JPS5299776A - Radiation sensitive high polymeric material - Google Patents

Radiation sensitive high polymeric material

Info

Publication number
JPS5299776A
JPS5299776A JP1602976A JP1602976A JPS5299776A JP S5299776 A JPS5299776 A JP S5299776A JP 1602976 A JP1602976 A JP 1602976A JP 1602976 A JP1602976 A JP 1602976A JP S5299776 A JPS5299776 A JP S5299776A
Authority
JP
Japan
Prior art keywords
polymeric material
radiation sensitive
high polymeric
sensitive high
beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1602976A
Other languages
English (en)
Other versions
JPS5521331B2 (ja
Inventor
Saburo Nonogaki
Yukio Hatano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Nippon Telegraph and Telephone Corp filed Critical Hitachi Ltd
Priority to JP1602976A priority Critical patent/JPS5299776A/ja
Priority to NL7701380.A priority patent/NL163332C/xx
Priority to FR7704387A priority patent/FR2341904A1/fr
Priority to GB6781/77A priority patent/GB1529123A/en
Priority to DE2706878A priority patent/DE2706878C3/de
Publication of JPS5299776A publication Critical patent/JPS5299776A/ja
Priority to US06/033,842 priority patent/US4279985A/en
Publication of JPS5521331B2 publication Critical patent/JPS5521331B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02—Polycondensates containing more than one epoxy group per molecule
    • C08G59/027—Polycondensates containing more than one epoxy group per molecule obtained by epoxidation of unsaturated precursor, e.g. polymer or monomer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08C—TREATMENT OR CHEMICAL MODIFICATION OF RUBBERS
    • C08C19/00—Chemical modification of rubber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Epoxy Resins (AREA)
JP1602976A 1976-02-18 1976-02-18 Radiation sensitive high polymeric material Granted JPS5299776A (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP1602976A JPS5299776A (en) 1976-02-18 1976-02-18 Radiation sensitive high polymeric material
NL7701380.A NL163332C (nl) 1976-02-18 1977-02-09 Werkwijze voor de vorming van beelden door bestraling.
FR7704387A FR2341904A1 (fr) 1976-02-18 1977-02-16 Matiere sensible aux radiations et procede de son utilisation
GB6781/77A GB1529123A (en) 1976-02-18 1977-02-17 Radiation sensitive material and its use
DE2706878A DE2706878C3 (de) 1976-02-18 1977-02-17 Strahlungsempfindliches Material
US06/033,842 US4279985A (en) 1976-02-18 1979-04-27 Photopolymer imaging using epoxy and bromine containing ethylenically unsaturated compounds

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1602976A JPS5299776A (en) 1976-02-18 1976-02-18 Radiation sensitive high polymeric material

Publications (2)

Publication Number Publication Date
JPS5299776A true JPS5299776A (en) 1977-08-22
JPS5521331B2 JPS5521331B2 (ja) 1980-06-09

Family

ID=11905132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1602976A Granted JPS5299776A (en) 1976-02-18 1976-02-18 Radiation sensitive high polymeric material

Country Status (6)

Country Link
US (1) US4279985A (ja)
JP (1) JPS5299776A (ja)
DE (1) DE2706878C3 (ja)
FR (1) FR2341904A1 (ja)
GB (1) GB1529123A (ja)
NL (1) NL163332C (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012532206A (ja) * 2009-06-30 2012-12-13 ダウ グローバル テクノロジーズ エルエルシー 臭素化及びエポキシ化難燃剤
JP2016504443A (ja) * 2012-12-13 2016-02-12 ランクセス・ブチル・ピーティーイー・リミテッド エポキシ化重合体の製造方法

