GB1480561A - Controlling the movement of a beam of charged particles - Google Patents

Controlling the movement of a beam of charged particles

Info

Publication number
GB1480561A
GB1480561A GB817/75A GB81775A GB1480561A GB 1480561 A GB1480561 A GB 1480561A GB 817/75 A GB817/75 A GB 817/75A GB 81775 A GB81775 A GB 81775A GB 1480561 A GB1480561 A GB 1480561A
Authority
GB
United Kingdom
Prior art keywords
field
assumed
circuit
correction
deflection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB817/75A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB1480561A publication Critical patent/GB1480561A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

1480561 Automatic control of particle beams INTERNATIONAL BUSINESS MACHINES CORP 8 Jan 1975 [28 Jan 1974] 817/75 Heading G3N In the use of a beam of charged particles {electrons}applied to a target, the latter being provided with reference markings 42 delineating four sided fields 40, the deviation of the markings for one field from their assumed positions as determined by control 17-19 is determined, and, on the basis of disclosed algebraic analysis, a set of parameters, determining the displacement and distortion of the actual field with respect to the assumed field, are evaluated and used so that, for each beam position in the assumed field, a correction is applied to define a corresponding position in the actual field, the correction of the assumed marking positions being their actual positions. The target may be a semi-conductor wafer, the beam being used to write a pattern on an electroresist, or on a silicon dioxide layer to enhance its etch rating, such that a single pattern may encompass a plurality of fields, or patterns on several levels may be written on one field, the correction ensuring correct registration. The pattern data from computer 19 is used to cause the electron beam 11 to be scanned, in accordance with the assumed field, (50), Fig. 3 (not shown) by magnetic deflection coils 23-26, voltages proportional to the instantaneous deflection currents being passed on lines 55, 56 to the correction circuit, Fig. 2 receiving also the determined values of the parameters for the field being scanned, the circuit calculating corresponding instantaneous deflection voltages which are applied to plates 31- 34 correcting the beam deflection for each point of the field from the assumed to the actual field (51, Fig. 3). The parameters A-H, Fig. 2 are received by the correction circuit in digital form, to be processed in multiplying, and normal d/a converters 58, 59, 62-67, Fig. 2. The correction allows for translation, magnification, rotation and/ or trapezoidal error in the field. A further electrostatic circuit, Fig. 7 (not shown) may be used in conjunction with the scan; which may be a raster, or with alternate X scans being in opposed senses; to provide corrections to ensure linearity, or a steady beam offset fed in via d/a converter (125). Magnetic deflection circuit, Fig. 6 (not shown). In accordance with digital input from control(18), or selected combination of the positive, and negative constant current sources (70-75) may be coupled to integrator (77, 84) providing a scanning waveform corrected for linearity by circuitry (85), and an auxiliary circuit receiving data from the control (18). Upon beam reversal at the end of a line, circuit (98, 95, 96) is active to ensure that the beam attains an end point determined by the input to d/a converter (96), an error signal from amplifier (95) controlling integrator (77, 84) at this time. Each marking, Fig. 5 (not shown), comprises orthogonal rows (43, 44) of depressions or raised portions, detected by the electron beam. The beam may be used to prepare engineering drawings on a CRT, or for electron beam welding or cutting, or for forming a mask.
GB817/75A 1974-01-28 1975-01-08 Controlling the movement of a beam of charged particles Expired GB1480561A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US437585A US3900736A (en) 1974-01-28 1974-01-28 Method and apparatus for positioning a beam of charged particles

Publications (1)

Publication Number Publication Date
GB1480561A true GB1480561A (en) 1977-07-20

Family

ID=23737046

Family Applications (1)

Application Number Title Priority Date Filing Date
GB817/75A Expired GB1480561A (en) 1974-01-28 1975-01-08 Controlling the movement of a beam of charged particles

Country Status (7)

Country Link
US (1) US3900736A (en)
JP (1) JPS5223221B2 (en)
CA (1) CA1016667A (en)
DE (1) DE2502431C2 (en)
FR (1) FR2259390B1 (en)
GB (1) GB1480561A (en)
IT (1) IT1027867B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2238630A (en) * 1989-11-29 1991-06-05 Sundstrand Corp Control systems

