JPS5356974A - Device for positioning and maintaining target in attitude selected to standard attitude - Google Patents

Device for positioning and maintaining target in attitude selected to standard attitude

Info

Publication number
JPS5356974A
JPS5356974A JP11008677A JP11008677A JPS5356974A JP S5356974 A JPS5356974 A JP S5356974A JP 11008677 A JP11008677 A JP 11008677A JP 11008677 A JP11008677 A JP 11008677A JP S5356974 A JPS5356974 A JP S5356974A
Authority
JP
Japan
Prior art keywords
attitude
positioning
standard
maintaining target
maintaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11008677A
Other languages
English (en)
Other versions
JPS5343024B2 (ja
Inventor
Furederitsuku Hoo Andoriyuu
Furederitsuku Howaito Uiriamu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5356974A publication Critical patent/JPS5356974A/ja
Publication of JPS5343024B2 publication Critical patent/JPS5343024B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
JP11008677A 1976-11-01 1977-09-14 Device for positioning and maintaining target in attitude selected to standard attitude Granted JPS5356974A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/737,819 US4093378A (en) 1976-11-01 1976-11-01 Alignment apparatus

Publications (2)

Publication Number Publication Date
JPS5356974A true JPS5356974A (en) 1978-05-23
JPS5343024B2 JPS5343024B2 (ja) 1978-11-16

Family

ID=24965450

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11008677A Granted JPS5356974A (en) 1976-11-01 1977-09-14 Device for positioning and maintaining target in attitude selected to standard attitude

Country Status (6)

Country Link
US (1) US4093378A (ja)
JP (1) JPS5356974A (ja)
BR (1) BR7707305A (ja)
DE (1) DE2748101C3 (ja)
FR (1) FR2369610A1 (ja)
GB (1) GB1583970A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
JPS611021A (ja) * 1985-05-13 1986-01-07 Hitachi Ltd 露光装置における位置設定方法
JPH03142828A (ja) * 1989-10-27 1991-06-18 Tokyo Electron Ltd 処理装置

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4189230A (en) * 1977-10-26 1980-02-19 Fujitsu Limited Wafer holder with spring-loaded wafer-holding means
GB2063523B (en) * 1978-10-20 1982-12-15 Hitachi Ltd Wafer position setting apparatus
US4198159A (en) * 1978-12-29 1980-04-15 International Business Machines Corporation Optical alignment system in projection printing
US4344160A (en) * 1980-05-02 1982-08-10 The Perkin-Elmer Corporation Automatic wafer focusing and flattening system
JPS5867026A (ja) * 1981-10-19 1983-04-21 Hitachi Ltd ステップアンドリピート方式の露光装置
US4472824A (en) * 1982-08-04 1984-09-18 The Perkin-Elmer Corporation Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography
JPS59154023A (ja) * 1983-02-22 1984-09-03 Nippon Kogaku Kk <Nikon> 板状体の姿勢制御装置
US4506184A (en) * 1984-01-10 1985-03-19 Varian Associates, Inc. Deformable chuck driven by piezoelectric means
JPS60155358A (ja) * 1984-01-23 1985-08-15 Disco Abrasive Sys Ltd 半導体ウエ−ハの表面を研削する方法及び装置
KR900001241B1 (ko) * 1985-04-17 1990-03-05 가부시기가이샤 히다찌세이사꾸쇼 광 노출 장치
US4749867A (en) * 1985-04-30 1988-06-07 Canon Kabushiki Kaisha Exposure apparatus
US4637713A (en) * 1985-09-27 1987-01-20 Scss Instruments, Inc. Pellicle mounting apparatus
US4791458A (en) * 1986-11-13 1988-12-13 Masi Amerigo De Multi-purpose apparatus for the imaging of printed wired boards
DE3725188A1 (de) * 1987-07-29 1989-02-09 Siemens Ag Halbautomatischer substrathalter fuer waermeprozesse
JP2601834B2 (ja) * 1987-08-26 1997-04-16 株式会社東芝 テーブル装置
DE4114284C2 (de) * 1991-05-02 1993-10-07 Juergen Dipl Ing Pickenhan Vorrichtung zum Behandeln oder Bearbeiten eines Werkstückes, insbesondere einer Schaltkarte
DE4116392C2 (de) * 1991-05-18 2001-05-03 Micronas Gmbh Halterung zur einseitigen Naßätzung von Halbleiterscheiben
DE4120497C2 (de) * 1991-06-21 1994-05-26 Zeiss Carl Jena Gmbh Ausrichtevorrichtung zur Justierung von im funktionellen und geometrischen Zusammenhang stehenden Objekten
AT405224B (de) * 1992-06-05 1999-06-25 Thallner Erich Vorrichtung zum ausrichten, zusammenführen und festhalten von scheibenförmigen bauteilen
JPH06268051A (ja) * 1993-03-10 1994-09-22 Mitsubishi Electric Corp ウエハ剥し装置
JP3445374B2 (ja) * 1994-09-06 2003-09-08 富士写真フイルム株式会社 写真プリンタの可変マスク機構および可変マスク機構のマスク位置決め方法
US5563684A (en) * 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
US5773951A (en) * 1996-03-25 1998-06-30 Digital Test Corporation Wafer prober having sub-micron alignment accuracy
US6113165A (en) * 1998-10-02 2000-09-05 Taiwan Semiconductor Manufacturing Co., Ltd. Self-sensing wafer holder and method of using
US7530271B2 (en) * 2003-03-13 2009-05-12 Sonix, Inc. Method and apparatus for coupling ultrasound between an integral ultrasonic transducer assembly and an object
JP4067511B2 (ja) * 2004-04-07 2008-03-26 アイシン化工株式会社 セグメント摩擦材の製造方法
US7661315B2 (en) * 2004-05-24 2010-02-16 Sonix, Inc. Method and apparatus for ultrasonic scanning of a fabrication wafer
US7917317B2 (en) 2006-07-07 2011-03-29 Sonix, Inc. Ultrasonic inspection using acoustic modeling
CN104772722A (zh) * 2014-12-31 2015-07-15 苏州市博奥塑胶电子有限公司 一种新型下模具

