JPS54107876A - Method and apparatus for reduction - Google Patents

Method and apparatus for reduction

Info

Publication number
JPS54107876A
JPS54107876A JP1489878A JP1489878A JPS54107876A JP S54107876 A JPS54107876 A JP S54107876A JP 1489878 A JP1489878 A JP 1489878A JP 1489878 A JP1489878 A JP 1489878A JP S54107876 A JPS54107876 A JP S54107876A
Authority
JP
Japan
Prior art keywords
plasma
gas
microwave
temperature
tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1489878A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6116502B2 (enExample
Inventor
Tsuneo Muranaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP1489878A priority Critical patent/JPS54107876A/ja
Publication of JPS54107876A publication Critical patent/JPS54107876A/ja
Publication of JPS6116502B2 publication Critical patent/JPS6116502B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Drying Of Semiconductors (AREA)
JP1489878A 1978-02-14 1978-02-14 Method and apparatus for reduction Granted JPS54107876A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1489878A JPS54107876A (en) 1978-02-14 1978-02-14 Method and apparatus for reduction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1489878A JPS54107876A (en) 1978-02-14 1978-02-14 Method and apparatus for reduction

Publications (2)

Publication Number Publication Date
JPS54107876A true JPS54107876A (en) 1979-08-24
JPS6116502B2 JPS6116502B2 (enExample) 1986-04-30

Family

ID=11873802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1489878A Granted JPS54107876A (en) 1978-02-14 1978-02-14 Method and apparatus for reduction

Country Status (1)

Country Link
JP (1) JPS54107876A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55149642A (en) * 1979-05-08 1980-11-21 Rikagaku Kenkyusho Reduction of oxide
JPS5762537A (en) * 1980-10-02 1982-04-15 Semiconductor Energy Lab Co Ltd Forming method for film
JPS57138159A (en) * 1981-02-20 1982-08-26 Fujitsu Ltd Formation of thin film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55149642A (en) * 1979-05-08 1980-11-21 Rikagaku Kenkyusho Reduction of oxide
JPS5762537A (en) * 1980-10-02 1982-04-15 Semiconductor Energy Lab Co Ltd Forming method for film
JPS57138159A (en) * 1981-02-20 1982-08-26 Fujitsu Ltd Formation of thin film

Also Published As

Publication number Publication date
JPS6116502B2 (enExample) 1986-04-30

Similar Documents

Publication Publication Date Title
IE830747L (en) Plasma treatment process
JPS5673539A (en) Surface treating apparatus of microwave plasma
DE3279106D1 (en) Process for the thermochemical treatments of metals by ion bombardment
CS9003039A2 (en) Method of liquids treatment that contain difficult-to-degrade harmful substances and equipment for its realization
BG49828A3 (bg) Метод за термообработка на метални детайли
FR2591611B1 (fr) Nouveau materiau ligno-cellulosique thermocondense, procede et four pour l'obtenir.
GB759694A (en) Improvements in or relating to methods and apparatus for carrying out processes for the treatment of objects and materials employing electric glow discharges
JPS54107876A (en) Method and apparatus for reduction
US4212687A (en) Ion-nitriting process
JPS57177342A (en) Plasma treating apparatus of powder
JPS55102491A (en) Continuous clarification of waste water
KR910010753A (ko) 전자사이클로트론 공명을 사용한 플라즈마처리방법 및 장치
JPS5541964A (en) Method and apparatus for heat treatment of ring form body
JPS5360882A (en) Generating apparatus for activated gas
JPS5617902A (en) Water dissociating method utilizing microwave plasma phenomenon
KR102251801B1 (ko) 레이저 가열과 플라즈마를 이용한 산화환원 처리방법
JPS56136646A (en) Treating apparatus for surface of microwave plasma
JPS57113048A (en) Continuous vulcanization of rubber containing metal core
JPS5467377A (en) Plasma processing apparatus
JPS57118635A (en) Manufacture of semiconductor device
JPS5385782A (en) Treating apparatus with activated gas
Bell et al. A laboratory investigation of plasma carburizing in hydrogen-methane mixtures
RU2057200C1 (ru) Способ обработки изделий из малоуглеродистых сталей
JPS6421915A (en) Apparatus and method for forming thin film
JPS54107875A (en) Producing apparatus for activated gas

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041118

A621 Written request for application examination

Effective date: 20041118

Free format text: JAPANESE INTERMEDIATE CODE: A621

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20060728

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20061024

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20061107

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070112

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20070403

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20070507

R150 Certificate of patent (=grant) or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100511

Year of fee payment: 3

R154 Certificate of patent or utility model (reissue)

Free format text: JAPANESE INTERMEDIATE CODE: R154

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 4

Free format text: PAYMENT UNTIL: 20110511

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 4

Free format text: PAYMENT UNTIL: 20110511

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 5

Free format text: PAYMENT UNTIL: 20120511

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130511

Year of fee payment: 6

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130511

Year of fee payment: 6

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250