JPS52147977A - Electronic lens unit - Google Patents
Electronic lens unitInfo
- Publication number
- JPS52147977A JPS52147977A JP3764276A JP3764276A JPS52147977A JP S52147977 A JPS52147977 A JP S52147977A JP 3764276 A JP3764276 A JP 3764276A JP 3764276 A JP3764276 A JP 3764276A JP S52147977 A JPS52147977 A JP S52147977A
- Authority
- JP
- Japan
- Prior art keywords
- lens unit
- electronic lens
- electronic
- accord
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3764276A JPS52147977A (en) | 1976-04-02 | 1976-04-02 | Electronic lens unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3764276A JPS52147977A (en) | 1976-04-02 | 1976-04-02 | Electronic lens unit |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7413677A Division JPS5328379A (en) | 1977-06-22 | 1977-06-22 | Electron lens device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52147977A true JPS52147977A (en) | 1977-12-08 |
| JPS5337710B2 JPS5337710B2 (enExample) | 1978-10-11 |
Family
ID=12503296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3764276A Granted JPS52147977A (en) | 1976-04-02 | 1976-04-02 | Electronic lens unit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52147977A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS538064A (en) * | 1976-05-14 | 1978-01-25 | Thomson Csf | Particle optical device |
| JP2014049545A (ja) * | 2012-08-30 | 2014-03-17 | Nuflare Technology Inc | 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52117574A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Electronic beam exposure unit |
| JPS52119080A (en) * | 1976-03-31 | 1977-10-06 | Fujitsu Ltd | Electron beam exposure |
-
1976
- 1976-04-02 JP JP3764276A patent/JPS52147977A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52117574A (en) * | 1976-03-30 | 1977-10-03 | Toshiba Corp | Electronic beam exposure unit |
| JPS52119080A (en) * | 1976-03-31 | 1977-10-06 | Fujitsu Ltd | Electron beam exposure |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS538064A (en) * | 1976-05-14 | 1978-01-25 | Thomson Csf | Particle optical device |
| JP2014049545A (ja) * | 2012-08-30 | 2014-03-17 | Nuflare Technology Inc | 荷電粒子ビーム描画方法及び荷電粒子ビーム描画装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5337710B2 (enExample) | 1978-10-11 |
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