JPS51146174A - Diode device fabrication method - Google Patents
Diode device fabrication methodInfo
- Publication number
- JPS51146174A JPS51146174A JP7047975A JP7047975A JPS51146174A JP S51146174 A JPS51146174 A JP S51146174A JP 7047975 A JP7047975 A JP 7047975A JP 7047975 A JP7047975 A JP 7047975A JP S51146174 A JPS51146174 A JP S51146174A
- Authority
- JP
- Japan
- Prior art keywords
- fabrication method
- diode device
- device fabrication
- daubed
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Bipolar Transistors (AREA)
Abstract
PURPOSE: A diode device fabrication method, that simplifies process by utilizing photo-resist film as a mask while making daubed multi-crystal silicone formed by ion injection as diffusion source.
COPYRIGHT: (C)1976,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7047975A JPS51146174A (en) | 1975-06-11 | 1975-06-11 | Diode device fabrication method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7047975A JPS51146174A (en) | 1975-06-11 | 1975-06-11 | Diode device fabrication method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51146174A true JPS51146174A (en) | 1976-12-15 |
JPS5734646B2 JPS5734646B2 (en) | 1982-07-24 |
Family
ID=13432687
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7047975A Granted JPS51146174A (en) | 1975-06-11 | 1975-06-11 | Diode device fabrication method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51146174A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58154267A (en) * | 1982-03-08 | 1983-09-13 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of producing bipolar transistor |
JPS63226920A (en) * | 1987-03-16 | 1988-09-21 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of semiconductor device |
US6342714B1 (en) | 1998-02-16 | 2002-01-29 | Nec Corporation | HSG lower electrode structure having a neck supported by a silicon layer |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5737942A (en) * | 1980-08-13 | 1982-03-02 | Toshiba Corp | Optical signal relay system |
JPH07109995B2 (en) * | 1989-04-24 | 1995-11-22 | 三菱電機株式会社 | Optical transmission interface |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS504976A (en) * | 1973-05-16 | 1975-01-20 |
-
1975
- 1975-06-11 JP JP7047975A patent/JPS51146174A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS504976A (en) * | 1973-05-16 | 1975-01-20 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58154267A (en) * | 1982-03-08 | 1983-09-13 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of producing bipolar transistor |
JPH0376575B2 (en) * | 1982-03-08 | 1991-12-05 | Intaanashonaru Bijinesu Mashiinzu Corp | |
JPS63226920A (en) * | 1987-03-16 | 1988-09-21 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of semiconductor device |
US6342714B1 (en) | 1998-02-16 | 2002-01-29 | Nec Corporation | HSG lower electrode structure having a neck supported by a silicon layer |
Also Published As
Publication number | Publication date |
---|---|
JPS5734646B2 (en) | 1982-07-24 |
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