JPS54148483A - Automatic detecting method for reference mark of exposure - Google Patents

Automatic detecting method for reference mark of exposure

Info

Publication number
JPS54148483A
JPS54148483A JP5733878A JP5733878A JPS54148483A JP S54148483 A JPS54148483 A JP S54148483A JP 5733878 A JP5733878 A JP 5733878A JP 5733878 A JP5733878 A JP 5733878A JP S54148483 A JPS54148483 A JP S54148483A
Authority
JP
Japan
Prior art keywords
sample
mark
stage
reference mark
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5733878A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5637694B2 (enrdf_load_stackoverflow
Inventor
Nobuo Shimazu
Kiichi Takamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP5733878A priority Critical patent/JPS54148483A/ja
Publication of JPS54148483A publication Critical patent/JPS54148483A/ja
Publication of JPS5637694B2 publication Critical patent/JPS5637694B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP5733878A 1978-05-15 1978-05-15 Automatic detecting method for reference mark of exposure Granted JPS54148483A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5733878A JPS54148483A (en) 1978-05-15 1978-05-15 Automatic detecting method for reference mark of exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5733878A JPS54148483A (en) 1978-05-15 1978-05-15 Automatic detecting method for reference mark of exposure

Publications (2)

Publication Number Publication Date
JPS54148483A true JPS54148483A (en) 1979-11-20
JPS5637694B2 JPS5637694B2 (enrdf_load_stackoverflow) 1981-09-02

Family

ID=13052773

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5733878A Granted JPS54148483A (en) 1978-05-15 1978-05-15 Automatic detecting method for reference mark of exposure

Country Status (1)

Country Link
JP (1) JPS54148483A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61268052A (ja) * 1984-11-06 1986-11-27 Nec Corp 半導体ウエハ−におけるレ−ザトリミング方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57205388U (enrdf_load_stackoverflow) * 1981-06-25 1982-12-27
JPS6428164U (enrdf_load_stackoverflow) * 1987-08-12 1989-02-17

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4854873A (enrdf_load_stackoverflow) * 1971-11-10 1973-08-01
JPS50145865A (enrdf_load_stackoverflow) * 1974-04-18 1975-11-22
JPS5128385A (ja) * 1974-09-02 1976-03-10 Nippon Keibi Hosho Kk Jidoshokasochi
JPS51118968A (en) * 1975-04-11 1976-10-19 Toshiba Corp Electron beam exposure device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4854873A (enrdf_load_stackoverflow) * 1971-11-10 1973-08-01
JPS50145865A (enrdf_load_stackoverflow) * 1974-04-18 1975-11-22
JPS5128385A (ja) * 1974-09-02 1976-03-10 Nippon Keibi Hosho Kk Jidoshokasochi
JPS51118968A (en) * 1975-04-11 1976-10-19 Toshiba Corp Electron beam exposure device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61268052A (ja) * 1984-11-06 1986-11-27 Nec Corp 半導体ウエハ−におけるレ−ザトリミング方法

Also Published As

Publication number Publication date
JPS5637694B2 (enrdf_load_stackoverflow) 1981-09-02

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