JPS50118802A - - Google Patents

Info

Publication number
JPS50118802A
JPS50118802A JP2394074A JP2394074A JPS50118802A JP S50118802 A JPS50118802 A JP S50118802A JP 2394074 A JP2394074 A JP 2394074A JP 2394074 A JP2394074 A JP 2394074A JP S50118802 A JPS50118802 A JP S50118802A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2394074A
Other languages
Japanese (ja)
Other versions
JPS5534929B2 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2394074A priority Critical patent/JPS5534929B2/ja
Priority to GB813175A priority patent/GB1505739A/en
Priority to CA221,185A priority patent/CA1060252A/en
Priority to DE19752508618 priority patent/DE2508618C2/de
Priority to FR7506415A priority patent/FR2262813B1/fr
Publication of JPS50118802A publication Critical patent/JPS50118802A/ja
Priority to US05/760,371 priority patent/US4123276A/en
Publication of JPS5534929B2 publication Critical patent/JPS5534929B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2394074A 1974-02-28 1974-02-28 Expired JPS5534929B2 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2394074A JPS5534929B2 (de) 1974-02-28 1974-02-28
GB813175A GB1505739A (en) 1974-02-28 1975-02-26 Photosensitive composition
CA221,185A CA1060252A (en) 1974-02-28 1975-02-27 Photosensitive composition containing diazo compound and copolymer
DE19752508618 DE2508618C2 (de) 1974-02-28 1975-02-27 Lichtempfindliches Gemisch
FR7506415A FR2262813B1 (de) 1974-02-28 1975-02-28
US05/760,371 US4123276A (en) 1974-02-28 1977-01-18 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2394074A JPS5534929B2 (de) 1974-02-28 1974-02-28

Publications (2)

Publication Number Publication Date
JPS50118802A true JPS50118802A (de) 1975-09-17
JPS5534929B2 JPS5534929B2 (de) 1980-09-10

Family

ID=12124516

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2394074A Expired JPS5534929B2 (de) 1974-02-28 1974-02-28

Country Status (5)

Country Link
JP (1) JPS5534929B2 (de)
CA (1) CA1060252A (de)
DE (1) DE2508618C2 (de)
FR (1) FR2262813B1 (de)
GB (1) GB1505739A (de)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
JPS5498613A (en) * 1978-01-09 1979-08-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5552054A (en) * 1978-10-11 1980-04-16 Konishiroku Photo Ind Co Ltd Developing solution composition
JPS564144A (en) * 1979-06-23 1981-01-17 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPS575042A (en) * 1980-04-30 1982-01-11 Minnesota Mining & Mfg Photosensitive composition capable of being aqueously developed and printing block
JPS60217356A (ja) * 1984-04-13 1985-10-30 Asahi Chem Ind Co Ltd 感光性組成物
JPS63285537A (ja) * 1987-05-18 1988-11-22 Koyo Kagaku Kogyo Kk 平版製版用感光性組成物
JPH03125151A (ja) * 1989-10-11 1991-05-28 Konica Corp 湿し水不要の感光性平版印刷版用現像液
JPH03148663A (ja) * 1989-11-03 1991-06-25 Konica Corp 湿し水不要の感光性平版印刷版用現像液
JPH03148662A (ja) * 1989-11-03 1991-06-25 Konica Corp 湿し水不要の感光性平版印刷版用現像液
JPH08211606A (ja) * 1995-12-18 1996-08-20 Asahi Chem Ind Co Ltd 感光性組成物の製造方法
US6689539B2 (en) 2000-01-05 2004-02-10 Kodak Polychrome Graphics Llc Photosensitive composition and photosensitive lithographic printing plate
EP1625944A1 (de) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung eines Trägers für eine lithographische Druckplatte
WO2006023667A1 (en) 2004-08-23 2006-03-02 Eastman Kodak Company Lithographic printing plate precursor
EP1712368A1 (de) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung eines Flachdruckplattenträgers
JP2007160594A (ja) * 2005-12-12 2007-06-28 Okamoto Kagaku Kogyo Kk 平版印刷版用捨版およびその製造方法
EP2100677A1 (de) 2008-03-06 2009-09-16 Fujifilm Corporation Verfahren zur Herstellung einer Aluminiumlegierungsplatte für eine lithografische Druckplatte, dadurch erhaltene Aluminiumlegierungsplatte für eine lithografische Druckplatte und lithografische Druckplattenunterstützung

