JPS49122269A - - Google Patents

Info

Publication number
JPS49122269A
JPS49122269A JP3175973A JP3175973A JPS49122269A JP S49122269 A JPS49122269 A JP S49122269A JP 3175973 A JP3175973 A JP 3175973A JP 3175973 A JP3175973 A JP 3175973A JP S49122269 A JPS49122269 A JP S49122269A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3175973A
Other versions
JPS5325632B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP3175973A priority Critical patent/JPS5325632B2/ja
Priority to US05/453,031 priority patent/US3998678A/en
Priority to NL7403950A priority patent/NL7403950A/xx
Priority to DE2413942A priority patent/DE2413942C3/de
Publication of JPS49122269A publication Critical patent/JPS49122269A/ja
Publication of JPS5325632B2 publication Critical patent/JPS5325632B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00—Electrodes common to discharge tubes
    • H01J2201/30—Cold cathodes
    • H01J2201/304—Field emission cathodes
    • H01J2201/30446—Field emission cathodes characterised by the emitter material
    • H01J2201/30453—Carbon types
    • H01J2201/30457—Diamond

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
JP3175973A 1973-03-22 1973-03-22 Expired JPS5325632B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3175973A JPS5325632B2 (ja) 1973-03-22 1973-03-22
US05/453,031 US3998678A (en) 1973-03-22 1974-03-20 Method of manufacturing thin-film field-emission electron source
NL7403950A NL7403950A (ja) 1973-03-22 1974-03-22
DE2413942A DE2413942C3 (de) 1973-03-22 1974-03-22 Verfahren zur Herstellung von Dunnfilm-Feldemissions-Elektronenquellen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3175973A JPS5325632B2 (ja) 1973-03-22 1973-03-22

Publications (2)

Publication Number Publication Date
JPS49122269A true JPS49122269A (ja) 1974-11-22
JPS5325632B2 JPS5325632B2 (ja) 1978-07-27

Family

ID=12339942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3175973A Expired JPS5325632B2 (ja) 1973-03-22 1973-03-22

Country Status (4)

Country Link
US (1) US3998678A (ja)
JP (1) JPS5325632B2 (ja)
DE (1) DE2413942C3 (ja)
NL (1) NL7403950A (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172631A (ja) * 1986-01-24 1987-07-29 コミツサリア　タ　レネルジ−　アトミ−ク カソ−ドルミネツセンス型表示手段の製造方法
JPS63237340A (ja) * 1987-03-26 1988-10-03 Canon Inc 表示装置
JPH04505073A (ja) * 1989-08-14 1992-09-03 ヒューズ・エアクラフト・カンパニー フィールドエミッタアレイの製造用の自己整列ゲート方法
JPH0684454A (ja) * 1992-02-14 1994-03-25 Micron Technol Inc 化学・機械研磨法を用いた冷陰極エミッタ先端部の周囲にセルフアライン型のゲート構造体を形成する方法
JPH06275189A (ja) * 1993-03-10 1994-09-30 Micron Technol Inc セルフアラインゲート構造および集束リングの形成法
US5653619A (en) * 1992-03-02 1997-08-05 Micron Technology, Inc. Method to form self-aligned gate structures and focus rings
US5696028A (en) * 1992-02-14 1997-12-09 Micron Technology, Inc. Method to form an insulative barrier useful in field emission displays for reducing surface leakage
US6022256A (en) * 1996-11-06 2000-02-08 Micron Display Technology, Inc. Field emission display and method of making same