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674368A (en) * 1970-05-11 1972-07-04 Johannsmeier Karl Heinz Out of contact optical alignment and exposure apparatus
US3722996A (en) * 1971-01-04 1973-03-27 Electromask Inc Optical pattern generator or repeating projector or the like
US3955072A (en) * 1971-03-22 1976-05-04 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects for example a semiconductor wafer and a transparent mask
US3940211A (en) * 1971-03-22 1976-02-24 Kasper Instruments, Inc. Step-and-repeat projection alignment and exposure system
JPS5837114B2 (ja) * 1972-01-19 1983-08-13 キヤノン株式会社 デンキシキマニピユレ−タ
US3729966A (en) * 1972-02-02 1973-05-01 Ibm Apparatus for contouring the surface of thin elements
US3858978A (en) * 1973-08-10 1975-01-07 Kasper Instruments Chuck for use in out-of-contact optical alignment and exposure apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562630A (en) * 1979-06-22 1981-01-12 Hitachi Ltd Installing of wafer position in projection aligner
JPS611021A (ja) * 1985-05-13 1986-01-07 Hitachi Ltd 露光装置における位置設定方法
JPH03142828A (ja) * 1989-10-27 1991-06-18 Tokyo Electron Ltd 処理装置

Also Published As

Publication number Publication date
JPS5343024B2 (ja) 1978-11-16
FR2369610A1 (fr) 1978-05-26
GB1583970A (en) 1981-02-04
FR2369610B1 (ja) 1980-01-04
DE2748101B2 (de) 1979-04-26
US4093378A (en) 1978-06-06
BR7707305A (pt) 1978-07-25
DE2748101A1 (de) 1978-05-03
DE2748101C3 (de) 1979-12-13

Similar Documents

Publication Publication Date Title
JPS5356974A (en) Device for positioning and maintaining target in attitude selected to standard attitude
ZA763978B (en) Improvements in or relating to data storage systems
JPS52123074A (en) Device and method for storing leaflets
IL48809A0 (en) Tracking device
JPS534653A (en) Manicure device
ZA771173B (en) Improvements in or relating to protective devices
ZA771171B (en) Improvements in or relating to protective devices
JPS5362643A (en) Cultivating method and device for planttsprout
JPS5290367A (en) Device in rack
ZA773889B (en) Sharpening device
JPS5384557A (en) Positioning device
JPS52107856A (en) Positioning device
ZA776769B (en) Positioning device
JPS5642264A (en) Map device
JPS5350992A (en) Method and device for tracing target
ZA773860B (en) An improvement in or relating to automatic transfer control device
JPS5433721A (en) Calculating device for exposureetime and irissopening in photographic device
JPS533897A (en) Change delivering device
JPS533896A (en) Change delivering device
JPS52134346A (en) Storage device
JPS5317036A (en) Storage device
JPS52142655A (en) Small metall ball making device and method
JPS535547A (en) Device for identifying part attitude
JPS54126571A (en) Attitude standard device
JPS54104692A (en) Device for aiming in eyeerefractometer