JPS5356018A - Flame resisting illumination sensitive element - Google Patents

Flame resisting illumination sensitive element

Info

Publication number
JPS5356018A
JPS5356018A JP12823777A JP12823777A JPS5356018A JP S5356018 A JPS5356018 A JP S5356018A JP 12823777 A JP12823777 A JP 12823777A JP 12823777 A JP12823777 A JP 12823777A JP S5356018 A JPS5356018 A JP S5356018A
Authority
JP
Japan
Prior art keywords
sensitive element
flame resisting
illumination sensitive
resisting illumination
flame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12823777A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5751655B2 (de
Inventor
Edomundo Gaabei Jiyosefu
Fuiritsupu Piretsuto Iban
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS5356018A publication Critical patent/JPS5356018A/ja
Publication of JPS5751655B2 publication Critical patent/JPS5751655B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP12823777A 1976-10-27 1977-10-27 Flame resisting illumination sensitive element Granted JPS5356018A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73597976A 1976-10-27 1976-10-27
US78090777A 1977-03-24 1977-03-24

Publications (2)

Publication Number Publication Date
JPS5356018A true JPS5356018A (en) 1978-05-22
JPS5751655B2 JPS5751655B2 (de) 1982-11-02

Family

ID=27112970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12823777A Granted JPS5356018A (en) 1976-10-27 1977-10-27 Flame resisting illumination sensitive element

Country Status (9)

Country Link
JP (1) JPS5356018A (de)
CA (1) CA1116919A (de)
CH (1) CH630767A5 (de)
DE (1) DE2747947C2 (de)
FR (1) FR2369590A1 (de)
GB (1) GB1588368A (de)
IT (1) IT1089005B (de)
NL (1) NL7711723A (de)
SE (1) SE435106B (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5969752A (ja) * 1982-10-14 1984-04-20 Sekisui Chem Co Ltd 光重合可能な画像形成用組成物
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
JPS63158157U (de) * 1987-04-07 1988-10-17
EP0822448B1 (de) * 1996-08-02 2000-11-02 E.I. Du Pont De Nemours And Company Flexible, flammhemmende fotopolymerisierbare Zusammensetzung zur Beschichtung von Leiterplatten
WO2003038526A1 (fr) 2001-10-30 2003-05-08 Kaneka Corporation Composition de resine photosensible et films et stratifies photosensibles ainsi obtenus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498281A (de) * 1972-05-11 1974-01-24
JPS49107048A (de) * 1973-02-12 1974-10-11
JPS5046315A (de) * 1973-08-29 1975-04-25
JPS5179342A (de) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US3261686A (en) * 1963-04-23 1966-07-19 Du Pont Photopolymerizable compositions and elements
DE1950120A1 (de) * 1968-10-09 1970-04-30 Du Pont Heterogene fotopolymerisierbare Masse
US3682800A (en) * 1969-07-25 1972-08-08 Toray Industries Method for producing acrylonitrile copolymers
US3657088A (en) * 1969-12-17 1972-04-18 Bayer Ag Moulding and coating masses hardenable by uv irradiation
GB1312492A (en) * 1969-12-19 1973-04-04 Mccall Corp Crosslinked polymers and process therefor
US3887450A (en) * 1971-02-04 1975-06-03 Dynachem Corp Photopolymerizable compositions containing polymeric binding agents
DE2344680A1 (de) * 1973-09-05 1975-03-20 Bruno Prof Dr Vollmert Photopolymerisierbare mischung und deren verwendung zur herstellung von reliefdruckplatten

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498281A (de) * 1972-05-11 1974-01-24
JPS49107048A (de) * 1973-02-12 1974-10-11
JPS5046315A (de) * 1973-08-29 1975-04-25
JPS5179342A (de) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5969752A (ja) * 1982-10-14 1984-04-20 Sekisui Chem Co Ltd 光重合可能な画像形成用組成物
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom

Also Published As

Publication number Publication date
SE7712054L (sv) 1978-04-28
NL7711723A (nl) 1978-05-02
SE435106B (sv) 1984-09-03
IT1089005B (it) 1985-06-10
FR2369590B1 (de) 1981-11-13
CA1116919A (en) 1982-01-26
DE2747947A1 (de) 1978-05-03
CH630767A5 (en) 1982-06-30
DE2747947C2 (de) 1983-12-22
GB1588368A (en) 1981-04-23
JPS5751655B2 (de) 1982-11-02
FR2369590A1 (fr) 1978-05-26

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