JPS52137266A - Method of sputter etching - Google Patents

Method of sputter etching

Info

Publication number
JPS52137266A
JPS52137266A JP5418176A JP5418176A JPS52137266A JP S52137266 A JPS52137266 A JP S52137266A JP 5418176 A JP5418176 A JP 5418176A JP 5418176 A JP5418176 A JP 5418176A JP S52137266 A JPS52137266 A JP S52137266A
Authority
JP
Japan
Prior art keywords
sputter etching
sputter
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5418176A
Other languages
Japanese (ja)
Inventor
Katsuzou Ukai
Kunio Hanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NICHIDEN VARIAN KK
Original Assignee
NICHIDEN VARIAN KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NICHIDEN VARIAN KK filed Critical NICHIDEN VARIAN KK
Priority to JP5418176A priority Critical patent/JPS52137266A/en
Publication of JPS52137266A publication Critical patent/JPS52137266A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP5418176A 1976-05-12 1976-05-12 Method of sputter etching Pending JPS52137266A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5418176A JPS52137266A (en) 1976-05-12 1976-05-12 Method of sputter etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5418176A JPS52137266A (en) 1976-05-12 1976-05-12 Method of sputter etching

Publications (1)

Publication Number Publication Date
JPS52137266A true JPS52137266A (en) 1977-11-16

Family

ID=12963361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5418176A Pending JPS52137266A (en) 1976-05-12 1976-05-12 Method of sputter etching

Country Status (1)

Country Link
JP (1) JPS52137266A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776840A (en) * 1980-10-31 1982-05-14 Victor Co Of Japan Ltd Forming method of pattern
JPS61145832A (en) * 1984-12-20 1986-07-03 Sanyo Electric Co Ltd Low temperature plasma etching
JPS61224423A (en) * 1985-03-29 1986-10-06 Toshiba Corp Reactive ion etching appratus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5776840A (en) * 1980-10-31 1982-05-14 Victor Co Of Japan Ltd Forming method of pattern
JPS61145832A (en) * 1984-12-20 1986-07-03 Sanyo Electric Co Ltd Low temperature plasma etching
JPH0426536B2 (en) * 1984-12-20 1992-05-07 Sanyo Electric Co
JPS61224423A (en) * 1985-03-29 1986-10-06 Toshiba Corp Reactive ion etching appratus

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