Families Citing this family (121)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7604569A (nl) * 1976-04-29 1977-11-01 Philips Nv Veldemitterinrichting en werkwijze tot het vormen daarvan.
FR2443085A1 (fr) * 1978-07-24 1980-06-27 Thomson Csf Dispositif de microlithographie par bombardement electronique
JPS608574B2 (ja) * 1978-08-12 1985-03-04 大阪大学長 イオン源用半導体エミツタ−
US4291068A (en) * 1978-10-31 1981-09-22 The United States Of America As Represented By The Secretary Of The Army Method of making semiconductor photodetector with reduced time-constant
DE2920569A1 (de) * 1979-05-21 1980-12-04 Ibm Deutschland Elektrodenfuehrung fuer metallpapier- drucker
FR2461281A2 (fr) * 1979-07-06 1981-01-30 Thomson Csf Dispositif de microlithographie par bombardement electronique
US4307507A (en) * 1980-09-10 1981-12-29 The United States Of America As Represented By The Secretary Of The Navy Method of manufacturing a field-emission cathode structure
US4728851A (en) * 1982-01-08 1988-03-01 Ford Motor Company Field emitter device with gated memory
US4498952A (en) * 1982-09-17 1985-02-12 Condesin, Inc. Batch fabrication procedure for manufacture of arrays of field emitted electron beams with integral self-aligned optical lense in microguns
US4513308A (en) * 1982-09-23 1985-04-23 The United States Of America As Represented By The Secretary Of The Navy p-n Junction controlled field emitter array cathode
NL8400297A (nl) * 1984-02-01 1985-09-02 Philips Nv Halfgeleiderinrichting voor het opwekken van een elektronenbundel.
FR2568394B1 (fr) * 1984-07-27 1988-02-12 Commissariat Energie Atomique Dispositif de visualisation par cathodoluminescence excitee par emission de champ
US5201681A (en) * 1987-02-06 1993-04-13 Canon Kabushiki Kaisha Method of emitting electrons
US5176557A (en) * 1987-02-06 1993-01-05 Canon Kabushiki Kaisha Electron emission element and method of manufacturing the same
US4721885A (en) * 1987-02-11 1988-01-26 Sri International Very high speed integrated microelectronic tubes
USRE40062E1 (en) * 1987-07-15 2008-02-12 Canon Kabushiki Kaisha Display device with electron-emitting device with electron-emitting region insulated from electrodes
USRE40566E1 (en) * 1987-07-15 2008-11-11 Canon Kabushiki Kaisha Flat panel display including electron emitting device
US5066883A (en) * 1987-07-15 1991-11-19 Canon Kabushiki Kaisha Electron-emitting device with electron-emitting region insulated from electrodes
US5749763A (en) * 1987-07-15 1998-05-12 Canon Kabushiki Kaisha Display device with electron-emitting device with electron-emitting region insulted from electrodes
USRE39633E1 (en) * 1987-07-15 2007-05-15 Canon Kabushiki Kaisha Display device with electron-emitting device with electron-emitting region insulated from electrodes
US4818914A (en) * 1987-07-17 1989-04-04 Sri International High efficiency lamp
GB8816689D0 (en) * 1988-07-13 1988-08-17 Emi Plc Thorn Method of manufacturing cold cathode field emission device & field emission device manufactured by method
GB2227362B (en) * 1989-01-18 1992-11-04 Gen Electric Co Plc Electronic devices
GB2228822A (en) * 1989-03-01 1990-09-05 Gen Electric Co Plc Electronic devices.
US4975656A (en) * 1989-03-31 1990-12-04 Litton Systems, Inc. Enhanced secondary electron emitter
US4956574A (en) * 1989-08-08 1990-09-11 Motorola, Inc. Switched anode field emission device
US4943343A (en) * 1989-08-14 1990-07-24 Zaher Bardai Self-aligned gate process for fabricating field emitter arrays
US5019003A (en) * 1989-09-29 1991-05-28 Motorola, Inc. Field emission device having preformed emitters
JP2745814B2 (ja) * 1989-09-29 1998-04-28 モトローラ・インコーポレイテッド 電解放出デバイスを用いる平面パネル・ディスプレイ
US5055077A (en) * 1989-11-22 1991-10-08 Motorola, Inc. Cold cathode field emission device having an electrode in an encapsulating layer
US5064396A (en) * 1990-01-29 1991-11-12 Coloray Display Corporation Method of manufacturing an electric field producing structure including a field emission cathode
US4964946A (en) * 1990-02-02 1990-10-23 The United States Of America As Represented By The Secretary Of The Navy Process for fabricating self-aligned field emitter arrays
US5030921A (en) * 1990-02-09 1991-07-09 Motorola, Inc. Cascaded cold cathode field emission devices
US5007873A (en) * 1990-02-09 1991-04-16 Motorola, Inc. Non-planar field emission device having an emitter formed with a substantially normal vapor deposition process
US5142184B1 (en) * 1990-02-09 1995-11-21 Motorola Inc Cold cathode field emission device with integral emitter ballasting
US5079476A (en) * 1990-02-09 1992-01-07 Motorola, Inc. Encapsulated field emission device
US5047830A (en) * 1990-05-22 1991-09-10 Amp Incorporated Field emitter array integrated circuit chip interconnection
US5126287A (en) * 1990-06-07 1992-06-30 Mcnc Self-aligned electron emitter fabrication method and devices formed thereby
FR2663462B1 (fr) * 1990-06-13 1992-09-11 Commissariat Energie Atomique Source d'electrons a cathodes emissives a micropointes.
US5141459A (en) * 1990-07-18 1992-08-25 International Business Machines Corporation Structures and processes for fabricating field emission cathodes
US5334908A (en) * 1990-07-18 1994-08-02 International Business Machines Corporation Structures and processes for fabricating field emission cathode tips using secondary cusp
DE69027611T2 (de) * 1990-07-18 1997-01-23 Ibm Herstellungsverfahren und struktur einer integrierten vakuum-mikroelektronischen vorrichtung
US5203731A (en) * 1990-07-18 1993-04-20 International Business Machines Corporation Process and structure of an integrated vacuum microelectronic device
US5163328A (en) * 1990-08-06 1992-11-17 Colin Electronics Co., Ltd. Miniature pressure sensor and pressure sensor arrays
US5148078A (en) * 1990-08-29 1992-09-15 Motorola, Inc. Field emission device employing a concentric post
US5461280A (en) * 1990-08-29 1995-10-24 Motorola Field emission device employing photon-enhanced electron emission
US5156705A (en) * 1990-09-10 1992-10-20 Motorola, Inc. Non-homogeneous multi-elemental electron emitter
US5157309A (en) * 1990-09-13 1992-10-20 Motorola Inc. Cold-cathode field emission device employing a current source means
US5136764A (en) * 1990-09-27 1992-08-11 Motorola, Inc. Method for forming a field emission device
US5281890A (en) * 1990-10-30 1994-01-25 Motorola, Inc. Field emission device having a central anode
US5218273A (en) * 1991-01-25 1993-06-08 Motorola, Inc. Multi-function field emission device
JP2626276B2 (ja) * 1991-02-06 1997-07-02 双葉電子工業株式会社 電子放出素子
JP2719239B2 (ja) * 1991-02-08 1998-02-25 工業技術院長 電界放出素子
US5312514A (en) * 1991-11-07 1994-05-17 Microelectronics And Computer Technology Corporation Method of making a field emitter device using randomly located nuclei as an etch mask
JP3116398B2 (ja) * 1991-03-13 2000-12-11 ソニー株式会社 平面型電子放出素子の製造方法及び平面型電子放出素子
US5245248A (en) * 1991-04-09 1993-09-14 Northeastern University Micro-emitter-based low-contact-force interconnection device
US5220725A (en) * 1991-04-09 1993-06-22 Northeastern University Micro-emitter-based low-contact-force interconnection device
US5660570A (en) * 1991-04-09 1997-08-26 Northeastern University Micro emitter based low contact force interconnection device
DE69223088T2 (de) * 1991-06-10 1998-03-05 Fujitsu Ltd Apparat zur Musterüberprüfung und Elektronenstrahlgerät
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5211707A (en) * 1991-07-11 1993-05-18 Gte Laboratories Incorporated Semiconductor metal composite field emission cathodes
US5138237A (en) * 1991-08-20 1992-08-11 Motorola, Inc. Field emission electron device employing a modulatable diamond semiconductor emitter
US5399238A (en) * 1991-11-07 1995-03-21 Microelectronics And Computer Technology Corporation Method of making field emission tips using physical vapor deposition of random nuclei as etch mask
US5536193A (en) * 1991-11-07 1996-07-16 Microelectronics And Computer Technology Corporation Method of making wide band gap field emitter
