JPS5223221B2 - - Google Patents
Info
- Publication number
- JPS5223221B2 JPS5223221B2 JP49149133A JP14913374A JPS5223221B2 JP S5223221 B2 JPS5223221 B2 JP S5223221B2 JP 49149133 A JP49149133 A JP 49149133A JP 14913374 A JP14913374 A JP 14913374A JP S5223221 B2 JPS5223221 B2 JP S5223221B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US437585A US3900736A (en) | 1974-01-28 | 1974-01-28 | Method and apparatus for positioning a beam of charged particles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS50105381A JPS50105381A (fi) | 1975-08-20 |
| JPS5223221B2 true JPS5223221B2 (fi) | 1977-06-22 |
Family
ID=23737046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49149133A Expired JPS5223221B2 (fi) | 1974-01-28 | 1974-12-27 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3900736A (fi) |
| JP (1) | JPS5223221B2 (fi) |
| CA (1) | CA1016667A (fi) |
| DE (1) | DE2502431C2 (fi) |
| FR (1) | FR2259390B1 (fi) |
| GB (1) | GB1480561A (fi) |
| IT (1) | IT1027867B (fi) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU705699A2 (ru) * | 1976-05-03 | 1979-12-25 | Орденов Ленина И Трудового Красного Знамени Институт Электросварки Им. Е.О.Патона | Установка дл электроннолучевого нагрева материалов |
| JPS5360162A (en) * | 1976-11-10 | 1978-05-30 | Toshiba Corp | Electron beam irradiation device |
| JPS5367365A (en) * | 1976-11-29 | 1978-06-15 | Nippon Telegr & Teleph Corp <Ntt> | Correcting method for beam position |
| JPS5394773A (en) * | 1977-01-31 | 1978-08-19 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of connecting graph in charged beam exposing device |
| US4137459A (en) * | 1978-02-13 | 1979-01-30 | International Business Machines Corporation | Method and apparatus for applying focus correction in E-beam system |
| JPS54108581A (en) * | 1978-02-13 | 1979-08-25 | Jeol Ltd | Electron-beam exposure device |
| JPS5552223A (en) * | 1978-10-13 | 1980-04-16 | Nippon Telegr & Teleph Corp <Ntt> | Exposure method in electronic beam exposure device |
| DE2937136A1 (de) * | 1979-09-13 | 1981-04-02 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und vorrichtung zur schnellen ablenkung eines korpuskularstrahls |
| JPS56124234A (en) * | 1980-03-05 | 1981-09-29 | Hitachi Ltd | Correcting method for electron beam deflection |
| JPS5740927A (en) * | 1980-08-26 | 1982-03-06 | Fujitsu Ltd | Exposing method of electron beam |
| DE3172441D1 (en) * | 1980-10-15 | 1985-10-31 | Toshiba Kk | Electron beam exposure system |
| US4385238A (en) * | 1981-03-03 | 1983-05-24 | Veeco Instruments Incorporated | Reregistration system for a charged particle beam exposure system |
| US4528452A (en) * | 1982-12-09 | 1985-07-09 | Electron Beam Corporation | Alignment and detection system for electron image projectors |
| US4818885A (en) * | 1987-06-30 | 1989-04-04 | International Business Machines Corporation | Electron beam writing method and system using large range deflection in combination with a continuously moving table |
| GB2238630B (en) * | 1989-11-29 | 1993-12-22 | Sundstrand Corp | Control systems |
| DE4024084A1 (de) * | 1989-11-29 | 1991-06-06 | Daimler Benz Ag | Verfahren zum herstellen von hohlen gaswechselventilen fuer hubkolbenmaschinen |
| JPH05206017A (ja) * | 1991-08-09 | 1993-08-13 | Internatl Business Mach Corp <Ibm> | リソグラフイ露光システム及びその方法 |
| JP2501726B2 (ja) * | 1991-10-08 | 1996-05-29 | インターナショナル・ビジネス・マシーンズ・コーポレイション | コンピュ―タ・イメ―ジ生成装置及びデ―タ減縮方法 |
| US5194349A (en) * | 1992-02-07 | 1993-03-16 | Midwest Research Institute | Erasable, multiple level logic optical memory disk |
| US5304441A (en) * | 1992-12-31 | 1994-04-19 | International Business Machines Corporation | Method of optimizing exposure of photoresist by patterning as a function of thermal modeling |
| US5838013A (en) * | 1996-11-13 | 1998-11-17 | International Business Machines Corporation | Method for monitoring resist charging in a charged particle system |
| US20020063567A1 (en) * | 2000-11-30 | 2002-05-30 | Applied Materials, Inc. | Measurement device with remote adjustment of electron beam stigmation by using MOSFET ohmic properties and isolation devices |
| US6803582B2 (en) * | 2002-11-29 | 2004-10-12 | Oregon Health & Science University | One dimensional beam blanker array |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1804646B2 (de) * | 1968-10-18 | 1973-03-22 | Siemens AG, 1000 Berlin u. 8000 München | Korpuskularstrahl-bearbeitungsgeraet |
| US3644700A (en) * | 1969-12-15 | 1972-02-22 | Ibm | Method and apparatus for controlling an electron beam |
-
1974
- 1974-01-28 US US437585A patent/US3900736A/en not_active Expired - Lifetime
- 1974-11-29 CA CA214,984A patent/CA1016667A/en not_active Expired
- 1974-12-05 FR FR7441667A patent/FR2259390B1/fr not_active Expired
- 1974-12-20 IT IT30791/74A patent/IT1027867B/it active
- 1974-12-27 JP JP49149133A patent/JPS5223221B2/ja not_active Expired
-
1975
- 1975-01-08 GB GB817/75A patent/GB1480561A/en not_active Expired
- 1975-01-22 DE DE2502431A patent/DE2502431C2/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50105381A (fi) | 1975-08-20 |
| GB1480561A (en) | 1977-07-20 |
| FR2259390B1 (fi) | 1976-10-22 |
| US3900736A (en) | 1975-08-19 |
| DE2502431C2 (de) | 1984-08-30 |
| DE2502431A1 (de) | 1975-07-31 |
| IT1027867B (it) | 1978-12-20 |
| CA1016667A (en) | 1977-08-30 |
| FR2259390A1 (fi) | 1975-08-22 |