JPS5226902A - Method of making photomask pattern - Google Patents

Method of making photomask pattern

Info

Publication number
JPS5226902A
JPS5226902A JP10219175A JP10219175A JPS5226902A JP S5226902 A JPS5226902 A JP S5226902A JP 10219175 A JP10219175 A JP 10219175A JP 10219175 A JP10219175 A JP 10219175A JP S5226902 A JPS5226902 A JP S5226902A
Authority
JP
Japan
Prior art keywords
photomask pattern
making photomask
making
pattern
photomask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10219175A
Other languages
English (en)
Inventor
Kazuo Koga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10219175A priority Critical patent/JPS5226902A/ja
Publication of JPS5226902A publication Critical patent/JPS5226902A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10219175A 1975-08-25 1975-08-25 Method of making photomask pattern Pending JPS5226902A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10219175A JPS5226902A (en) 1975-08-25 1975-08-25 Method of making photomask pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10219175A JPS5226902A (en) 1975-08-25 1975-08-25 Method of making photomask pattern

Publications (1)

Publication Number Publication Date
JPS5226902A true JPS5226902A (en) 1977-02-28

Family

ID=14320763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10219175A Pending JPS5226902A (en) 1975-08-25 1975-08-25 Method of making photomask pattern

Country Status (1)

Country Link
JP (1) JPS5226902A (ja)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129333A (en) * 1979-03-28 1980-10-07 Hitachi Ltd Scale-down projection aligner and mask used for this
JPS55165629A (en) * 1979-06-11 1980-12-24 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS5612644A (en) * 1979-07-12 1981-02-07 Matsushita Electric Ind Co Ltd Manufacture of photomask
JPS5632142A (en) * 1979-08-23 1981-04-01 Fujitsu Ltd Multichip constitution reticle
JPS5645024A (en) * 1979-09-21 1981-04-24 Chiyou Lsi Gijutsu Kenkyu Kumiai Lithography apparatus
JPS57124732A (en) * 1981-01-27 1982-08-03 Nec Corp Manufacture of mask for automatic registering
JPS5814137A (ja) * 1981-07-16 1983-01-26 Fujitsu Ltd 縮小投影露光方法
JPS58173831A (ja) * 1982-04-05 1983-10-12 Oki Electric Ind Co Ltd ウエ−ハアラインメント方法
JPS58502173A (ja) * 1981-12-21 1983-12-15 バロ−ス・コ−ポレ−ション ウエハ規模集積回路における、またそれに関する改良
JPS6379318A (ja) * 1987-09-11 1988-04-09 Hitachi Ltd 縮小投影露光方法
JPS63288014A (ja) * 1988-04-22 1988-11-25 Canon Inc 焼付け装置
EP1189111A4 (en) * 1999-05-27 2002-11-06 Kem Tec Japan Co Ltd DEVICE AND METHOD FOR MANUFACTURING PRINTED CIRCUITS, PRINTED CIRCUIT HIMSELF
JP2008205163A (ja) * 2007-02-20 2008-09-04 Ricoh Co Ltd 半導体ウェハ及びレチクル並びにそのレチクルを用いた露光方法

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55129333A (en) * 1979-03-28 1980-10-07 Hitachi Ltd Scale-down projection aligner and mask used for this
JPS55165629A (en) * 1979-06-11 1980-12-24 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS5612644A (en) * 1979-07-12 1981-02-07 Matsushita Electric Ind Co Ltd Manufacture of photomask
JPS5632142A (en) * 1979-08-23 1981-04-01 Fujitsu Ltd Multichip constitution reticle
JPS5645024A (en) * 1979-09-21 1981-04-24 Chiyou Lsi Gijutsu Kenkyu Kumiai Lithography apparatus
JPS57124732A (en) * 1981-01-27 1982-08-03 Nec Corp Manufacture of mask for automatic registering
JPS5814137A (ja) * 1981-07-16 1983-01-26 Fujitsu Ltd 縮小投影露光方法
JPS58502173A (ja) * 1981-12-21 1983-12-15 バロ−ス・コ−ポレ−ション ウエハ規模集積回路における、またそれに関する改良
JPS58173831A (ja) * 1982-04-05 1983-10-12 Oki Electric Ind Co Ltd ウエ−ハアラインメント方法
JPS6379318A (ja) * 1987-09-11 1988-04-09 Hitachi Ltd 縮小投影露光方法
JPS63288014A (ja) * 1988-04-22 1988-11-25 Canon Inc 焼付け装置
EP1189111A4 (en) * 1999-05-27 2002-11-06 Kem Tec Japan Co Ltd DEVICE AND METHOD FOR MANUFACTURING PRINTED CIRCUITS, PRINTED CIRCUIT HIMSELF
JP2008205163A (ja) * 2007-02-20 2008-09-04 Ricoh Co Ltd 半導体ウェハ及びレチクル並びにそのレチクルを用いた露光方法

Similar Documents

Publication Publication Date Title
JPS525271A (en) Method of manufacturing mask
JPS5283228A (en) Method of forming selffsupport type mask
JPS5212002A (en) Method of high aspect ratio mask
JPS5382176A (en) Method of forming resist pattern
JPS51114073A (en) Method of manufacturing high resolution pattern
JPS522176A (en) Method of forming integrated circuit pattern
JPS5275986A (en) Method of forming mask layer
JPS5226902A (en) Method of making photomask pattern
JPS5351253A (en) Method of forming patterns
JPS5484978A (en) Method of forming pattern
JPS5235249A (en) Method of forming marble pattern
JPS5217949A (en) Method of making pattern
JPS5363573A (en) Method of forming resist pattern
JPS5348676A (en) Method of forming pattern
JPS5496372A (en) Method of forming pattern
JPS52736A (en) Method of forming fine patterns
JPS529511A (en) Method of forming cubic pattern
JPS52135067A (en) Method of forming pattern
JPS51150402A (en) Method of making mask plate
JPS5489578A (en) Method of forming pattern
JPS51143766A (en) Method of making pattern fabric
JPS5260959A (en) Method of forming pattern
JPS51112976A (en) Method of forming pattern for fabric
JPS5212464A (en) Method of manufacturing photomask
JPS52123334A (en) Method of forming patterns