JPS52119875A - Formation of isolation area - Google Patents

Formation of isolation area

Info

Publication number
JPS52119875A
JPS52119875A JP3660376A JP3660376A JPS52119875A JP S52119875 A JPS52119875 A JP S52119875A JP 3660376 A JP3660376 A JP 3660376A JP 3660376 A JP3660376 A JP 3660376A JP S52119875 A JPS52119875 A JP S52119875A
Authority
JP
Japan
Prior art keywords
isolation area
formation
parasitric
minimize
capacity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3660376A
Other languages
Japanese (ja)
Inventor
Minoru Inoue
Masanao Itoga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3660376A priority Critical patent/JPS52119875A/en
Publication of JPS52119875A publication Critical patent/JPS52119875A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To minimize the parasitric capacity between an isolation area and a semiconductor printed board.
COPYRIGHT: (C)1977,JPO&Japio
JP3660376A 1976-03-31 1976-03-31 Formation of isolation area Pending JPS52119875A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3660376A JPS52119875A (en) 1976-03-31 1976-03-31 Formation of isolation area

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3660376A JPS52119875A (en) 1976-03-31 1976-03-31 Formation of isolation area

Publications (1)

Publication Number Publication Date
JPS52119875A true JPS52119875A (en) 1977-10-07

Family

ID=12474360

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3660376A Pending JPS52119875A (en) 1976-03-31 1976-03-31 Formation of isolation area

Country Status (1)

Country Link
JP (1) JPS52119875A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154737A (en) * 1979-05-22 1980-12-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Method of forming pattern
JPS5637630A (en) * 1979-09-05 1981-04-11 Fujitsu Ltd Formation of thin film
JPH09283615A (en) * 1996-04-12 1997-10-31 Lg Semicon Co Ltd Structure of isolation film of semiconductor element and formation of the film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5061190A (en) * 1973-09-28 1975-05-26

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5061190A (en) * 1973-09-28 1975-05-26

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55154737A (en) * 1979-05-22 1980-12-02 Chiyou Lsi Gijutsu Kenkyu Kumiai Method of forming pattern
JPS5637630A (en) * 1979-09-05 1981-04-11 Fujitsu Ltd Formation of thin film
JPH09283615A (en) * 1996-04-12 1997-10-31 Lg Semicon Co Ltd Structure of isolation film of semiconductor element and formation of the film

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