JPS5345968A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5345968A JPS5345968A JP12072476A JP12072476A JPS5345968A JP S5345968 A JPS5345968 A JP S5345968A JP 12072476 A JP12072476 A JP 12072476A JP 12072476 A JP12072476 A JP 12072476A JP S5345968 A JPS5345968 A JP S5345968A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor device
- inpurities
- planar
- employed
- obtaining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12072476A JPS5345968A (en) | 1976-10-06 | 1976-10-06 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12072476A JPS5345968A (en) | 1976-10-06 | 1976-10-06 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5345968A true JPS5345968A (en) | 1978-04-25 |
JPS5551332B2 JPS5551332B2 (enrdf_load_html_response) | 1980-12-23 |
Family
ID=14793423
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12072476A Granted JPS5345968A (en) | 1976-10-06 | 1976-10-06 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5345968A (enrdf_load_html_response) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59162219A (ja) * | 1983-03-04 | 1984-09-13 | Chugai Ro Kogyo Kaisha Ltd | 加熱炉のスキツドボタン |
-
1976
- 1976-10-06 JP JP12072476A patent/JPS5345968A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5551332B2 (enrdf_load_html_response) | 1980-12-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS534472A (en) | Semiconductor package | |
JPS542060A (en) | Semiconductor wafer | |
JPS51130174A (en) | Semiconductor device process | |
JPS5345968A (en) | Semiconductor device | |
JPS52128063A (en) | Manufacture of semiconductor device | |
JPS5363871A (en) | Production of semiconductor device | |
JPS5342659A (en) | Semiconductor integrated circuit | |
JPS53118374A (en) | Integrated diode device | |
JPS52119875A (en) | Formation of isolation area | |
JPS52153383A (en) | Preparation of semiconductor device | |
JPS51118965A (en) | Insulation film of semiconductor device | |
JPS5320857A (en) | Semiconductor device | |
JPS546461A (en) | Manufacture of semiconductor device | |
JPS5316586A (en) | Semiconductor device | |
JPS5372567A (en) | Semiconductor device | |
JPS5338981A (en) | Semiconductor device | |
JPS5422171A (en) | Manufacture of semiconductor device | |
JPS5360176A (en) | Semiconductor device | |
JPS5373979A (en) | Transistor device | |
JPS5368070A (en) | Etching method | |
JPS52134387A (en) | Semiconductor laser device | |
JPS528787A (en) | Semiconductor device process | |
JPS51132985A (en) | Semiconductor device | |
JPS542664A (en) | Semiconductor device | |
JPS5358783A (en) | Semiconductor device and its production |