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product
US4208211A (en) * 1978-05-23 1980-06-17 Bell Telephone Laboratories, Incorporated Fabrication based on radiation sensitive resists and related products
JPS58187926A (ja) * 1982-04-28 1983-11-02 Toyo Soda Mfg Co Ltd 放射線ネガ型レジストの現像方法
DE3231457A1 (de) * 1982-08-24 1984-03-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum erzeugen von strukturen fuer integrierte halbleiterschaltungen durch reaktives ionenaetzen
US4536236A (en) * 1983-04-06 1985-08-20 Hercules Incorporated Selecting hydroxy-terminated polybutadiene for high strain propellants
DE3324642A1 (de) * 1983-07-08 1985-01-17 Basf Ag, 6700 Ludwigshafen Verfahren zur stabilisierung von photopolymerisierbaren mischungen
US5439766A (en) * 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
US5264325A (en) * 1988-12-30 1993-11-23 International Business Machines Corporation Composition for photo imaging
US6180317B1 (en) 1988-12-30 2001-01-30 International Business Machines Corporation Composition for photoimaging
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
US5026624A (en) * 1989-03-03 1991-06-25 International Business Machines Corporation Composition for photo imaging
US5278010A (en) * 1989-03-03 1994-01-11 International Business Machines Corporation Composition for photo imaging
US5304457A (en) * 1989-03-03 1994-04-19 International Business Machines Corporation Composition for photo imaging
US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
CA2120838A1 (en) 1993-08-05 1995-02-06 Ronald Sinclair Nohr Solid colored composition mutable by ultraviolet radiation
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5865471A (en) 1993-08-05 1999-02-02 Kimberly-Clark Worldwide, Inc. Photo-erasable data processing forms
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US6242057B1 (en) 1994-06-30 2001-06-05 Kimberly-Clark Worldwide, Inc. Photoreactor composition and applications therefor
US5739175A (en) 1995-06-05 1998-04-14 Kimberly-Clark Worldwide, Inc. Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer
US6071979A (en) 1994-06-30 2000-06-06 Kimberly-Clark Worldwide, Inc. Photoreactor composition method of generating a reactive species and applications therefor
US5685754A (en) 1994-06-30 1997-11-11 Kimberly-Clark Corporation Method of generating a reactive species and polymer coating applications therefor
US6008268A (en) 1994-10-21 1999-12-28 Kimberly-Clark Worldwide, Inc. Photoreactor composition, method of generating a reactive species, and applications therefor
US5811199A (en) 1995-06-05 1998-09-22 Kimberly-Clark Worldwide, Inc. Adhesive compositions containing a photoreactor composition
US5786132A (en) 1995-06-05 1998-07-28 Kimberly-Clark Corporation Pre-dyes, mutable dye compositions, and methods of developing a color
US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
JP2001515524A (ja) 1995-06-05 2001-09-18 キンバリー クラーク ワールドワイド インコーポレイテッド 新規プレ染料
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5849411A (en) 1995-06-05 1998-12-15 Kimberly-Clark Worldwide, Inc. Polymer film, nonwoven web and fibers containing a photoreactor composition
ATE206150T1 (de) 1995-06-28 2001-10-15 Kimberly Clark Co Farbstoffstabilisierte zusammensetzungen
US5782963A (en) 1996-03-29 1998-07-21 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US5855655A (en) 1996-03-29 1999-01-05 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6099628A (en) 1996-03-29 2000-08-08 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
BR9606811A (pt) 1995-11-28 2000-10-31 Kimberly Clark Co Estabilizadores de corante aperfeiçoados
US5891229A (en) 1996-03-29 1999-04-06 Kimberly-Clark Worldwide, Inc. Colorant stabilizers
US6486261B1 (en) * 1998-12-24 2002-11-26 Acushnet Company Thin-layer-covered golf ball with improved velocity
US6524379B2 (en) 1997-08-15 2003-02-25 Kimberly-Clark Worldwide, Inc. Colorants, colorant stabilizers, ink compositions, and improved methods of making the same
CA2298615C (en) 1998-06-03 2009-03-31 Kimberly-Clark Worldwide, Inc. Neonanoplasts produced by microemulsion technology and inks for ink jet printing
AU4818299A (en) 1998-06-03 1999-12-20 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
JP2002520470A (ja) 1998-07-20 2002-07-09 キンバリー クラーク ワールドワイド インコーポレイテッド 改良されたインクジェットインク組成物
AU1309800A (en) 1998-09-28 2000-04-17 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor
AU2853000A (en) 1999-01-19 2000-08-01 Kimberly-Clark Worldwide, Inc. Novel colorants, colorant stabilizers, ink compositions, and improved methods ofmaking the same
US6331056B1 (en) 1999-02-25 2001-12-18 Kimberly-Clark Worldwide, Inc. Printing apparatus and applications therefor
US6294698B1 (en) 1999-04-16 2001-09-25 Kimberly-Clark Worldwide, Inc. Photoinitiators and applications therefor
US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
AU2001269905A1 (en) 2000-06-19 2002-01-08 Kimberly-Clark Worldwide, Inc. Novel photoinitiators and applications therefor

