JPS5223220B2 - - Google Patents

Info

Publication number
JPS5223220B2
JPS5223220B2 JP49145088A JP14508874A JPS5223220B2 JP S5223220 B2 JPS5223220 B2 JP S5223220B2 JP 49145088 A JP49145088 A JP 49145088A JP 14508874 A JP14508874 A JP 14508874A JP S5223220 B2 JPS5223220 B2 JP S5223220B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49145088A
Other versions
JPS5093571A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5093571A publication Critical patent/JPS5093571A/ja
Publication of JPS5223220B2 publication Critical patent/JPS5223220B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP49145088A 1973-12-19 1974-12-19 Expired JPS5223220B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US426393A US3914608A (en) 1973-12-19 1973-12-19 Rapid exposure of micropatterns with a scanning electron microscope

Publications (2)

Publication Number Publication Date
JPS5093571A JPS5093571A (ja) 1975-07-25
JPS5223220B2 true JPS5223220B2 (ja) 1977-06-22

Family

ID=23690627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49145088A Expired JPS5223220B2 (ja) 1973-12-19 1974-12-19

Country Status (2)

Country Link
US (1) US3914608A (ja)
JP (1) JPS5223220B2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0516355U (ja) * 1991-08-26 1993-03-02 ハリソン電機株式会社 スタンプ台

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2294489A1 (fr) * 1974-12-13 1976-07-09 Thomson Csf Dispositif pour le trace programme de dessins par bombardement de particules
US4095104A (en) * 1975-09-01 1978-06-13 U.S. Philips Corporation Electron microscope
DE2547079C3 (de) * 1975-10-17 1979-12-06 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Korpuskularbestrahlung eines Präparats
JPS5316578A (en) * 1976-07-30 1978-02-15 Toshiba Corp Electron beam exposure apparatus
CA1100237A (en) * 1977-03-23 1981-04-28 Roger F.W. Pease Multiple electron beam exposure system
JPS52120686A (en) * 1977-04-21 1977-10-11 Jeol Ltd Electronic ray exposure method
US4163155A (en) * 1978-04-07 1979-07-31 Bell Telephone Laboratories, Incorporated Defining a low-density pattern in a photoresist with an electron beam exposure system
DE2837590A1 (de) * 1978-08-29 1980-03-13 Ibm Deutschland Verfahren zur schattenwurfbelichtung
JPS5543821A (en) * 1978-09-22 1980-03-27 Hitachi Ltd Electronic drawing device
JPS55138836A (en) * 1979-04-16 1980-10-30 Fujitsu Ltd Electron beam exposure apparatus
WO1980002772A1 (en) * 1979-06-08 1980-12-11 Fujitsu Ltd Electron beam projecting system
DE2936911A1 (de) * 1979-09-12 1981-04-02 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zur regelung eines magnetischen ablenksystems
JPS586130A (ja) * 1981-07-03 1983-01-13 Fujitsu Ltd 電子ビ−ムの偏向補正方法
JPS5811960U (ja) * 1981-07-15 1983-01-25 株式会社三協精機製作所 小型モ−タ−
JPS58154230A (ja) * 1982-03-10 1983-09-13 Jeol Ltd 電子ビ−ム露光方法
JPS58202529A (ja) * 1982-05-21 1983-11-25 Toshiba Corp 荷電ビ−ム光学鏡筒
JPS59124719A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 電子ビ−ム露光装置
JPS61192444U (ja) * 1986-05-01 1986-11-29
CA1279732C (en) * 1987-07-30 1991-01-29 Hiroaki Tobuse Electron beam direct drawing device
US5546319A (en) * 1994-01-28 1996-08-13 Fujitsu Limited Method of and system for charged particle beam exposure
US5530251A (en) * 1994-12-21 1996-06-25 International Business Machines Corporation Inductively coupled dual-stage magnetic deflection yoke
DE19911372A1 (de) * 1999-03-15 2000-09-28 Pms Gmbh Vorrichtung zum Steuern eines Strahls aus elektrisch geladenen Teilchen
US20070000048A1 (en) * 2004-12-16 2007-01-04 Davis David T Pneumatic lift and method for transferring an invalid patient
DE102009052392A1 (de) * 2009-11-09 2011-12-15 Carl Zeiss Nts Gmbh SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens
JP2016027604A (ja) * 2014-06-24 2016-02-18 株式会社荏原製作所 表面処理装置
EP3016130A1 (en) * 2014-10-28 2016-05-04 Fei Company Composite scan path in a charged particle microscope
US10534115B1 (en) * 2017-09-22 2020-01-14 Facebook Technologies, Llc Gray-tone electron-beam lithography
US11220028B1 (en) 2018-03-08 2022-01-11 Facebook Technologies, Llc Method of manufacture for thin, multi-bend optics by compression molding
US10976483B2 (en) 2019-02-26 2021-04-13 Facebook Technologies, Llc Variable-etch-depth gratings
US11709422B2 (en) 2020-09-17 2023-07-25 Meta Platforms Technologies, Llc Gray-tone lithography for precise control of grating etch depth

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns
US3699304A (en) * 1969-12-15 1972-10-17 Ibm Electron beam deflection control method and apparatus
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam
JPS4922351B1 (ja) * 1969-12-25 1974-06-07

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0516355U (ja) * 1991-08-26 1993-03-02 ハリソン電機株式会社 スタンプ台

Also Published As

Publication number Publication date
US3914608A (en) 1975-10-21
JPS5093571A (ja) 1975-07-25

Similar Documents

Publication Publication Date Title
AU476761B2 (ja)
AU474593B2 (ja)
AU474511B2 (ja)
JPS5223220B2 (ja)
AU474838B2 (ja)
AU465453B2 (ja)
AU465434B2 (ja)
AU471343B2 (ja)
AU476714B2 (ja)
BR7403057A (ja)
AU466283B2 (ja)
AU472848B2 (ja)
AU476696B2 (ja)
AU477823B2 (ja)
AU471461B2 (ja)
AU477824B2 (ja)
AU476873B1 (ja)
BG26185A3 (ja)
BG19543A1 (ja)
BG19291A1 (ja)
BG18792A1 (ja)
AU479562A (ja)
AU479539A (ja)
AU479522A (ja)
AU479521A (ja)