JPS54107255A - Impurity diffusion method - Google Patents
Impurity diffusion methodInfo
- Publication number
- JPS54107255A JPS54107255A JP1342278A JP1342278A JPS54107255A JP S54107255 A JPS54107255 A JP S54107255A JP 1342278 A JP1342278 A JP 1342278A JP 1342278 A JP1342278 A JP 1342278A JP S54107255 A JPS54107255 A JP S54107255A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- impurity
- type
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE: To diffuse impurity in the Si substrate by subjecting the Si substrate to heat treatment in a high-impurity gas atmosphere after causing a poly-Si thin layer adhere to the surface of the Si substrate.
CONSTITUTION: SiO2 layer 2 is formed on the surface of N-type collector substrate 1, and hole 3 is provided, and p-type impurity is diffused to form p-type base layer 4. At this time, since SiO2 layer 5 is generated on the surface of base layer 4, poly-Si thin layer 7 is caused to adhere to layer 5 by the CVD method after hole 6 is provided. Next, the Si substrate is put in an impurity diffusion furnace, and the high- density diffusion of N-type impurity is performed to form N-type emitter region 8. Next, after SiO2 layer 9 is removed by etching, poly-Si layer 7 is processed into a desired form by photo etching.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1342278A JPS54107255A (en) | 1978-02-10 | 1978-02-10 | Impurity diffusion method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1342278A JPS54107255A (en) | 1978-02-10 | 1978-02-10 | Impurity diffusion method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54107255A true JPS54107255A (en) | 1979-08-22 |
Family
ID=11832686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1342278A Pending JPS54107255A (en) | 1978-02-10 | 1978-02-10 | Impurity diffusion method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54107255A (en) |
-
1978
- 1978-02-10 JP JP1342278A patent/JPS54107255A/en active Pending
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