JPS5214277B2 - - Google Patents

Info

Publication number
JPS5214277B2
JPS5214277B2 JP5211075A JP5211075A JPS5214277B2 JP S5214277 B2 JPS5214277 B2 JP S5214277B2 JP 5211075 A JP5211075 A JP 5211075A JP 5211075 A JP5211075 A JP 5211075A JP S5214277 B2 JPS5214277 B2 JP S5214277B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5211075A
Other languages
Japanese (ja)
Other versions
JPS50151996A (xx
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50151996A publication Critical patent/JPS50151996A/ja
Publication of JPS5214277B2 publication Critical patent/JPS5214277B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12Sulfonium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66Arsenic compounds
    • C07F9/68Arsenic compounds without As—C bonds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/90Antimony compounds
    • C07F9/902Compounds without antimony-carbon linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F236/00Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
    • C08F236/02Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
    • C08F236/04Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
    • C08F236/14Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
    • C08F236/16Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08Saturated oxiranes
    • C08G65/10Saturated oxiranes characterised by the catalysts used
    • C08G65/105Onium compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Epoxy Resins (AREA)
  • Casings For Electric Apparatus (AREA)
  • Reinforced Plastic Materials (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5211075A 1974-05-02 1975-05-01 Expired JPS5214277B2 (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46637574A 1974-05-02 1974-05-02

Publications (2)

Publication Number Publication Date
JPS50151996A JPS50151996A (xx) 1975-12-06
JPS5214277B2 true JPS5214277B2 (xx) 1977-04-20

Family

ID=23851515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5211075A Expired JPS5214277B2 (xx) 1974-05-02 1975-05-01

Country Status (5)

Country Link
JP (1) JPS5214277B2 (xx)
BE (1) BE828669A (xx)
DE (2) DE2559879C2 (xx)
FR (1) FR2269552B1 (xx)
GB (2) GB1516351A (xx)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0726498A1 (en) 1995-02-10 1996-08-14 Fuji Photo Film Co., Ltd. Photopolymerizable composition
EP1615073A1 (en) 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording method using the same
EP1701213A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Photosensitive composition
EP1707352A1 (en) 2005-03-31 2006-10-04 Fuji Photo Film Co., Ltd. Method of producing a planographic printing plate
EP1728838A1 (en) 2005-05-31 2006-12-06 Fuji Photo Film Co., Ltd. Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same
EP1955858A1 (en) 2007-02-06 2008-08-13 FUJIFILM Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
EP1955850A2 (en) 2007-02-07 2008-08-13 FUJIFILM Corporation Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method
EP1975213A1 (en) 2006-07-03 2008-10-01 FUJIFILM Corporation Ink composition, injet recording method, printed material, and process for producing lithographic printing plate
EP1988136A1 (en) 2007-03-01 2008-11-05 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate
EP2042335A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Inkjet recording method
EP2042243A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Coater and ink-jet recording device using the same
EP2088176A1 (en) 2008-02-07 2009-08-12 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, and molded printed material
EP2093265A1 (en) 2008-02-25 2009-08-26 FUJIFILM Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
EP2100925A2 (en) 2008-03-11 2009-09-16 FUJIFILM Corporation Pigment composition, ink composition, printed article, inkjet recording method and polyallylamine derivative
EP2105478A1 (en) 2008-03-26 2009-09-30 FUJIFILM Corporation Inkjet recording method and inkjet recording system
EP2216377A1 (en) 2009-02-09 2010-08-11 FUJIFILM Corporation Ink composition, and inkjet recording method
EP2230284A1 (en) 2009-03-17 2010-09-22 Fujifilm Corporation Ink composition and inkjet recording method
EP2311918A1 (en) 2009-09-29 2011-04-20 FUJIFILM Corporation Ink composition, and inkjet recording method
EP2644664A1 (en) 2012-03-29 2013-10-02 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
WO2014136923A1 (ja) 2013-03-07 2014-09-12 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、印刷物、及び、成型印刷物の製造方法
EP2842763A2 (en) 2013-08-30 2015-03-04 Fujifilm Corporation Image formation method, decorative sheet, decorative sheet molding, process for producing in-mold molded product, in-mold molded product, and ink set

