JPS53119670A - Ion implanting method and apparatus for the same - Google Patents
Ion implanting method and apparatus for the sameInfo
- Publication number
- JPS53119670A JPS53119670A JP3424877A JP3424877A JPS53119670A JP S53119670 A JPS53119670 A JP S53119670A JP 3424877 A JP3424877 A JP 3424877A JP 3424877 A JP3424877 A JP 3424877A JP S53119670 A JPS53119670 A JP S53119670A
- Authority
- JP
- Japan
- Prior art keywords
- same
- ion implanting
- implanting method
- radiating
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3424877A JPS53119670A (en) | 1977-03-28 | 1977-03-28 | Ion implanting method and apparatus for the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3424877A JPS53119670A (en) | 1977-03-28 | 1977-03-28 | Ion implanting method and apparatus for the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53119670A true JPS53119670A (en) | 1978-10-19 |
Family
ID=12408853
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3424877A Pending JPS53119670A (en) | 1977-03-28 | 1977-03-28 | Ion implanting method and apparatus for the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53119670A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5941828A (ja) * | 1982-09-01 | 1984-03-08 | Hitachi Ltd | イオン打込装置 |
JPS62224671A (ja) * | 1986-03-05 | 1987-10-02 | イ−トン コ−ポレ−シヨン | イオンビ−ム注入装置およびイオン注入を制御する方法 |
EP0287630A1 (en) * | 1986-10-08 | 1988-10-26 | Varian Associates, Inc. | Method and apparatus for constant angle of incidence scanning in ion beam systems |
-
1977
- 1977-03-28 JP JP3424877A patent/JPS53119670A/ja active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5941828A (ja) * | 1982-09-01 | 1984-03-08 | Hitachi Ltd | イオン打込装置 |
JPH0136696B2 (ja) * | 1982-09-01 | 1989-08-02 | Hitachi Ltd | |
JPS62224671A (ja) * | 1986-03-05 | 1987-10-02 | イ−トン コ−ポレ−シヨン | イオンビ−ム注入装置およびイオン注入を制御する方法 |
EP0287630A1 (en) * | 1986-10-08 | 1988-10-26 | Varian Associates, Inc. | Method and apparatus for constant angle of incidence scanning in ion beam systems |
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