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5964396A (ja) * 1982-10-05 1984-04-12 Fuji Photo Film Co Ltd 平版印刷版用版面保護剤
FR2651337B1 (fr) * 1989-08-31 1991-12-06 Efi Composition photosensible a base de condensat diazouique pour plaques offset.
DE4430680A1 (de) * 1994-08-29 1996-03-07 Hoechst Ag Lichtempfindliches Gemisch
EP2042339B1 (de) 2007-09-26 2013-05-22 FUJIFILM Corporation Feuchtwasserzusammensetzung für Lithographiedruck und Offset-Druckverfahren für wärmehärtende Tinte
US20090081592A1 (en) 2007-09-26 2009-03-26 Fujifilm Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009234247A (ja) 2008-03-07 2009-10-15 Fujifilm Corp 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5288268B2 (ja) 2009-03-25 2013-09-11 富士フイルム株式会社 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5281130B2 (ja) 2011-07-05 2013-09-04 富士フイルム株式会社 平版印刷用湿し水組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2034654C2 (de) * 1970-07-13 1982-08-26 Hoechst Ag, 6000 Frankfurt Negativ arbeitende Kopierlösung und deren Verwendung zur Herstellung von Druckplatten
IT948621B (it) * 1971-02-19 1973-06-11 Howson Algraphy Ltd Procedimento per produrre lastre da stampa litografica e lastre cosi ottenute

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS533216A (en) * 1976-06-28 1978-01-12 Fuji Photo Film Co Ltd Diazo photosensitive composition
JPS578460B2 (de) * 1976-06-28 1982-02-16
JPS6142251B2 (de) * 1978-01-09 1986-09-19 Konishiroku Photo Ind
JPS5498613A (en) * 1978-01-09 1979-08-03 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS6260701B2 (de) * 1978-06-16 1987-12-17 Fuji Photo Film Co Ltd
JPS5552054A (en) * 1978-10-11 1980-04-16 Konishiroku Photo Ind Co Ltd Developing solution composition
JPS6336490B2 (de) * 1978-10-11 1988-07-20 Konika Kk
JPH0128366B2 (de) * 1979-06-23 1989-06-02 Tokyo Ohka Kogyo Co Ltd
JPS564144A (en) * 1979-06-23 1981-01-17 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPH0366662B2 (de) * 1980-04-30 1991-10-18 Minnesota Mining & Mfg
JPS575042A (en) * 1980-04-30 1982-01-11 Minnesota Mining & Mfg Photosensitive composition capable of being aqueously developed and printing block
JPS60217356A (ja) * 1984-04-13 1985-10-30 Asahi Chem Ind Co Ltd 感光性組成物
JPH057704B2 (de) * 1984-04-13 1993-01-29 Asahi Chemical Ind
JPS63285537A (ja) * 1987-05-18 1988-11-22 Koyo Kagaku Kogyo Kk 平版製版用感光性組成物
JPH03125151A (ja) * 1989-10-11 1991-05-28 Konica Corp 湿し水不要の感光性平版印刷版用現像液
JPH03148662A (ja) * 1989-11-03 1991-06-25 Konica Corp 湿し水不要の感光性平版印刷版用現像液
JPH03148663A (ja) * 1989-11-03 1991-06-25 Konica Corp 湿し水不要の感光性平版印刷版用現像液
JPH08211606A (ja) * 1995-12-18 1996-08-20 Asahi Chem Ind Co Ltd 感光性組成物の製造方法
US6689539B2 (en) 2000-01-05 2004-02-10 Kodak Polychrome Graphics Llc Photosensitive composition and photosensitive lithographic printing plate
EP1625944A1 (de) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung eines Trägers für eine lithographische Druckplatte
WO2006023667A1 (en) 2004-08-23 2006-03-02 Eastman Kodak Company Lithographic printing plate precursor
EP1712368A1 (de) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Verfahren zur Herstellung eines Flachdruckplattenträgers
JP2007160594A (ja) * 2005-12-12 2007-06-28 Okamoto Kagaku Kogyo Kk 平版印刷版用捨版およびその製造方法
EP2100677A1 (de) 2008-03-06 2009-09-16 Fujifilm Corporation Verfahren zur Herstellung einer Aluminiumlegierungsplatte für eine lithografische Druckplatte, dadurch erhaltene Aluminiumlegierungsplatte für eine lithografische Druckplatte und lithografische Druckplattenunterstützung

Also Published As

Publication number Publication date
JPS5534929B2 (de) 1980-09-10
FR2262813B1 (de) 1977-04-15
DE2508618A1 (de) 1975-09-04
CA1060252A (en) 1979-08-14
GB1505739A (en) 1978-03-30
FR2262813A1 (de) 1975-09-26
DE2508618C2 (de) 1984-01-26

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