JPS5271174A - Production of semiconductor device - Google Patents

Production of semiconductor device

Info

Publication number
JPS5271174A
JPS5271174A JP14771475A JP14771475A JPS5271174A JP S5271174 A JPS5271174 A JP S5271174A JP 14771475 A JP14771475 A JP 14771475A JP 14771475 A JP14771475 A JP 14771475A JP S5271174 A JPS5271174 A JP S5271174A
Authority
JP
Japan
Prior art keywords
substrates
production
semiconductor device
fitanium
10mmhg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14771475A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5742970B2 (enExample
Inventor
Hiroo Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14771475A priority Critical patent/JPS5271174A/ja
Publication of JPS5271174A publication Critical patent/JPS5271174A/ja
Publication of JPS5742970B2 publication Critical patent/JPS5742970B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
JP14771475A 1975-12-10 1975-12-10 Production of semiconductor device Granted JPS5271174A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14771475A JPS5271174A (en) 1975-12-10 1975-12-10 Production of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14771475A JPS5271174A (en) 1975-12-10 1975-12-10 Production of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5271174A true JPS5271174A (en) 1977-06-14
JPS5742970B2 JPS5742970B2 (enExample) 1982-09-11

Family

ID=15436532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14771475A Granted JPS5271174A (en) 1975-12-10 1975-12-10 Production of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5271174A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748249A (en) * 1980-09-08 1982-03-19 Nec Corp Semiconductor device
JPS5848459A (ja) * 1981-09-16 1983-03-22 Nec Corp 半導体装置
JPS58101454A (ja) * 1981-12-12 1983-06-16 Nippon Telegr & Teleph Corp <Ntt> 半導体装置の電極
JPS60225464A (ja) * 1984-04-24 1985-11-09 Hitachi Ltd イメ−ジセンサとその製造方法
JPS63174319A (ja) * 1987-01-14 1988-07-18 Hitachi Ltd 半導体装置の製造方法
JPH02259073A (ja) * 1989-03-31 1990-10-19 Sharp Corp 窒化チタン膜形成方法
JPH0547707A (ja) * 1990-10-24 1993-02-26 Sumitomo Metal Ind Ltd 薄膜の形成方法および半導体装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5748249A (en) * 1980-09-08 1982-03-19 Nec Corp Semiconductor device
JPS5848459A (ja) * 1981-09-16 1983-03-22 Nec Corp 半導体装置
JPS58101454A (ja) * 1981-12-12 1983-06-16 Nippon Telegr & Teleph Corp <Ntt> 半導体装置の電極
JPS60225464A (ja) * 1984-04-24 1985-11-09 Hitachi Ltd イメ−ジセンサとその製造方法
JPS63174319A (ja) * 1987-01-14 1988-07-18 Hitachi Ltd 半導体装置の製造方法
JPH02259073A (ja) * 1989-03-31 1990-10-19 Sharp Corp 窒化チタン膜形成方法
JPH0547707A (ja) * 1990-10-24 1993-02-26 Sumitomo Metal Ind Ltd 薄膜の形成方法および半導体装置

Also Published As

Publication number Publication date
JPS5742970B2 (enExample) 1982-09-11

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