JPS53123929A - Developing liquid for use in radiant ray positive type resist - Google Patents
Developing liquid for use in radiant ray positive type resistInfo
- Publication number
- JPS53123929A JPS53123929A JP3867777A JP3867777A JPS53123929A JP S53123929 A JPS53123929 A JP S53123929A JP 3867777 A JP3867777 A JP 3867777A JP 3867777 A JP3867777 A JP 3867777A JP S53123929 A JPS53123929 A JP S53123929A
- Authority
- JP
- Japan
- Prior art keywords
- positive type
- developing liquid
- type resist
- radiant ray
- ray positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3867777A JPS53123929A (en) | 1977-04-05 | 1977-04-05 | Developing liquid for use in radiant ray positive type resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3867777A JPS53123929A (en) | 1977-04-05 | 1977-04-05 | Developing liquid for use in radiant ray positive type resist |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53123929A true JPS53123929A (en) | 1978-10-28 |
JPS571821B2 JPS571821B2 (en) | 1982-01-13 |
Family
ID=12531896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3867777A Granted JPS53123929A (en) | 1977-04-05 | 1977-04-05 | Developing liquid for use in radiant ray positive type resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53123929A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55148427A (en) * | 1979-05-09 | 1980-11-19 | Nec Corp | Manufacturing of pattern |
JPS55150227A (en) * | 1979-05-10 | 1980-11-22 | Nec Corp | Method of fabricating pattern |
JPS57100429A (en) * | 1980-10-16 | 1982-06-22 | Siemens Ag | Manufacture of structural body |
EP0400657A2 (en) * | 1989-06-01 | 1990-12-05 | Fuji Photo Film Co., Ltd. | Process for developing of ps plates requiring no dampening water |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS512430A (en) * | 1974-05-28 | 1976-01-10 | Ibm | Mechiru isopuchiru ketongenzozai |
JPS51147324A (en) * | 1975-06-13 | 1976-12-17 | Fujitsu Ltd | Solvent for electronic wire resist |
JPS526203A (en) * | 1975-06-30 | 1977-01-18 | Ibm | Method of forming positive resist image |
-
1977
- 1977-04-05 JP JP3867777A patent/JPS53123929A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS512430A (en) * | 1974-05-28 | 1976-01-10 | Ibm | Mechiru isopuchiru ketongenzozai |
JPS51147324A (en) * | 1975-06-13 | 1976-12-17 | Fujitsu Ltd | Solvent for electronic wire resist |
JPS526203A (en) * | 1975-06-30 | 1977-01-18 | Ibm | Method of forming positive resist image |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55148427A (en) * | 1979-05-09 | 1980-11-19 | Nec Corp | Manufacturing of pattern |
JPS55150227A (en) * | 1979-05-10 | 1980-11-22 | Nec Corp | Method of fabricating pattern |
JPS57100429A (en) * | 1980-10-16 | 1982-06-22 | Siemens Ag | Manufacture of structural body |
JPH0310089B2 (en) * | 1980-10-16 | 1991-02-12 | Siemens Ag | |
EP0400657A2 (en) * | 1989-06-01 | 1990-12-05 | Fuji Photo Film Co., Ltd. | Process for developing of ps plates requiring no dampening water |
Also Published As
Publication number | Publication date |
---|---|
JPS571821B2 (en) | 1982-01-13 |
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