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS497495A (ja) * 1972-05-25 1974-01-23

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3885060A (en) * 1968-08-23 1975-05-20 Hitachi Ltd Production of insolubilized organic polymers
US3895954A (en) * 1973-06-11 1975-07-22 American Can Co Epoxy resin photoresist with iodoform and bismuth triphenyl
US3930858A (en) * 1973-11-01 1976-01-06 Xerox Corporation Heat development process utilizing a photosensitive composition containing a halogenated polymer and a strong organic electron acceptor
US3923514A (en) * 1974-06-27 1975-12-02 Xerox Corp Method for the preparation of relief printing masters

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS497495A (ja) * 1972-05-25 1974-01-23

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012532206A (ja) * 2009-06-30 2012-12-13 ダウ グローバル テクノロジーズ エルエルシー 臭素化及びエポキシ化難燃剤
JP2016026243A (ja) * 2009-06-30 2016-02-12 ダウ グローバル テクノロジーズ エルエルシー 臭素化及びエポキシ化難燃剤
JP2016504443A (ja) * 2012-12-13 2016-02-12 ランクセス・ブチル・ピーティーイー・リミテッド エポキシ化重合体の製造方法

Also Published As

Publication number Publication date
US4279985A (en) 1981-07-21
NL163332C (nl) 1980-08-15
JPS5521331B2 (ja) 1980-06-09
DE2706878C3 (de) 1980-07-24
FR2341904B1 (ja) 1980-11-21
NL7701380A (nl) 1977-08-22
DE2706878B2 (de) 1979-10-31
DE2706878A1 (de) 1977-08-25
FR2341904A1 (fr) 1977-09-16
GB1529123A (en) 1978-10-18

Similar Documents

Publication Publication Date Title
JPS5299776A (en) Radiation sensitive high polymeric material
JPS51115820A (en) Method of obtaining radiographs and photosensitive material for the pu rpose
JPS5324990A (en) Burnup measuring method in irradiated
JPS53102025A (en) Radiation sensitive organic high molecular material
JPS52127597A (en) Sheet shielding material of radioactive ray with flexibility
JPS5381116A (en) Radiation sensitive polymer and its working method
JPS55499A (en) Gammer ray sensitive*self output type radiation detector
JPS522777A (en) Radiation detector
JPS52131097A (en) Radiation shielding material of sheet form with flexibility
JPS51124981A (en) A gamma ray scintillation detector
JPS5368994A (en) X-ray apparatus
JPS5417015A (en) Radiation sensitive composite
JPS5242783A (en) Radiation detector
JPS5417014A (en) Radiation sensitive composite
JPS523378A (en) Electronic ray detector
JPS5223387A (en) Thermoluminescence dosimeter
JPS522184A (en) Radioactive ray detector
JPS5285872A (en) Radiation picture receiving and reproduction apparatus
JPS51144234A (en) X-ray sensitive materials
JPS5340194A (en) Neutron detector
JPS53116832A (en) Radioactive ray sensitive composite
JPS52122485A (en) Ultraviolet ray or x-ray dose detection method of semiconductor memory devices
JPS53125695A (en) Exposing method for electron rays
JPS51144235A (en) Radiant ray receiving body
JPS51117569A (en) Sample drift correction device