US5199918A (en) * 1991-11-07 1993-04-06 Microelectronics And Computer Technology Corporation Method of forming field emitter device with diamond emission tips
US5397428A (en) * 1991-12-20 1995-03-14 The University Of North Carolina At Chapel Hill Nucleation enhancement for chemical vapor deposition of diamond
JPH05182609A (ja) * 1991-12-27 1993-07-23 Sharp Corp 画像表示装置
US5318918A (en) * 1991-12-31 1994-06-07 Texas Instruments Incorporated Method of making an array of electron emitters
US5252833A (en) * 1992-02-05 1993-10-12 Motorola, Inc. Electron source for depletion mode electron emission apparatus
US5371431A (en) * 1992-03-04 1994-12-06 Mcnc Vertical microelectronic field emission devices including elongate vertical pillars having resistive bottom portions
US6127773A (en) * 1992-03-16 2000-10-03 Si Diamond Technology, Inc. Amorphic diamond film flat field emission cathode
US5686791A (en) * 1992-03-16 1997-11-11 Microelectronics And Computer Technology Corp. Amorphic diamond film flat field emission cathode
US5449970A (en) * 1992-03-16 1995-09-12 Microelectronics And Computer Technology Corporation Diode structure flat panel display
US5543684A (en) 1992-03-16 1996-08-06 Microelectronics And Computer Technology Corporation Flat panel display based on diamond thin films
US5675216A (en) * 1992-03-16 1997-10-07 Microelectronics And Computer Technololgy Corp. Amorphic diamond film flat field emission cathode
US5374868A (en) * 1992-09-11 1994-12-20 Micron Display Technology, Inc. Method for formation of a trench accessible cold-cathode field emission device
KR960009127B1 (en) * 1993-01-06 1996-07-13 Samsung Display Devices Co Ltd Silicon field emission emitter and the manufacturing method
US5584739A (en) * 1993-02-10 1996-12-17 Futaba Denshi Kogyo K.K Field emission element and process for manufacturing same
JPH08507643A (ja) * 1993-03-11 1996-08-13 フェド．コーポレイション エミッタ先端構造体及び該エミッタ先端構造体を備える電界放出装置並びにその製造方法
US5903098A (en) * 1993-03-11 1999-05-11 Fed Corporation Field emission display device having multiplicity of through conductive vias and a backside connector
US5534743A (en) * 1993-03-11 1996-07-09 Fed Corporation Field emission display devices, and field emission electron beam source and isolation structure components therefor
US5561339A (en) * 1993-03-11 1996-10-01 Fed Corporation Field emission array magnetic sensor devices
JPH07111868B2 (ja) * 1993-04-13 1995-11-29 日本電気株式会社 電界放出冷陰極素子
US5564959A (en) * 1993-09-08 1996-10-15 Silicon Video Corporation Use of charged-particle tracks in fabricating gated electron-emitting devices
US5462467A (en) * 1993-09-08 1995-10-31 Silicon Video Corporation Fabrication of filamentary field-emission device, including self-aligned gate
US5559389A (en) * 1993-09-08 1996-09-24 Silicon Video Corporation Electron-emitting devices having variously constituted electron-emissive elements, including cones or pedestals
WO1995012835A1 (en) * 1993-11-04 1995-05-11 Microelectronics And Computer Technology Corporation Methods for fabricating flat panel display systems and components
US5445550A (en) * 1993-12-22 1995-08-29 Xie; Chenggang Lateral field emitter device and method of manufacturing same
US5583393A (en) * 1994-03-24 1996-12-10 Fed Corporation Selectively shaped field emission electron beam source, and phosphor array for use therewith
US5608283A (en) * 1994-06-29 1997-03-04 Candescent Technologies Corporation Electron-emitting devices utilizing electron-emissive particles which typically contain carbon
US5607335A (en) * 1994-06-29 1997-03-04 Silicon Video Corporation Fabrication of electron-emitting structures using charged-particle tracks and removal of emitter material
US5629583A (en) * 1994-07-25 1997-05-13 Fed Corporation Flat panel display assembly comprising photoformed spacer structure, and method of making the same
EP0776493A4 (en) * 1994-08-15 1999-01-07 Fed Corp COMPACT BODY FIELD EMISSION DISPLAY DEVICE AND DISPLAY PANEL TO BE USED THEREFORE
US5496200A (en) * 1994-09-14 1996-03-05 United Microelectronics Corporation Sealed vacuum electronic devices
