JPS52119875A - Formation of isolation area - Google Patents
Formation of isolation areaInfo
- Publication number
- JPS52119875A JPS52119875A JP3660376A JP3660376A JPS52119875A JP S52119875 A JPS52119875 A JP S52119875A JP 3660376 A JP3660376 A JP 3660376A JP 3660376 A JP3660376 A JP 3660376A JP S52119875 A JPS52119875 A JP S52119875A
- Authority
- JP
- Japan
- Prior art keywords
- isolation area
- formation
- parasitric
- minimize
- capacity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To minimize the parasitric capacity between an isolation area and a semiconductor printed board.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3660376A JPS52119875A (en) | 1976-03-31 | 1976-03-31 | Formation of isolation area |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3660376A JPS52119875A (en) | 1976-03-31 | 1976-03-31 | Formation of isolation area |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52119875A true JPS52119875A (en) | 1977-10-07 |
Family
ID=12474360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3660376A Pending JPS52119875A (en) | 1976-03-31 | 1976-03-31 | Formation of isolation area |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52119875A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55154737A (en) * | 1979-05-22 | 1980-12-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method of forming pattern |
JPS5637630A (en) * | 1979-09-05 | 1981-04-11 | Fujitsu Ltd | Formation of thin film |
JPH09283615A (en) * | 1996-04-12 | 1997-10-31 | Lg Semicon Co Ltd | Structure of isolation film of semiconductor element and formation of the film |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5061190A (en) * | 1973-09-28 | 1975-05-26 |
-
1976
- 1976-03-31 JP JP3660376A patent/JPS52119875A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5061190A (en) * | 1973-09-28 | 1975-05-26 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55154737A (en) * | 1979-05-22 | 1980-12-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Method of forming pattern |
JPS5637630A (en) * | 1979-09-05 | 1981-04-11 | Fujitsu Ltd | Formation of thin film |
JPH09283615A (en) * | 1996-04-12 | 1997-10-31 | Lg Semicon Co Ltd | Structure of isolation film of semiconductor element and formation of the film |
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