JPS50105381A - - Google Patents

Info

Publication number
JPS50105381A
JPS50105381A JP49149133A JP14913374A JPS50105381A JP S50105381 A JPS50105381 A JP S50105381A JP 49149133 A JP49149133 A JP 49149133A JP 14913374 A JP14913374 A JP 14913374A JP S50105381 A JPS50105381 A JP S50105381A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49149133A
Other languages
Japanese (ja)
Other versions
JPS5223221B2 (it
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50105381A publication Critical patent/JPS50105381A/ja
Publication of JPS5223221B2 publication Critical patent/JPS5223221B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP49149133A 1974-01-28 1974-12-27 Expired JPS5223221B2 (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US437585A US3900736A (en) 1974-01-28 1974-01-28 Method and apparatus for positioning a beam of charged particles

Publications (2)

Publication Number Publication Date
JPS50105381A true JPS50105381A (it) 1975-08-20
JPS5223221B2 JPS5223221B2 (it) 1977-06-22

Family

ID=23737046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49149133A Expired JPS5223221B2 (it) 1974-01-28 1974-12-27

Country Status (7)

Country Link
US (1) US3900736A (it)
JP (1) JPS5223221B2 (it)
CA (1) CA1016667A (it)
DE (1) DE2502431C2 (it)
FR (1) FR2259390B1 (it)
GB (1) GB1480561A (it)
IT (1) IT1027867B (it)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5360162A (en) * 1976-11-10 1978-05-30 Toshiba Corp Electron beam irradiation device
JPS5367365A (en) * 1976-11-29 1978-06-15 Nippon Telegr & Teleph Corp <Ntt> Correcting method for beam position
JPS54108581A (en) * 1978-02-13 1979-08-25 Jeol Ltd Electron-beam exposure device
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU705699A2 (ru) * 1976-05-03 1979-12-25 Орденов Ленина И Трудового Красного Знамени Институт Электросварки Им. Е.О.Патона Установка дл электроннолучевого нагрева материалов
JPS5394773A (en) * 1977-01-31 1978-08-19 Cho Lsi Gijutsu Kenkyu Kumiai Method of connecting graph in charged beam exposing device
US4137459A (en) * 1978-02-13 1979-01-30 International Business Machines Corporation Method and apparatus for applying focus correction in E-beam system
DE2937136A1 (de) * 1979-09-13 1981-04-02 Siemens AG, 1000 Berlin und 8000 München Verfahren und vorrichtung zur schnellen ablenkung eines korpuskularstrahls
JPS56124234A (en) * 1980-03-05 1981-09-29 Hitachi Ltd Correcting method for electron beam deflection
JPS5740927A (en) * 1980-08-26 1982-03-06 Fujitsu Ltd Exposing method of electron beam
EP0049872B1 (en) * 1980-10-15 1985-09-25 Kabushiki Kaisha Toshiba Electron beam exposure system
US4385238A (en) * 1981-03-03 1983-05-24 Veeco Instruments Incorporated Reregistration system for a charged particle beam exposure system
US4528452A (en) * 1982-12-09 1985-07-09 Electron Beam Corporation Alignment and detection system for electron image projectors
US4818885A (en) * 1987-06-30 1989-04-04 International Business Machines Corporation Electron beam writing method and system using large range deflection in combination with a continuously moving table
GB2238630B (en) * 1989-11-29 1993-12-22 Sundstrand Corp Control systems
DE4024084A1 (de) * 1989-11-29 1991-06-06 Daimler Benz Ag Verfahren zum herstellen von hohlen gaswechselventilen fuer hubkolbenmaschinen
JPH05206017A (ja) * 1991-08-09 1993-08-13 Internatl Business Mach Corp <Ibm> リソグラフイ露光システム及びその方法
JP2501726B2 (ja) * 1991-10-08 1996-05-29 インターナショナル・ビジネス・マシーンズ・コーポレイション コンピュ―タ・イメ―ジ生成装置及びデ―タ減縮方法
US5194349A (en) * 1992-02-07 1993-03-16 Midwest Research Institute Erasable, multiple level logic optical memory disk
US5304441A (en) * 1992-12-31 1994-04-19 International Business Machines Corporation Method of optimizing exposure of photoresist by patterning as a function of thermal modeling
US5838013A (en) * 1996-11-13 1998-11-17 International Business Machines Corporation Method for monitoring resist charging in a charged particle system
US20020063567A1 (en) * 2000-11-30 2002-05-30 Applied Materials, Inc. Measurement device with remote adjustment of electron beam stigmation by using MOSFET ohmic properties and isolation devices
US6803582B2 (en) * 2002-11-29 2004-10-12 Oregon Health & Science University One dimensional beam blanker array

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804646B2 (de) * 1968-10-18 1973-03-22 Siemens AG, 1000 Berlin u. 8000 München Korpuskularstrahl-bearbeitungsgeraet
US3644700A (en) * 1969-12-15 1972-02-22 Ibm Method and apparatus for controlling an electron beam

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5360162A (en) * 1976-11-10 1978-05-30 Toshiba Corp Electron beam irradiation device
JPS5754906B2 (it) * 1976-11-10 1982-11-20
JPS5367365A (en) * 1976-11-29 1978-06-15 Nippon Telegr & Teleph Corp <Ntt> Correcting method for beam position
JPS54108581A (en) * 1978-02-13 1979-08-25 Jeol Ltd Electron-beam exposure device
JPS5616543B2 (it) * 1978-02-13 1981-04-16
JPS5552223A (en) * 1978-10-13 1980-04-16 Nippon Telegr & Teleph Corp <Ntt> Exposure method in electronic beam exposure device

Also Published As

Publication number Publication date
DE2502431C2 (de) 1984-08-30
IT1027867B (it) 1978-12-20
US3900736A (en) 1975-08-19
DE2502431A1 (de) 1975-07-31
FR2259390B1 (it) 1976-10-22
GB1480561A (en) 1977-07-20
JPS5223221B2 (it) 1977-06-22
FR2259390A1 (it) 1975-08-22
CA1016667A (en) 1977-08-30

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