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU705699A2 (en) * 1976-05-03 1979-12-25 Орденов Ленина И Трудового Красного Знамени Институт Электросварки Им. Е.О.Патона Apparatus for electron beam heating of materials
JPS5360162A (en) * 1976-11-10 1978-05-30 Toshiba Corp Electron beam irradiation device
JPS5367365A (en) * 1976-11-29 1978-06-15 Nippon Telegr & Teleph Corp <Ntt> Correcting method for beam position
JPS5394773A (en) * 1977-01-31 1978-08-19 Cho Lsi Gijutsu Kenkyu Kumiai Method of connecting graph in charged beam exposing device
JPS54108581A (en) * 1978-02-13 1979-08-25 Jeol Ltd Electron-beam exposure device
US4137459A (en) * 1978-02-13 1979-01-30 International Business Machines Corporation Method and apparatus for applying focus correction in E-beam system
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device
DE2937136A1 (en) * 1979-09-13 1981-04-02 Siemens AG, 1000 Berlin und 8000 München METHOD AND DEVICE FOR QUICKLY DEFLECTING A BODY BEAM
JPS56124234A (en) * 1980-03-05 1981-09-29 Hitachi Ltd Correcting method for electron beam deflection
JPS5740927A (en) * 1980-08-26 1982-03-06 Fujitsu Ltd Exposing method of electron beam
EP0049872B1 (en) * 1980-10-15 1985-09-25 Kabushiki Kaisha Toshiba Electron beam exposure system
US4385238A (en) * 1981-03-03 1983-05-24 Veeco Instruments Incorporated Reregistration system for a charged particle beam exposure system
US4528452A (en) * 1982-12-09 1985-07-09 Electron Beam Corporation Alignment and detection system for electron image projectors
US4818885A (en) * 1987-06-30 1989-04-04 International Business Machines Corporation Electron beam writing method and system using large range deflection in combination with a continuously moving table
DE4024084A1 (en) * 1989-11-29 1991-06-06 Daimler Benz Ag METHOD FOR PRODUCING HOLLOW GAS EXCHANGE VALVES FOR LIFTING PISTON MACHINES
JPH05206017A (en) * 1991-08-09 1993-08-13 Internatl Business Mach Corp <Ibm> Lithographic exposure system and its method
JP2501726B2 (en) * 1991-10-08 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション Computer image generation device and data reduction method
US5194349A (en) * 1992-02-07 1993-03-16 Midwest Research Institute Erasable, multiple level logic optical memory disk
US5304441A (en) * 1992-12-31 1994-04-19 International Business Machines Corporation Method of optimizing exposure of photoresist by patterning as a function of thermal modeling
US5838013A (en) * 1996-11-13 1998-11-17 International Business Machines Corporation Method for monitoring resist charging in a charged particle system
US20020063567A1 (en) * 2000-11-30 2002-05-30 Applied Materials, Inc. Measurement device with remote adjustment of electron beam stigmation by using MOSFET ohmic properties and isolation devices
US6803582B2 (en) * 2002-11-29 2004-10-12 Oregon Health & Science University One dimensional beam blanker array

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804646B2 (en) * 1968-10-18 1973-03-22 Siemens AG, 1000 Berlin u. 8000 München CORPUSCULAR BEAM MACHINING DEVICE
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2238630A (en) * 1989-11-29 1991-06-05 Sundstrand Corp Control systems
GB2238630B (en) * 1989-11-29 1993-12-22 Sundstrand Corp Control systems

Also Published As

Publication number Publication date
DE2502431C2 (en) 1984-08-30
IT1027867B (en) 1978-12-20
US3900736A (en) 1975-08-19
DE2502431A1 (en) 1975-07-31
FR2259390B1 (en) 1976-10-22
JPS50105381A (en) 1975-08-20
JPS5223221B2 (en) 1977-06-22
FR2259390A1 (en) 1975-08-22
CA1016667A (en) 1977-08-30

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee