JPS54109387A - Etching method - Google Patents

Etching method

Info

Publication number
JPS54109387A
JPS54109387A JP1539678A JP1539678A JPS54109387A JP S54109387 A JPS54109387 A JP S54109387A JP 1539678 A JP1539678 A JP 1539678A JP 1539678 A JP1539678 A JP 1539678A JP S54109387 A JPS54109387 A JP S54109387A
Authority
JP
Japan
Prior art keywords
chlorine
gas
etching
chamber
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1539678A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6255692B2 (enrdf_load_stackoverflow
Inventor
Tatsumi Mizutani
Hideo Komatsu
Shinya Iida
Yukiyoshi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1539678A priority Critical patent/JPS54109387A/ja
Publication of JPS54109387A publication Critical patent/JPS54109387A/ja
Publication of JPS6255692B2 publication Critical patent/JPS6255692B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP1539678A 1978-02-15 1978-02-15 Etching method Granted JPS54109387A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1539678A JPS54109387A (en) 1978-02-15 1978-02-15 Etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1539678A JPS54109387A (en) 1978-02-15 1978-02-15 Etching method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP19051786A Division JPS6254441A (ja) 1986-08-15 1986-08-15 エツチング装置

Publications (2)

Publication Number Publication Date
JPS54109387A true JPS54109387A (en) 1979-08-27
JPS6255692B2 JPS6255692B2 (enrdf_load_stackoverflow) 1987-11-20

Family

ID=11887562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1539678A Granted JPS54109387A (en) 1978-02-15 1978-02-15 Etching method

Country Status (1)

Country Link
JP (1) JPS54109387A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57500399A (enrdf_load_stackoverflow) * 1980-04-07 1982-03-04
JPS59134833A (ja) * 1982-11-03 1984-08-02 アプライド・マテリアルズ・インコ−ポレ−テツド アルミニウムおよびアルミニウム合金をプラズマエツチングするための材料および方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50122878A (enrdf_load_stackoverflow) * 1974-03-14 1975-09-26
JPS51141741A (en) * 1975-05-22 1976-12-06 Ibm Method of selectively removing aluminum
JPS53124979A (en) * 1977-04-07 1978-10-31 Fujitsu Ltd Plasma etching method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50122878A (enrdf_load_stackoverflow) * 1974-03-14 1975-09-26
JPS51141741A (en) * 1975-05-22 1976-12-06 Ibm Method of selectively removing aluminum
JPS53124979A (en) * 1977-04-07 1978-10-31 Fujitsu Ltd Plasma etching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57500399A (enrdf_load_stackoverflow) * 1980-04-07 1982-03-04
JPS59134833A (ja) * 1982-11-03 1984-08-02 アプライド・マテリアルズ・インコ−ポレ−テツド アルミニウムおよびアルミニウム合金をプラズマエツチングするための材料および方法

Also Published As

Publication number Publication date
JPS6255692B2 (enrdf_load_stackoverflow) 1987-11-20

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