JPS52137266A - Method of sputter etching - Google Patents
Method of sputter etchingInfo
- Publication number
- JPS52137266A JPS52137266A JP5418176A JP5418176A JPS52137266A JP S52137266 A JPS52137266 A JP S52137266A JP 5418176 A JP5418176 A JP 5418176A JP 5418176 A JP5418176 A JP 5418176A JP S52137266 A JPS52137266 A JP S52137266A
- Authority
- JP
- Japan
- Prior art keywords
- sputter etching
- sputter
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5418176A JPS52137266A (en) | 1976-05-12 | 1976-05-12 | Method of sputter etching |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5418176A JPS52137266A (en) | 1976-05-12 | 1976-05-12 | Method of sputter etching |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52137266A true JPS52137266A (en) | 1977-11-16 |
Family
ID=12963361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5418176A Pending JPS52137266A (en) | 1976-05-12 | 1976-05-12 | Method of sputter etching |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52137266A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5776840A (en) * | 1980-10-31 | 1982-05-14 | Victor Co Of Japan Ltd | Forming method of pattern |
JPS61145832A (en) * | 1984-12-20 | 1986-07-03 | Sanyo Electric Co Ltd | Low temperature plasma etching |
JPS61224423A (en) * | 1985-03-29 | 1986-10-06 | Toshiba Corp | Reactive ion etching appratus |
-
1976
- 1976-05-12 JP JP5418176A patent/JPS52137266A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5776840A (en) * | 1980-10-31 | 1982-05-14 | Victor Co Of Japan Ltd | Forming method of pattern |
JPS61145832A (en) * | 1984-12-20 | 1986-07-03 | Sanyo Electric Co Ltd | Low temperature plasma etching |
JPH0426536B2 (en) * | 1984-12-20 | 1992-05-07 | Sanyo Electric Co | |
JPS61224423A (en) * | 1985-03-29 | 1986-10-06 | Toshiba Corp | Reactive ion etching appratus |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51132972A (en) | Method of etching | |
JPS5236979A (en) | Method of etching | |
JPS533773A (en) | Method of etching substrate | |
JPS5223401A (en) | Method of etching photography | |
JPS52141443A (en) | Method of etching films | |
JPS52144020A (en) | Method of etching glass surface | |
JPS5328530A (en) | Method of etching surfaces of solids | |
JPS532361A (en) | Etching method | |
JPS52137266A (en) | Method of sputter etching | |
JPS5328378A (en) | Method of plasma etching | |
JPS5285035A (en) | Method of partially etching semiiconductors | |
JPS52114444A (en) | Plasma etching method | |
GB1554282A (en) | Sputter etching | |
JPS5319315A (en) | Method of etching | |
JPS52141444A (en) | Method of etching aluminum | |
JPS52133043A (en) | Method of etching aluminum | |
JPS5328616A (en) | Method of etching glasssferrite composite | |
JPS536239A (en) | Plasma etching method | |
JPS5368642A (en) | Plasma etching method | |
JPS5357144A (en) | Method of effecting etching of silicone | |
JPS5290436A (en) | Plasm etching method | |
JPS5356830A (en) | Method of pushing up largeesized forms | |
SU649722A1 (en) | Method of obtaining 1-halogengermathranes | |
JPS52148305A (en) | Etching method | |
JPS52108349A (en) | Etching method |