JPS52119080A - Electron beam exposure - Google Patents

Electron beam exposure

Info

Publication number
JPS52119080A
JPS52119080A JP3540376A JP3540376A JPS52119080A JP S52119080 A JPS52119080 A JP S52119080A JP 3540376 A JP3540376 A JP 3540376A JP 3540376 A JP3540376 A JP 3540376A JP S52119080 A JPS52119080 A JP S52119080A
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
slit plates
bya
revolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3540376A
Other languages
Japanese (ja)
Other versions
JPS568491B2 (en
Inventor
Yasutaka Ban
Hiroshi Yasuda
Moritaka Nakamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3540376A priority Critical patent/JPS52119080A/en
Publication of JPS52119080A publication Critical patent/JPS52119080A/en
Publication of JPS568491B2 publication Critical patent/JPS568491B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: A lens system, that controls the revolution of the electron beam, and slit plates each having a rectangular-shaped opening, which can be high-precision-machined, are combined, so that the shape of the cross section of the beam can be altered bya purely electrical means without the necessity of moving or changing the slit plates.
COPYRIGHT: (C)1977,JPO&Japio
JP3540376A 1976-03-31 1976-03-31 Electron beam exposure Granted JPS52119080A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3540376A JPS52119080A (en) 1976-03-31 1976-03-31 Electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3540376A JPS52119080A (en) 1976-03-31 1976-03-31 Electron beam exposure

Publications (2)

Publication Number Publication Date
JPS52119080A true JPS52119080A (en) 1977-10-06
JPS568491B2 JPS568491B2 (en) 1981-02-24

Family

ID=12440932

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3540376A Granted JPS52119080A (en) 1976-03-31 1976-03-31 Electron beam exposure

Country Status (1)

Country Link
JP (1) JPS52119080A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52147977A (en) * 1976-04-02 1977-12-08 Jeol Ltd Electronic lens unit
JPS5328379A (en) * 1977-06-22 1978-03-16 Jeol Ltd Electron lens device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
AN ELECTRON EXPOSURE SYSTEM FOR RECORDING AND PRINTING=1972 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52147977A (en) * 1976-04-02 1977-12-08 Jeol Ltd Electronic lens unit
JPS5337710B2 (en) * 1976-04-02 1978-10-11
JPS5328379A (en) * 1977-06-22 1978-03-16 Jeol Ltd Electron lens device
JPS5334470B2 (en) * 1977-06-22 1978-09-20

Also Published As

Publication number Publication date
JPS568491B2 (en) 1981-02-24

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