JPS5255865A - Gas etching method of stain film - Google Patents
Gas etching method of stain filmInfo
- Publication number
- JPS5255865A JPS5255865A JP13136775A JP13136775A JPS5255865A JP S5255865 A JPS5255865 A JP S5255865A JP 13136775 A JP13136775 A JP 13136775A JP 13136775 A JP13136775 A JP 13136775A JP S5255865 A JPS5255865 A JP S5255865A
- Authority
- JP
- Japan
- Prior art keywords
- stain film
- etching method
- gas etching
- gas
- stain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE: To make possible the removal of stain film which was extremely difficult to remove, by subjecting the stain film formed on the surface of a semiconductor wafer to gas etching by using the gas obtained through dissociation of gas containing fluorine.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13136775A JPS5255865A (en) | 1975-11-04 | 1975-11-04 | Gas etching method of stain film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13136775A JPS5255865A (en) | 1975-11-04 | 1975-11-04 | Gas etching method of stain film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5255865A true JPS5255865A (en) | 1977-05-07 |
Family
ID=15056258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13136775A Pending JPS5255865A (en) | 1975-11-04 | 1975-11-04 | Gas etching method of stain film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5255865A (en) |
-
1975
- 1975-11-04 JP JP13136775A patent/JPS5255865A/en active Pending
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