JPS5330330A - Developing liquid for radiant ray resist - Google Patents

Developing liquid for radiant ray resist

Info

Publication number
JPS5330330A
JPS5330330A JP10478876A JP10478876A JPS5330330A JP S5330330 A JPS5330330 A JP S5330330A JP 10478876 A JP10478876 A JP 10478876A JP 10478876 A JP10478876 A JP 10478876A JP S5330330 A JPS5330330 A JP S5330330A
Authority
JP
Japan
Prior art keywords
developing liquid
radiant ray
ray resist
resist
radiant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10478876A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5421737B2 (enExample
Inventor
Toshisuke Kitakoji
Yasuhiro Yoneda
Masatoshi Fujimori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP10478876A priority Critical patent/JPS5330330A/ja
Publication of JPS5330330A publication Critical patent/JPS5330330A/ja
Publication of JPS5421737B2 publication Critical patent/JPS5421737B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10478876A 1976-09-01 1976-09-01 Developing liquid for radiant ray resist Granted JPS5330330A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10478876A JPS5330330A (en) 1976-09-01 1976-09-01 Developing liquid for radiant ray resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10478876A JPS5330330A (en) 1976-09-01 1976-09-01 Developing liquid for radiant ray resist

Publications (2)

Publication Number Publication Date
JPS5330330A true JPS5330330A (en) 1978-03-22
JPS5421737B2 JPS5421737B2 (enExample) 1979-08-01

Family

ID=14390191

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10478876A Granted JPS5330330A (en) 1976-09-01 1976-09-01 Developing liquid for radiant ray resist

Country Status (1)

Country Link
JP (1) JPS5330330A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS59180546A (ja) * 1983-03-30 1984-10-13 Daikin Ind Ltd レジスト被膜の現像方法
JPS6170719A (ja) * 1984-09-14 1986-04-11 Matsushita Electronics Corp パタ−ン形成方法
JPS62175739A (ja) * 1986-01-30 1987-08-01 Toshiba Corp パタ−ン形成方法
JPH0328851A (ja) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd 電子ビームレジストのパターン形成方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5683740A (en) * 1979-12-13 1981-07-08 Japan Synthetic Rubber Co Ltd Developer for polymer photoresist
JPS59180546A (ja) * 1983-03-30 1984-10-13 Daikin Ind Ltd レジスト被膜の現像方法
JPS6170719A (ja) * 1984-09-14 1986-04-11 Matsushita Electronics Corp パタ−ン形成方法
JPS62175739A (ja) * 1986-01-30 1987-08-01 Toshiba Corp パタ−ン形成方法
JPH0328851A (ja) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd 電子ビームレジストのパターン形成方法

Also Published As

Publication number Publication date
JPS5421737B2 (enExample) 1979-08-01

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