JPS53112670A - Monitor method of ion etching - Google Patents

Monitor method of ion etching

Info

Publication number
JPS53112670A
JPS53112670A JP2821077A JP2821077A JPS53112670A JP S53112670 A JPS53112670 A JP S53112670A JP 2821077 A JP2821077 A JP 2821077A JP 2821077 A JP2821077 A JP 2821077A JP S53112670 A JPS53112670 A JP S53112670A
Authority
JP
Japan
Prior art keywords
ion etching
monitor method
monitor
etching
enable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2821077A
Other languages
Japanese (ja)
Inventor
Takeji Fujiwara
Koichi Hamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2821077A priority Critical patent/JPS53112670A/en
Publication of JPS53112670A publication Critical patent/JPS53112670A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To enable to monitor for the condition of etching from the change in the amount of light of reflection beam, by radiating laser beam on etched surface.
JP2821077A 1977-03-14 1977-03-14 Monitor method of ion etching Pending JPS53112670A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2821077A JPS53112670A (en) 1977-03-14 1977-03-14 Monitor method of ion etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2821077A JPS53112670A (en) 1977-03-14 1977-03-14 Monitor method of ion etching

Publications (1)

Publication Number Publication Date
JPS53112670A true JPS53112670A (en) 1978-10-02

Family

ID=12242280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2821077A Pending JPS53112670A (en) 1977-03-14 1977-03-14 Monitor method of ion etching

Country Status (1)

Country Link
JP (1) JPS53112670A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5728334A (en) * 1980-07-28 1982-02-16 Fujitsu Ltd Etching method
JPS59147433A (en) * 1983-02-14 1984-08-23 Hitachi Ltd Etching device
JPH04280650A (en) * 1991-03-08 1992-10-06 Fujitsu Ltd Manufacture of semiconductor device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5728334A (en) * 1980-07-28 1982-02-16 Fujitsu Ltd Etching method
JPH0157494B2 (en) * 1980-07-28 1989-12-06 Fujitsu Ltd
JPS59147433A (en) * 1983-02-14 1984-08-23 Hitachi Ltd Etching device
US4479848A (en) * 1983-02-14 1984-10-30 Hitachi, Ltd. Etching method and apparatus
JPH0546095B2 (en) * 1983-02-14 1993-07-13 Hitachi Ltd
JPH04280650A (en) * 1991-03-08 1992-10-06 Fujitsu Ltd Manufacture of semiconductor device

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