitive copying material
GB2367474A GB1478333A (en) 1973-05-29 1974-05-28 Light-sensitive copying material
DE19742426159 DE2426159A1 (de) 1973-05-29 1974-05-29 Lichtempfindliches kopiermaterial
US05/746,555 US4217407A (en) 1973-05-29 1976-12-01 Light-sensitive O-quinone diazide containing copying material
US05/847,884 US4197128A (en) 1973-05-29 1977-11-02 Light-sensitive O-quinone diazide containing copying material
US05/904,655 US4207106A (en) 1973-05-29 1978-05-10 Positive working O-quinone diazide photocopying process with organic resin overlayer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6007473A JPS5421089B2 (US06312121-20011106-C00033.png) 1973-05-29 1973-05-29

Publications (2)

Publication Number Publication Date
JPS5011022A JPS5011022A (US06312121-20011106-C00033.png) 1975-02-04
JPS5421089B2 true JPS5421089B2 (US06312121-20011106-C00033.png) 1979-07-27

Family

ID=13131559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6007473A Expired JPS5421089B2 (US06312121-20011106-C00033.png) 1973-05-29 1973-05-29

Country Status (4)

Country Link
US (3) US4217407A (US06312121-20011106-C00033.png)
JP (1) JPS5421089B2 (US06312121-20011106-C00033.png)
DE (1) DE2426159A1 (US06312121-20011106-C00033.png)
GB (2) GB1478334A (US06312121-20011106-C00033.png)

