JPS5247377A - Method of inactivating surface of group iii-v compound semiconductor - Google Patents
Method of inactivating surface of group iii-v compound semiconductorInfo
- Publication number
- JPS5247377A JPS5247377A JP12307575A JP12307575A JPS5247377A JP S5247377 A JPS5247377 A JP S5247377A JP 12307575 A JP12307575 A JP 12307575A JP 12307575 A JP12307575 A JP 12307575A JP S5247377 A JPS5247377 A JP S5247377A
- Authority
- JP
- Japan
- Prior art keywords
- compound semiconductor
- group iii
- inactivating
- inactivating surface
- gallium nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Formation Of Insulating Films (AREA)
- Led Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12307575A JPS5247377A (en) | 1975-10-13 | 1975-10-13 | Method of inactivating surface of group iii-v compound semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12307575A JPS5247377A (en) | 1975-10-13 | 1975-10-13 | Method of inactivating surface of group iii-v compound semiconductor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5247377A true JPS5247377A (en) | 1977-04-15 |
JPS5653854B2 JPS5653854B2 (no) | 1981-12-22 |
Family
ID=14851560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12307575A Granted JPS5247377A (en) | 1975-10-13 | 1975-10-13 | Method of inactivating surface of group iii-v compound semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5247377A (no) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61129833A (ja) * | 1984-10-09 | 1986-06-17 | フィリップス エレクトロニクス ネムローゼ フェンノートシャップ | 半導体装置の製造方法 |
JP2003347316A (ja) * | 2002-05-30 | 2003-12-05 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
US6805982B2 (en) * | 2002-05-16 | 2004-10-19 | Ngk Insulators, Ltd. | Epitaxial substrates and semiconductor devices |
JP2009016848A (ja) * | 2008-07-14 | 2009-01-22 | Panasonic Corp | 半導体装置及びその製造方法 |
CN103456603A (zh) * | 2013-09-05 | 2013-12-18 | 大连理工大学 | 在镓系异质半导体衬底上制备氧化镓膜的方法及氧化镓膜 |
-
1975
- 1975-10-13 JP JP12307575A patent/JPS5247377A/ja active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61129833A (ja) * | 1984-10-09 | 1986-06-17 | フィリップス エレクトロニクス ネムローゼ フェンノートシャップ | 半導体装置の製造方法 |
US6805982B2 (en) * | 2002-05-16 | 2004-10-19 | Ngk Insulators, Ltd. | Epitaxial substrates and semiconductor devices |
JP2003347316A (ja) * | 2002-05-30 | 2003-12-05 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
JP2009016848A (ja) * | 2008-07-14 | 2009-01-22 | Panasonic Corp | 半導体装置及びその製造方法 |
CN103456603A (zh) * | 2013-09-05 | 2013-12-18 | 大连理工大学 | 在镓系异质半导体衬底上制备氧化镓膜的方法及氧化镓膜 |
Also Published As
Publication number | Publication date |
---|---|
JPS5653854B2 (no) | 1981-12-22 |
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