KR100366694B1 (ko) * 1995-03-28 2003-03-12 삼성에스디아이 주식회사 다중팁전계방출소자의그제조방법
US5621272A (en) * 1995-05-30 1997-04-15 Texas Instruments Incorporated Field emission device with over-etched gate dielectric
US5589728A (en) * 1995-05-30 1996-12-31 Texas Instruments Incorporated Field emission device with lattice vacancy post-supported gate
US5828288A (en) * 1995-08-24 1998-10-27 Fed Corporation Pedestal edge emitter and non-linear current limiters for field emitter displays and other electron source applications
US5688158A (en) * 1995-08-24 1997-11-18 Fed Corporation Planarizing process for field emitter displays and other electron source applications
US5844351A (en) * 1995-08-24 1998-12-01 Fed Corporation Field emitter device, and veil process for THR fabrication thereof
US5632664A (en) * 1995-09-28 1997-05-27 Texas Instruments Incorporated Field emission device cathode and method of fabrication
US5693235A (en) * 1995-12-04 1997-12-02 Industrial Technology Research Institute Methods for manufacturing cold cathode arrays
US5727978A (en) * 1995-12-19 1998-03-17 Advanced Micro Devices, Inc. Method of forming electron beam emitting tungsten filament
US5766446A (en) * 1996-03-05 1998-06-16 Candescent Technologies Corporation Electrochemical removal of material, particularly excess emitter material in electron-emitting device
US5893967A (en) * 1996-03-05 1999-04-13 Candescent Technologies Corporation Impedance-assisted electrochemical removal of material, particularly excess emitter material in electron-emitting device
US5865659A (en) * 1996-06-07 1999-02-02 Candescent Technologies Corporation Fabrication of gated electron-emitting device utilizing distributed particles to define gate openings and utilizing spacer material to control spacing between gate layer and electron-emissive elements
US5865657A (en) * 1996-06-07 1999-02-02 Candescent Technologies Corporation Fabrication of gated electron-emitting device utilizing distributed particles to form gate openings typically beveled and/or combined with lift-off or electrochemical removal of excess emitter material
US5755944A (en) * 1996-06-07 1998-05-26 Candescent Technologies Corporation Formation of layer having openings produced by utilizing particles deposited under influence of electric field
US6187603B1 (en) 1996-06-07 2001-02-13 Candescent Technologies Corporation Fabrication of gated electron-emitting devices utilizing distributed particles to define gate openings, typically in combination with lift-off of excess emitter material
US5780960A (en) * 1996-12-18 1998-07-14 Texas Instruments Incorporated Micro-machined field emission microtips
US5828163A (en) * 1997-01-13 1998-10-27 Fed Corporation Field emitter device with a current limiter structure
US6120674A (en) * 1997-06-30 2000-09-19 Candescent Technologies Corporation Electrochemical removal of material in electron-emitting device
US6010918A (en) * 1998-02-10 2000-01-04 Fed Corporation Gate electrode structure for field emission devices and method of making
JP3553791B2 (ja) * 1998-04-03 2004-08-11 株式会社ルネサステクノロジ 接続装置およびその製造方法、検査装置並びに半導体素子の製造方法
US6391670B1 (en) 1999-04-29 2002-05-21 Micron Technology, Inc. Method of forming a self-aligned field extraction grid
US6566804B1 (en) * 1999-09-07 2003-05-20 Motorola, Inc. Field emission device and method of operation
FR2818797B1 (fr) * 2000-12-22 2003-06-06 Pixtech Sa Procede de fabrication d'une cathode a grille d'extraction et grille de focalisation alignees
US6833232B2 (en) 2001-12-20 2004-12-21 Dongbu Electronics Co., Ltd. Micro-pattern forming method for semiconductor device
US6963160B2 (en) 2001-12-26 2005-11-08 Trepton Research Group, Inc. Gated electron emitter having supported gate
US8048789B2 (en) * 2005-04-26 2011-11-01 Northwestern University Mesoscale pyramids, arrays and methods of preparation
US11948769B2 (en) * 2022-01-12 2024-04-02 Applied Physics Technologies, Inc. Monolithic heater for thermionic electron cathode

