JPS5267276A - Manufacture of semiconductor unit - Google Patents
Manufacture of semiconductor unitInfo
- Publication number
- JPS5267276A JPS5267276A JP50130240A JP13024075A JPS5267276A JP S5267276 A JPS5267276 A JP S5267276A JP 50130240 A JP50130240 A JP 50130240A JP 13024075 A JP13024075 A JP 13024075A JP S5267276 A JPS5267276 A JP S5267276A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor unit
- mosic
- integration
- junction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
- H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]
- H10D62/108—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] having localised breakdown regions, e.g. built-in avalanching regions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/112—Constructional design considerations for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layers, e.g. by using channel stoppers
Landscapes
- Insulated Gate Type Field-Effect Transistor (AREA)
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50130240A JPS5267276A (en) | 1975-10-29 | 1975-10-29 | Manufacture of semiconductor unit |
GB44158/76A GB1564130A (en) | 1975-10-29 | 1976-10-25 | Semiconductor integrated circuit and a method for manufacturing the same |
DE19762648646 DE2648646A1 (de) | 1975-10-29 | 1976-10-27 | Integrierte halbleiterschaltung |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50130240A JPS5267276A (en) | 1975-10-29 | 1975-10-29 | Manufacture of semiconductor unit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5267276A true JPS5267276A (en) | 1977-06-03 |
Family
ID=15029463
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50130240A Pending JPS5267276A (en) | 1975-10-29 | 1975-10-29 | Manufacture of semiconductor unit |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5267276A (enrdf_load_stackoverflow) |
DE (1) | DE2648646A1 (enrdf_load_stackoverflow) |
GB (1) | GB1564130A (enrdf_load_stackoverflow) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5056189A (enrdf_load_stackoverflow) * | 1973-09-14 | 1975-05-16 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5034914B1 (enrdf_load_stackoverflow) * | 1969-10-27 | 1975-11-12 | ||
US3821781A (en) * | 1972-11-01 | 1974-06-28 | Ibm | Complementary field effect transistors having p doped silicon gates |
-
1975
- 1975-10-29 JP JP50130240A patent/JPS5267276A/ja active Pending
-
1976
- 1976-10-25 GB GB44158/76A patent/GB1564130A/en not_active Expired
- 1976-10-27 DE DE19762648646 patent/DE2648646A1/de active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5056189A (enrdf_load_stackoverflow) * | 1973-09-14 | 1975-05-16 |
Also Published As
Publication number | Publication date |
---|---|
GB1564130A (en) | 1980-04-02 |
DE2648646C2 (enrdf_load_stackoverflow) | 1988-01-21 |
DE2648646A1 (de) | 1977-05-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51144183A (en) | Semiconductor element containing surface protection film | |
JPS5230388A (en) | Semiconductor integrated circuit device constructed with insulating ga te field effect transistor | |
JPS52140280A (en) | Semiconductor device | |
JPS5395571A (en) | Semiconductor device | |
JPS5244186A (en) | Semiconductor intergrated circuit device | |
JPS5234671A (en) | Semiconductor integrated circuit | |
JPS5297684A (en) | Semiconductor element | |
JPS5267276A (en) | Manufacture of semiconductor unit | |
JPS51126184A (en) | Voltage detecting circuit | |
JPS5232654A (en) | Single stabilized multiple circuit | |
JPS5242384A (en) | Semiconductor device | |
JPS5243967A (en) | Transistor circuit | |
JPS542070A (en) | Manufacture for semiconductor element | |
JPS5210082A (en) | Semiconductor device | |
JPS51112193A (en) | Processing method of semiconductor equipment | |
JPS52187A (en) | Hall effect semiconductor integrated circuit | |
JPS51111071A (en) | Semiconductor equipment | |
JPS51145267A (en) | Manufacture of semiconductor device | |
JPS53139163A (en) | Constant voltage generator circuit | |
JPS53123083A (en) | Production of semiconductor device | |
JPS5228868A (en) | Semiconductor device | |
JPS5410682A (en) | Production of semiconductor elements | |
JPS5267271A (en) | Formation of through-hole onto semiconductor substrate | |
JPS5270774A (en) | Semiconductor integrated circuit unit | |
JPS5419367A (en) | Production of semiconductor device |