JPS5329671A - Photomask cleaning method - Google Patents

Photomask cleaning method

Info

Publication number
JPS5329671A
JPS5329671A JP10357676A JP10357676A JPS5329671A JP S5329671 A JPS5329671 A JP S5329671A JP 10357676 A JP10357676 A JP 10357676A JP 10357676 A JP10357676 A JP 10357676A JP S5329671 A JPS5329671 A JP S5329671A
Authority
JP
Japan
Prior art keywords
cleaning method
photomask cleaning
photomask
causing
remove
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10357676A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5326112B2 (ref
Inventor
Kazuo Niwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP10357676A priority Critical patent/JPS5329671A/ja
Publication of JPS5329671A publication Critical patent/JPS5329671A/ja
Publication of JPS5326112B2 publication Critical patent/JPS5326112B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10357676A 1976-09-01 1976-09-01 Photomask cleaning method Granted JPS5329671A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10357676A JPS5329671A (en) 1976-09-01 1976-09-01 Photomask cleaning method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10357676A JPS5329671A (en) 1976-09-01 1976-09-01 Photomask cleaning method

Publications (2)

Publication Number Publication Date
JPS5329671A true JPS5329671A (en) 1978-03-20
JPS5326112B2 JPS5326112B2 (ref) 1978-07-31

Family

ID=14357603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10357676A Granted JPS5329671A (en) 1976-09-01 1976-09-01 Photomask cleaning method

Country Status (1)

Country Link
JP (1) JPS5329671A (ref)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5911629A (ja) * 1982-07-12 1984-01-21 Toshiba Corp 表面清浄化方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5911629A (ja) * 1982-07-12 1984-01-21 Toshiba Corp 表面清浄化方法

Also Published As

Publication number Publication date
JPS5326112B2 (ref) 1978-07-31

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