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Hitachi Ltd
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Hitachi Ltd
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Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP50127405ApriorityCriticalpatent/JPS5816331B2/en
Publication of JPS5252365ApublicationCriticalpatent/JPS5252365A/en
Publication of JPS5816331B2publicationCriticalpatent/JPS5816331B2/en
PURPOSE: To obtain InSb film having flat surface by piling on a substrate successively a specified lower layer, InSb film, which is surrounded by inorganic insulating substance, and a specified upper layer, followed by melting and recrystallizing the InSb film.