JPS53140240A - Aluminum film working method - Google Patents

Aluminum film working method

Info

Publication number
JPS53140240A
JPS53140240A JP5428677A JP5428677A JPS53140240A JP S53140240 A JPS53140240 A JP S53140240A JP 5428677 A JP5428677 A JP 5428677A JP 5428677 A JP5428677 A JP 5428677A JP S53140240 A JPS53140240 A JP S53140240A
Authority
JP
Japan
Prior art keywords
working method
film working
aluminum film
bromine
chlorine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5428677A
Other languages
Japanese (ja)
Other versions
JPS6031906B2 (en
Inventor
Tatsumi Mizutani
Hideo Komatsu
Shinya Iida
Yoshio Honma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5428677A priority Critical patent/JPS6031906B2/en
Publication of JPS53140240A publication Critical patent/JPS53140240A/en
Publication of JPS6031906B2 publication Critical patent/JPS6031906B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To provide an Al film working method which prevents incomplete etching at the boundary part of Al and forms no residue of foreign matter on the etched surface by adding fluorine to a plasma gas contg. chlorine or bromine as the main constituent element.
JP5428677A 1977-05-13 1977-05-13 Processing method for aluminum film or base alloy film Expired JPS6031906B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5428677A JPS6031906B2 (en) 1977-05-13 1977-05-13 Processing method for aluminum film or base alloy film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5428677A JPS6031906B2 (en) 1977-05-13 1977-05-13 Processing method for aluminum film or base alloy film

Publications (2)

Publication Number Publication Date
JPS53140240A true JPS53140240A (en) 1978-12-07
JPS6031906B2 JPS6031906B2 (en) 1985-07-25

Family

ID=12966309

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5428677A Expired JPS6031906B2 (en) 1977-05-13 1977-05-13 Processing method for aluminum film or base alloy film

Country Status (1)

Country Link
JP (1) JPS6031906B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511429A (en) * 1981-04-15 1985-04-16 Hitachi, Ltd. Process for dry etching of aluminum and its alloy
JPH03215938A (en) * 1990-01-22 1991-09-20 Sony Corp Dry etching
JPH0774156A (en) * 1993-08-31 1995-03-17 Nec Corp Manufacture of semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62114807A (en) * 1985-11-11 1987-05-26 Toshiba Corp Tool breakage detector

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511429A (en) * 1981-04-15 1985-04-16 Hitachi, Ltd. Process for dry etching of aluminum and its alloy
JPH03215938A (en) * 1990-01-22 1991-09-20 Sony Corp Dry etching
JPH0774156A (en) * 1993-08-31 1995-03-17 Nec Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS6031906B2 (en) 1985-07-25

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