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51139402A (en) * 1975-05-24 1976-12-01 Tokyo Ouka Kougiyou Kk Positive photooresist composition
GB2000874B (en) * 1977-07-12 1982-02-17 Asahi Chemical Ind Process for producing image and photosensitive element therefor and method of producing printed circuit board
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
DE3009873A1 (de) * 1979-03-16 1980-09-25 Daicel Chem Photoempfindliche masse
JPS55164647U (US06312121-20011106-C00033.png) * 1979-05-11 1980-11-26
US4332881A (en) * 1980-07-28 1982-06-01 Bell Telephone Laboratories, Incorporated Resist adhesion in integrated circuit processing
US4472494A (en) * 1980-09-15 1984-09-18 Napp Systems (Usa), Inc. Bilayer photosensitive imaging article
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
US4431724A (en) * 1981-01-07 1984-02-14 Ovchinnikov Jury M Offset printing plate and process for making same
DE3100856A1 (de) * 1981-01-14 1982-08-12 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
JPS5858546A (ja) * 1981-10-02 1983-04-07 Kimoto & Co Ltd 製版用感光性マスク材料
JPS5883849A (ja) * 1981-11-13 1983-05-19 Toyobo Co Ltd 金属系画像形成方法
JPS58205154A (ja) * 1982-05-25 1983-11-30 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS5917552A (ja) * 1982-07-21 1984-01-28 Toray Ind Inc 画像形成用積層体の処理方法
US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
US4504566A (en) * 1982-11-01 1985-03-12 E. I. Du Pont De Nemours And Company Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers
JPS59187340A (ja) * 1983-08-01 1984-10-24 Kimoto & Co Ltd 感光性組成物
JPS6032045A (ja) * 1983-08-01 1985-02-19 Sanyo Kokusaku Pulp Co Ltd 多色画像形成材料およびその画像形成方法
DE3340154A1 (de) * 1983-11-07 1985-05-15 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von bildmaessig strukturierten resistschichten und fuer dieses verfahren geeigneter trockenfilmresist
US4564575A (en) * 1984-01-30 1986-01-14 International Business Machines Corporation Tailoring of novolak and diazoquinone positive resists by acylation of novolak
DE3433247A1 (de) * 1984-09-11 1986-03-20 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung
US4804614A (en) * 1984-10-01 1989-02-14 The Aerospace Corporation Photoresist process of fabricating microelectronic circuits using water processable diazonium compound containing contrast enhancement layer
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
US4777111A (en) * 1985-06-03 1988-10-11 Fairmount Chemical Company, Inc. Photographic element with diazo contrast enhancement layer and method of producing image in underlying photoresist layer of element
US4672021A (en) * 1985-06-03 1987-06-09 Fairmount Chemical Company Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4762766A (en) * 1986-01-14 1988-08-09 Kroy Inc. Dry transfer film with photosensitized color carrying layer and photosensitized pressure sensitive adhesive layer wherein photosensitizer is o-quinone diazide
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
CA1321315C (en) * 1986-04-11 1993-08-17 Yoichi Mori Printing plate
DE3621376A1 (de) * 1986-06-26 1988-01-07 Hoechst Ag Strahlungsempfindliches aufzeichnungsmaterial
US4816380A (en) * 1986-06-27 1989-03-28 Texas Instruments Incorporated Water soluble contrast enhancement layer method of forming resist image on semiconductor chip
JPH07113773B2 (ja) * 1986-07-04 1995-12-06 株式会社日立製作所 パタ−ン形成方法
JP2602511B2 (ja) * 1987-10-30 1997-04-23 株式会社日立製作所 パターン形成方法
US4835086A (en) * 1988-02-12 1989-05-30 Hoechst Celanese Corporation Polysulfone barrier layer for bi-level photoresists
US5212043A (en) * 1988-02-17 1993-05-18 Tosho Corporation Photoresist composition comprising a non-aromatic resin having no aromatic structures derived from units of an aliphatic cyclic hydrocarbon and units of maleic anhydride and/or maleimide and a photosensitive agent
JP2720224B2 (ja) * 1990-06-15 1998-03-04 富士写真フイルム株式会社 感光性平版印刷版
JPH04299351A (ja) * 1991-03-28 1992-10-22 Fuji Photo Film Co Ltd 画像形成用感光性積層材料
US5326674A (en) * 1991-04-30 1994-07-05 Fuji Photo Film Co., Ltd. Method for processing photosensitive copying materials
JP2984713B2 (ja) * 1991-04-30 1999-11-29 富士写真フイルム株式会社 感光性複写材料およびその処理方法
JP2673610B2 (ja) * 1991-05-22 1997-11-05 富士写真フイルム株式会社 感光性複写材料およびその処理方法
US5332650A (en) * 1991-09-06 1994-07-26 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition
GB2291207B (en) * 1994-07-14 1998-03-25 Hyundai Electronics Ind Method for forming resist patterns
JPH10195568A (ja) * 1997-01-10 1998-07-28 Konica Corp 平版印刷版用アルミニウム合金板
KR101020164B1 (ko) 2003-07-17 2011-03-08 허니웰 인터내셔날 인코포레이티드 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법
KR101146622B1 (ko) * 2009-08-31 2012-05-16 금호석유화학 주식회사 감광성 화합물 및 이를 포함하는 감광성 조성물
JP6853057B2 (ja) * 2017-01-31 2021-03-31 東京応化工業株式会社 重合性組成物、硬化膜の製造方法、及び硬化膜