Families Citing this family (61)

* Cited by examiner, † Cited by third party
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GB1539192A (en) 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
AU517415B2 (en) * 1976-07-09 1981-07-30 General Electric Company Curable polymer composition
US4090936A (en) 1976-10-28 1978-05-23 Minnesota Mining And Manufacturing Company Photohardenable compositions
US4101513A (en) * 1977-02-02 1978-07-18 Minnesota Mining And Manufacturing Company Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof
GB1604953A (en) * 1977-08-05 1981-12-16 Gen Electric Photocurable compositions and method for curing
NL7812075A (nl) * 1977-12-16 1979-06-19 Gen Electric Hardbare, harsbevattende materialen en werkwijze voor het opschuimen hiervan.
GB2013208B (en) * 1977-12-16 1982-11-24 Gen Electric Heat curable compositions
DE2854011C2 (de) * 1978-12-14 1983-04-21 General Electric Co., Schenectady, N.Y. Hitzehärtbare Masse und Verfahren zu deren Herstellung
US4310469A (en) 1978-12-29 1982-01-12 General Electric Company Diaryliodonium salts
US4246298A (en) * 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
DE3029247C2 (de) * 1979-08-03 1996-04-11 Gen Electric UV-härtbare Siliconüberzugsmassen, Verfahren zu deren Herstellung und deren Verwendung
US4351708A (en) 1980-02-29 1982-09-28 Ciba-Geigy Corporation Photochemically or thermally polymerizable mixtures
DE3107087A1 (de) * 1980-02-29 1981-12-24 CIBA-GEIGY AG, 4002 Basel "photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
US4294746A (en) 1980-06-17 1981-10-13 Union Carbide Corporation Stabilizers for cycloaliphatic epoxide containing compositions
JPS5887348A (ja) * 1981-11-20 1983-05-25 株式会社中川製作所 捲取ロ−ラ−
EP0094915B1 (de) * 1982-05-19 1987-01-21 Ciba-Geigy Ag Härtbare, Metallocenkomplexe enthaltende Zusammensetzungen, daraus erhältliche aktivierte Vorstufen und deren Verwendung
US4482679A (en) * 1982-09-18 1984-11-13 Ciba-Geigy Corporation Heat-curable epoxy compositions containing diaryliodosyl salts
US4518676A (en) * 1982-09-18 1985-05-21 Ciba Geigy Corporation Photopolymerizable compositions containing diaryliodosyl salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
JPS59152922A (ja) * 1983-02-18 1984-08-31 Mitsubishi Electric Corp 高エネルギ−線硬化型樹脂組成物
ATE37242T1 (de) * 1984-02-10 1988-09-15 Ciba Geigy Ag Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.
JPS61190524A (ja) * 1985-01-25 1986-08-25 Asahi Denka Kogyo Kk エネルギ−線硬化性組成物
US5194365A (en) * 1985-06-19 1993-03-16 Ciba-Geigy Corporation Method for forming images
US4786569A (en) * 1985-09-04 1988-11-22 Ciba-Geigy Corporation Adhesively bonded photostructurable polyimide film
DE3604580A1 (de) * 1986-02-14 1987-08-20 Basf Ag Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
CH678897A5 (xx) * 1986-05-10 1991-11-15 Ciba Geigy Ag
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
US4857437A (en) * 1986-12-17 1989-08-15 Ciba-Geigy Corporation Process for the formation of an image
US4882201A (en) * 1988-03-21 1989-11-21 General Electric Company Non-toxic aryl onium salts, UV curable coating compositions and food packaging use
DE3933420C1 (xx) * 1989-10-06 1991-03-07 Th. Goldschmidt Ag, 4300 Essen, De
DE4024661C1 (en) * 1990-08-03 1992-04-02 Th. Goldschmidt Ag, 4300 Essen, De Tris:tri:fluoromethane:sulphonated complexes - prepd. by mixing boron tri:fluoro:methanesulphonate with onium salt in organic solvent
