JPS5218678B1 - - Google Patents

Info

Publication number
JPS5218678B1
JPS5218678B1 JP10155171A JP10155171A JPS5218678B1 JP S5218678 B1 JPS5218678 B1 JP S5218678B1 JP 10155171 A JP10155171 A JP 10155171A JP 10155171 A JP10155171 A JP 10155171A JP S5218678 B1 JPS5218678 B1 JP S5218678B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10155171A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5218678B1 publication Critical patent/JPS5218678B1/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/04Hydrides of silicon
    • C01B33/043Monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • C01B33/10773Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
JP10155171A 1970-12-17 1971-12-16 Pending JPS5218678B1 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US9908770A 1970-12-17 1970-12-17
US15258771A 1971-06-14 1971-06-14

Publications (1)

Publication Number Publication Date
JPS5218678B1 true JPS5218678B1 (nl) 1977-05-23

Family

ID=26795531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10155171A Pending JPS5218678B1 (nl) 1970-12-17 1971-12-16

Country Status (7)

Country Link
JP (1) JPS5218678B1 (nl)
AU (1) AU465756B2 (nl)
BE (1) BE776794A (nl)
CA (1) CA988275A (nl)
FR (1) FR2118725A5 (nl)
GB (1) GB1377504A (nl)
NL (1) NL165435C (nl)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003530290A (ja) * 2000-04-07 2003-10-14 ソーラーワールド・アクチエンゲゼルシヤフト シラン製造方法および装置
WO2006123802A1 (ja) * 2005-05-18 2006-11-23 Tokuyama Corporation シリコンの製造方法
JP2011505246A (ja) * 2007-12-06 2011-02-24 エボニック デグサ ゲーエムベーハー 水素含有ハロゲンシランを不均化するための触媒及び方法
JP4847958B2 (ja) * 2004-09-17 2011-12-28 エボニック デグサ ゲーエムベーハー シランを製造する装置および方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2503125A1 (fr) * 1981-04-03 1982-10-08 Rhone Poulenc Spec Chim Procede de fabrication de silane
FR2526003A1 (fr) * 1982-05-03 1983-11-04 Rhone Poulenc Spec Chim Procede de fabrication de silane a partir de trichlorosilane
JPS5969416A (ja) * 1982-10-08 1984-04-19 Chisso Corp ジクロロシランの製造方法
FR2541666B1 (fr) * 1983-02-25 1985-06-21 Rhone Poulenc Spec Chim Procede de dismutation de silanes
DE3711444A1 (de) * 1987-04-04 1988-10-13 Huels Troisdorf Verfahren und vorrichtung zur herstellung von dichlorsilan
DE19860146A1 (de) * 1998-12-24 2000-06-29 Bayer Ag Verfahren und Anlage zur Herstellung von Silan
US20130156675A1 (en) * 2011-12-16 2013-06-20 Rec Silicon Inc Process for production of silane and hydrohalosilanes
RU2593634C2 (ru) * 2014-12-25 2016-08-10 федеральное государственное бюджетное образовательное учреждение высшего образования "Нижегородский государственный технический университет им. Р.Е. Алексеева" Способ глубокой очистки моносилана

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003530290A (ja) * 2000-04-07 2003-10-14 ソーラーワールド・アクチエンゲゼルシヤフト シラン製造方法および装置
JP4847958B2 (ja) * 2004-09-17 2011-12-28 エボニック デグサ ゲーエムベーハー シランを製造する装置および方法
WO2006123802A1 (ja) * 2005-05-18 2006-11-23 Tokuyama Corporation シリコンの製造方法
US8894959B2 (en) 2005-05-18 2014-11-25 Tokuyama Corporation Silicon Production method
JP2011505246A (ja) * 2007-12-06 2011-02-24 エボニック デグサ ゲーエムベーハー 水素含有ハロゲンシランを不均化するための触媒及び方法

Also Published As

Publication number Publication date
CA988275A (en) 1976-05-04
DE2162537A1 (de) 1972-07-13
GB1377504A (en) 1974-12-18
DE2162537B2 (de) 1977-02-24
AU3650271A (en) 1973-06-14
FR2118725A5 (nl) 1972-07-28
BE776794A (fr) 1972-06-16
NL165435C (nl) 1981-04-15
AU465756B2 (en) 1975-10-09
NL165435B (nl) 1980-11-17
NL7117278A (nl) 1972-06-20

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