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2702243A (en) * 1950-06-17 1955-02-15 Azoplate Corp Light-sensitive photographic element and process of producing printing plates
BE507657A (US06312121-20011106-C00033.png) * 1950-12-06
BE516716A (US06312121-20011106-C00033.png) * 1952-01-05 1900-01-01
NL95407C (US06312121-20011106-C00033.png) * 1954-08-20
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
BE620097A (US06312121-20011106-C00033.png) * 1958-11-26
DE1114705C2 (de) * 1959-04-16 1962-04-12 Kalle Ag Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
GB983366A (en) * 1960-07-06 1965-02-17 Union Carbide Corp Photosensitive compositions and their use in photomechanical printing
NL270834A (US06312121-20011106-C00033.png) * 1960-10-31
BE620660A (US06312121-20011106-C00033.png) * 1961-07-28
US3313626A (en) * 1962-08-01 1967-04-11 Russeli H Whitney Process of making a lithographic printing plate
US3515547A (en) * 1965-09-15 1970-06-02 Eastman Kodak Co Tri layer photographic film with a vesicular layer and process
GB1146618A (en) * 1965-10-11 1969-03-26 Harry Frank Gipe Method for preparing photo-lithographic plates
JPS4910841B1 (US06312121-20011106-C00033.png) * 1965-12-18 1974-03-13
US3511658A (en) * 1966-09-28 1970-05-12 Keuffel & Esser Co Photographic reproduction materials
GB1187980A (en) * 1966-10-28 1970-04-15 Ilford Ltd Presensitised Lithographic Plates.
US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
US3578451A (en) * 1967-03-29 1971-05-11 Scott Paper Co Integral negative type positive photolithographic plate
ZA6806990B (US06312121-20011106-C00033.png) * 1967-12-14
JPS49441B1 (US06312121-20011106-C00033.png) * 1968-08-14 1974-01-08
US3671236A (en) * 1968-03-18 1972-06-20 Minnesota Mining & Mfg Presensitized color-proofing sheet
US3645732A (en) * 1969-05-19 1972-02-29 Keuffel & Esser Co Etching alcohol-soluble nylon with aqueous solutions
BE757067A (fr) * 1969-10-03 1971-03-16 Eastman Kodak Co Procede de fabrication d'objets par voie photographique
BE755709A (fr) * 1969-10-29 1971-02-15 Shipley Co Procede d'application d'une reserve photographique sur un support et produit obtenu
US3652272A (en) * 1969-10-31 1972-03-28 Lithoplate Inc Phenoxy photopolymer having no epoxy groups, and article made therefrom
US3660097A (en) * 1969-11-28 1972-05-02 Polychrome Corp Diazo-polyurethane light-sensitive compositions
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym
US3779761A (en) * 1972-01-17 1973-12-18 Minnesota Mining & Mfg Presensitized light-sensitive letterpress printing makeready
US3782939A (en) * 1972-02-09 1974-01-01 Mining And Mfg Co Dry positive-acting photoresist

Also Published As

Publication number Publication date
US4207106A (en) 1980-06-10
GB1478334A (en) 1977-06-29
US4217407A (en) 1980-08-12
GB1478333A (en) 1977-06-29
JPS5011022A (US06312121-20011106-C00033.png) 1975-02-04
US4197128A (en) 1980-04-08
DE2426159A1 (de) 1974-12-19

Similar Documents

Publication Publication Date Title
AR201758A1 (US06312121-20011106-C00033.png)
AU476761B2 (US06312121-20011106-C00033.png)
JPS5421089B2 (US06312121-20011106-C00033.png)
JPS5319899B2 (US06312121-20011106-C00033.png)
AU474511B2 (US06312121-20011106-C00033.png)
AU471343B2 (US06312121-20011106-C00033.png)
AU476714B2 (US06312121-20011106-C00033.png)
AU476696B2 (US06312121-20011106-C00033.png)
AU472848B2 (US06312121-20011106-C00033.png)
AU477823B2 (US06312121-20011106-C00033.png)
AU476873B1 (US06312121-20011106-C00033.png)
AR201432A1 (US06312121-20011106-C00033.png)
AU477824B2 (US06312121-20011106-C00033.png)
AR210729A1 (US06312121-20011106-C00033.png)
AU471461B2 (US06312121-20011106-C00033.png)
BG19430A1 (US06312121-20011106-C00033.png)
AU479521A (US06312121-20011106-C00033.png)
CH395374A4 (US06312121-20011106-C00033.png)
CH317474A4 (US06312121-20011106-C00033.png)
CH238174A4 (US06312121-20011106-C00033.png)
BG20552A3 (US06312121-20011106-C00033.png)
BG19929A1 (US06312121-20011106-C00033.png)
AU479504A (US06312121-20011106-C00033.png)
BG19044A1 (US06312121-20011106-C00033.png)
CH560445A5 (US06312121-20011106-C00033.png)