DE4027437C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane(s) - used as coating materials for laminar supports or modifying additives for cationically curable cpds.
DE4027438C1 (en) * 1990-08-30 1991-08-29 Th. Goldschmidt Ag, 4300 Essen, De Cationically curable organo-polysiloxane cpd. prodn. - by reacting di:hydro:propane with an organo-polysiloxane in presence of catalyst at elevated temp.
DE4110793C1 (en) * 1991-04-04 1992-04-02 Th. Goldschmidt Ag, 4300 Essen, De Organo:polysiloxane - used as photoinitiator in cationically curable organo:polysiloxane compsn. esp. contg. epoxy¨ or vinyl¨ gps.
JPH0662692B2 (ja) * 1991-10-30 1994-08-17 オーテックス株式会社 光重合反応開始剤
DE4421623A1 (de) * 1994-06-21 1996-01-04 Thera Ges Fuer Patente Mehrkomponentige, kationisch härtende Epoxidmassen und deren Verwendung sowie Verfahren zur Herstellung gehärteter Massen
DE19534594B4 (de) * 1995-09-19 2007-07-26 Delo Industrieklebstoffe Gmbh & Co. Kg Kationisch härtende, flexible Epoxidharzmassen und ihre Verwendung zum Auftragen dünner Schichten
EP0927726B1 (en) 1996-09-19 2004-11-10 Nippon Soda Co., Ltd. Photocatalytic composition
JPH1087963A (ja) * 1996-09-20 1998-04-07 Japan Synthetic Rubber Co Ltd 樹脂組成物および繊維質材料成形型
JP3786480B2 (ja) * 1996-10-14 2006-06-14 Jsr株式会社 光硬化性樹脂組成物
JP3626302B2 (ja) * 1996-12-10 2005-03-09 Jsr株式会社 光硬化性樹脂組成物
JP3765896B2 (ja) 1996-12-13 2006-04-12 Jsr株式会社 光学的立体造形用光硬化性樹脂組成物
DE59912389D1 (de) 1999-01-16 2005-09-15 Goldschmidt Gmbh Photoinitiatoren zur kationischen Härtung
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
DE60011778T2 (de) 1999-08-02 2004-11-11 Nippon Soda Co. Ltd. Photovernetzbare zusammensetzungen mit einer iodonium-salz-verbindung
JP2001106648A (ja) * 1999-08-02 2001-04-17 Nippon Soda Co Ltd ヨードニウム塩化合物を含有する光硬化性組成物
GB9921779D0 (en) 1999-09-16 1999-11-17 Ciba Sc Holding Ag UV-Curable compositions
AU5649400A (en) 1999-09-21 2001-10-11 Goldschmidt Ag Photoinitiators containing urethane groups for cationic curing
US6756013B1 (en) 2000-08-14 2004-06-29 Cornell Development Corporation, Llc Compositions of iodonium compounds and methods and uses thereof
JP2003073481A (ja) 2001-09-06 2003-03-12 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
JP2003105077A (ja) 2001-09-28 2003-04-09 Brother Ind Ltd 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ
TWI246525B (en) 2001-11-06 2006-01-01 Wako Pure Chem Ind Ltd Hybrid onium salt
DE60230679D1 (de) 2002-03-04 2009-02-12 Wako Pure Chem Ind Ltd Heterocyclustragende oniumsalze
EP1348727A3 (en) 2002-03-29 2003-12-03 Brother Kogyo Kabushiki Kaisha Image-receiving layer composition and overcoat layer composition for ink-jet recording
US7709553B2 (en) * 2003-05-07 2010-05-04 Mitsui Chemicals, Inc. Photo cation polymerizable resin composition and surface protective material for optical disk
DE10341137A1 (de) 2003-09-06 2005-03-31 Goldschmidt Ag Verwendung von hydroxyfunktionellen Polyalkylorganosiloxanen als Lösungsmittel für kationische Photoinitiatoren für die Verwendung in strahlenhärtbaren Siliconen
TW200838967A (en) 2007-02-02 2008-10-01 Jsr Corp Composition for radiation-curable adhesive, composite, and method for producing the composite
JP5622564B2 (ja) 2010-06-30 2014-11-12 富士フイルム株式会社 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子
WO2013172407A1 (ja) 2012-05-18 2013-11-21 シーメット株式会社 光学的立体造形用樹脂組成物
WO2021124114A1 (en) 2019-12-18 2021-06-24 3M Innovative Properties Company Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1539192A (en) 1975-01-27 1979-01-31 Ici Ltd Photopolymerisable compositions

