JPS53123929A - Developing liquid for use in radiant ray positive type resist - Google Patents

Developing liquid for use in radiant ray positive type resist

Info

Publication number
JPS53123929A
JPS53123929A JP3867777A JP3867777A JPS53123929A JP S53123929 A JPS53123929 A JP S53123929A JP 3867777 A JP3867777 A JP 3867777A JP 3867777 A JP3867777 A JP 3867777A JP S53123929 A JPS53123929 A JP S53123929A
Authority
JP
Japan
Prior art keywords
positive type
developing liquid
type resist
radiant ray
ray positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3867777A
Other languages
Japanese (ja)
Other versions
JPS571821B2 (en
Inventor
Toshimasa Nakayama
Akira Yokota
Hisashi Nakane
Susumu Ichikawa
Kouichi Kotake
Eiji Andou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON DENSHI KOGYO SHINKO
TOKYO OUKA KOUGIYOU KK
Original Assignee
NIPPON DENSHI KOGYO SHINKO
TOKYO OUKA KOUGIYOU KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON DENSHI KOGYO SHINKO, TOKYO OUKA KOUGIYOU KK filed Critical NIPPON DENSHI KOGYO SHINKO
Priority to JP3867777A priority Critical patent/JPS53123929A/en
Publication of JPS53123929A publication Critical patent/JPS53123929A/en
Publication of JPS571821B2 publication Critical patent/JPS571821B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP3867777A 1977-04-05 1977-04-05 Developing liquid for use in radiant ray positive type resist Granted JPS53123929A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3867777A JPS53123929A (en) 1977-04-05 1977-04-05 Developing liquid for use in radiant ray positive type resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3867777A JPS53123929A (en) 1977-04-05 1977-04-05 Developing liquid for use in radiant ray positive type resist

Publications (2)

Publication Number Publication Date
JPS53123929A true JPS53123929A (en) 1978-10-28
JPS571821B2 JPS571821B2 (en) 1982-01-13

Family

ID=12531896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3867777A Granted JPS53123929A (en) 1977-04-05 1977-04-05 Developing liquid for use in radiant ray positive type resist

Country Status (1)

Country Link
JP (1) JPS53123929A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55148427A (en) * 1979-05-09 1980-11-19 Nec Corp Manufacturing of pattern
JPS55150227A (en) * 1979-05-10 1980-11-22 Nec Corp Method of fabricating pattern
JPS57100429A (en) * 1980-10-16 1982-06-22 Siemens Ag Manufacture of structural body
EP0400657A2 (en) * 1989-06-01 1990-12-05 Fuji Photo Film Co., Ltd. Process for developing of ps plates requiring no dampening water

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS512430A (en) * 1974-05-28 1976-01-10 Ibm Mechiru isopuchiru ketongenzozai
JPS51147324A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Solvent for electronic wire resist
JPS526203A (en) * 1975-06-30 1977-01-18 Ibm Method of forming positive resist image

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS512430A (en) * 1974-05-28 1976-01-10 Ibm Mechiru isopuchiru ketongenzozai
JPS51147324A (en) * 1975-06-13 1976-12-17 Fujitsu Ltd Solvent for electronic wire resist
JPS526203A (en) * 1975-06-30 1977-01-18 Ibm Method of forming positive resist image

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55148427A (en) * 1979-05-09 1980-11-19 Nec Corp Manufacturing of pattern
JPS55150227A (en) * 1979-05-10 1980-11-22 Nec Corp Method of fabricating pattern
JPS57100429A (en) * 1980-10-16 1982-06-22 Siemens Ag Manufacture of structural body
JPH0310089B2 (en) * 1980-10-16 1991-02-12 Siemens Ag
EP0400657A2 (en) * 1989-06-01 1990-12-05 Fuji Photo Film Co., Ltd. Process for developing of ps plates requiring no dampening water

Also Published As

Publication number Publication date
JPS571821B2 (en) 1982-01-13

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