JPS5389372A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5389372A
JPS5389372A JP15918876A JP15918876A JPS5389372A JP S5389372 A JPS5389372 A JP S5389372A JP 15918876 A JP15918876 A JP 15918876A JP 15918876 A JP15918876 A JP 15918876A JP S5389372 A JPS5389372 A JP S5389372A
Authority
JP
Japan
Prior art keywords
production
semiconductor device
wafer
dividedly
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15918876A
Other languages
Japanese (ja)
Other versions
JPS5538050B2 (en
Inventor
Kenji Sugishima
Hideo Tamura
Satoshi Suda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15918876A priority Critical patent/JPS5389372A/en
Publication of JPS5389372A publication Critical patent/JPS5389372A/en
Publication of JPS5538050B2 publication Critical patent/JPS5538050B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE: To improve the contact between mask and wafer and obtain fine patterns at high accuracy by dividedly performing exposure and providing quiescent period in-between in order to exhaust the nitrogen gas evolved from photo resist to the outside of the wafer.
COPYRIGHT: (C)1978,JPO&Japio
JP15918876A 1976-12-28 1976-12-28 Production of semiconductor device Granted JPS5389372A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15918876A JPS5389372A (en) 1976-12-28 1976-12-28 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15918876A JPS5389372A (en) 1976-12-28 1976-12-28 Production of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5389372A true JPS5389372A (en) 1978-08-05
JPS5538050B2 JPS5538050B2 (en) 1980-10-02

Family

ID=15688225

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15918876A Granted JPS5389372A (en) 1976-12-28 1976-12-28 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5389372A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6158013A (en) * 1984-08-29 1986-03-25 Hitachi Ltd Positioning control system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6158013A (en) * 1984-08-29 1986-03-25 Hitachi Ltd Positioning control system

Also Published As

Publication number Publication date
JPS5538050B2 (en) 1980-10-02

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