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0726498A1 (en) 1995-02-10 1996-08-14 Fuji Photo Film Co., Ltd. Photopolymerizable composition
EP1615073A1 (en) 2004-07-06 2006-01-11 Fuji Photo Film Co., Ltd. Photosensitive composition and image recording method using the same
EP1701213A2 (en) 2005-03-08 2006-09-13 Fuji Photo Film Co., Ltd. Photosensitive composition
EP1707352A1 (en) 2005-03-31 2006-10-04 Fuji Photo Film Co., Ltd. Method of producing a planographic printing plate
EP1728838A1 (en) 2005-05-31 2006-12-06 Fuji Photo Film Co., Ltd. Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same
EP1975213A1 (en) 2006-07-03 2008-10-01 FUJIFILM Corporation Ink composition, injet recording method, printed material, and process for producing lithographic printing plate
EP1955858A1 (en) 2007-02-06 2008-08-13 FUJIFILM Corporation Undercoat solution, ink-jet recording method and ink-jet recording device
EP1955850A2 (en) 2007-02-07 2008-08-13 FUJIFILM Corporation Ink-jet head maintenance device, ink-jet recording device and ink-jet head maintenance method
EP1988136A1 (en) 2007-03-01 2008-11-05 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, method for producing planographic printing plate, and planographic printing plate
EP2042335A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Inkjet recording method
EP2042243A2 (en) 2007-09-28 2009-04-01 FUJIFILM Corporation Coater and ink-jet recording device using the same
EP2088176A1 (en) 2008-02-07 2009-08-12 FUJIFILM Corporation Ink composition, inkjet recording method, printed material, and molded printed material
EP2093265A1 (en) 2008-02-25 2009-08-26 FUJIFILM Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
EP2100925A2 (en) 2008-03-11 2009-09-16 FUJIFILM Corporation Pigment composition, ink composition, printed article, inkjet recording method and polyallylamine derivative
EP2105478A1 (en) 2008-03-26 2009-09-30 FUJIFILM Corporation Inkjet recording method and inkjet recording system
EP2216377A1 (en) 2009-02-09 2010-08-11 FUJIFILM Corporation Ink composition, and inkjet recording method
EP2230284A1 (en) 2009-03-17 2010-09-22 Fujifilm Corporation Ink composition and inkjet recording method
EP2311918A1 (en) 2009-09-29 2011-04-20 FUJIFILM Corporation Ink composition, and inkjet recording method
EP2644664A1 (en) 2012-03-29 2013-10-02 Fujifilm Corporation Actinic radiation-curing type ink composition, inkjet recording method, decorative sheet, decorative sheet molded product, process for producing in-mold molded article, and in-mold molded article
WO2014136923A1 (ja) 2013-03-07 2014-09-12 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、印刷物、及び、成型印刷物の製造方法
EP2842763A2 (en) 2013-08-30 2015-03-04 Fujifilm Corporation Image formation method, decorative sheet, decorative sheet molding, process for producing in-mold molded product, in-mold molded product, and ink set

Also Published As

Publication number Publication date
FR2269552B1 (xx) 1978-09-01
GB1516351A (en) 1978-07-05
GB1516352A (en) 1978-07-05
FR2269552A1 (xx) 1975-11-28
DE2518639A1 (de) 1975-11-06
BE828669A (fr) 1975-09-01
JPS50151996A (xx) 1975-12-06
DE2518639B2 (de) 1978-07-13
DE2559879C2 (de) 1982-03-04
DE2518639C3 (de) 1979-05-23

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