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3475664A (en) * 1965-06-30 1969-10-28 Texas Instruments Inc Ambient atmosphere isolated semiconductor devices
US3506506A (en) * 1967-07-14 1970-04-14 Ibm Capacitor defect isolation
US3531857A (en) * 1967-07-26 1970-10-06 Hitachi Ltd Method of manufacturing substrate for semiconductor integrated circuit
US3755704A (en) * 1970-02-06 1973-08-28 Stanford Research Inst Field emission cathode structures and devices utilizing such structures
US3700510A (en) * 1970-03-09 1972-10-24 Hughes Aircraft Co Masking techniques for use in fabricating microelectronic components
US3665241A (en) * 1970-07-13 1972-05-23 Stanford Research Inst Field ionizer and field emission cathode structures and methods of production

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172631A (ja) * 1986-01-24 1987-07-29 コミツサリア　タ　レネルジ−　アトミ−ク カソ−ドルミネツセンス型表示手段の製造方法
JPS63237340A (ja) * 1987-03-26 1988-10-03 Canon Inc 表示装置
JPH04505073A (ja) * 1989-08-14 1992-09-03 ヒューズ・エアクラフト・カンパニー フィールドエミッタアレイの製造用の自己整列ゲート方法
JPH0684454A (ja) * 1992-02-14 1994-03-25 Micron Technol Inc 化学・機械研磨法を用いた冷陰極エミッタ先端部の周囲にセルフアライン型のゲート構造体を形成する方法
US5696028A (en) * 1992-02-14 1997-12-09 Micron Technology, Inc. Method to form an insulative barrier useful in field emission displays for reducing surface leakage
US5831378A (en) * 1992-02-14 1998-11-03 Micron Technology, Inc. Insulative barrier useful in field emission displays for reducing surface leakage
US6066507A (en) * 1992-02-14 2000-05-23 Micron Technology, Inc. Method to form an insulative barrier useful in field emission displays for reducing surface leakage
US5653619A (en) * 1992-03-02 1997-08-05 Micron Technology, Inc. Method to form self-aligned gate structures and focus rings
JPH06275189A (ja) * 1993-03-10 1994-09-30 Micron Technol Inc セルフアラインゲート構造および集束リングの形成法
US6022256A (en) * 1996-11-06 2000-02-08 Micron Display Technology, Inc. Field emission display and method of making same
US6181060B1 (en) 1996-11-06 2001-01-30 Micron Technology, Inc. Field emission display with plural dielectric layers

Also Published As

Publication number Publication date
USB453031I5 (ja) 1976-03-16
NL7403950A (ja) 1974-09-24
DE2413942A1 (de) 1974-09-26
DE2413942C3 (de) 1979-10-04
US3998678A (en) 1976-12-21
JPS5325632B2 (ja) 1978-07-27
DE2413942B2 (de) 1979-02-15

Similar Documents

Publication Publication Date Title
AR201758A1 (ja)
AU476761B2 (ja)
JPS5325632B2 (ja)
AR201235Q (ja)
AR201231Q (ja)
AU474593B2 (ja)
AU474511B2 (ja)
AU474838B2 (ja)
AU471343B2 (ja)
AU465453B2 (ja)
AU465434B2 (ja)
AU450229B2 (ja)
AU476714B2 (ja)
AR201229Q (ja)
AU472848B2 (ja)
AU476696B2 (ja)
AU466283B2 (ja)
AU477823B2 (ja)
AU447540B2 (ja)
AU471461B2 (ja)
AR200885A1 (ja)
AU477824B2 (ja)
AU476873B1 (ja)
AR210729A1 (ja)
AU461342B2 (ja)