JPH1194756A - Substrate inspecting apparatus - Google Patents

Substrate inspecting apparatus

Info

Publication number
JPH1194756A
JPH1194756A JP25855997A JP25855997A JPH1194756A JP H1194756 A JPH1194756 A JP H1194756A JP 25855997 A JP25855997 A JP 25855997A JP 25855997 A JP25855997 A JP 25855997A JP H1194756 A JPH1194756 A JP H1194756A
Authority
JP
Japan
Prior art keywords
substrate
observation
inspected
observation unit
macro
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25855997A
Other languages
Japanese (ja)
Other versions
JP3944285B2 (en
Inventor
Ikuzo Nakamura
郁三 中村
Hiroyuki Okahira
裕幸 岡平
Akimasa Morita
晃正 森田
Junichi Ono
順一 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Priority to JP25855997A priority Critical patent/JP3944285B2/en
Publication of JPH1194756A publication Critical patent/JPH1194756A/en
Application granted granted Critical
Publication of JP3944285B2 publication Critical patent/JP3944285B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a substrate inspecting apparatus capable of efficiently inspecting the flaw of a substrate to be inspected with high accuracy and capable of being achieved in miniaturization. SOLUTION: The observation unit support part 5 arranged so as to straddle the fixed holder 2 holding a substrate 3 to be inspected is provided so as to be movable on the surface 3 to be inspected in a Y-axis direction. An observation unit 6 having a micro-observation unit 9 provided with an indexing luminaire 8 for micro-observation and a macro-luminaire 10 for macro- observation is provided to the observation unit support part 5 so as to be movable in the X-axis direction crossing the Y-axis direction of the observation unit support part 5 on the surface of the substrate 3 to be inspected at a right angle. In this case, by the movement of the observation unit support part 5 along the Y-axis direction on the surface of the substrate 3 to be inspected and the movement of the observation unit 6 in the X-axis direction crossing the moving direction of the observation unit support part 5 on the surface 3 to be inspected of the observation unit 6 at a right angle, the macro- observation by the macro-luminaire 10 and the micro-observation by the micro- observation unit 9 provided with the indexing luminaire 8 are performed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、例えば、液晶ディ
スプレイ(LCD)のガラス基板などの欠陥検査に用い
られる基板検査装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate inspection apparatus used for inspecting defects such as a glass substrate of a liquid crystal display (LCD).

【0002】[0002]

【従来の技術】従来、LCDに用いられるガラス基板の
欠陥検査は、ガラス基板表面に照明光を当て、その反射
光の光学的変化から基板表面の傷などの欠陥部分を観察
するマクロ観察と、マクロ観察で検出された欠陥部分を
拡大して観察するミクロ観察を切り替えて可能にしたも
のがある。
2. Description of the Related Art Conventionally, a defect inspection of a glass substrate used for an LCD is performed by irradiating a glass substrate surface with illumination light, and observing a defect portion such as a scratch on the substrate surface from an optical change of reflected light; There is a technique in which micro observation for enlarging and observing a defective portion detected by macro observation is switched.

【0003】具体的には、特開平5−322783号公
報に開示されるように、X、Y方向に水平移動可能にし
たX−Yステージに対応させてマクロ観察系とミクロ観
察系を設け、X−Yステージ上に被検査基板を載置した
状態から、X−YステージをX、Y方向の2次元方向に
移動して被検査基板の検査部位をマクロ観察系またはミ
クロ観察系の観察領域に位置させることで、被検査基板
面の欠陥部分に対するマクロ観察またはミクロ観察を可
能にしたものがある。
[0003] Specifically, as disclosed in Japanese Patent Application Laid-Open No. 5-322784, a macro observation system and a micro observation system are provided corresponding to an XY stage capable of moving horizontally in the X and Y directions. The XY stage is moved in the two-dimensional X and Y directions from the state where the substrate to be inspected is placed on the XY stage, and the inspection region of the substrate to be inspected is observed in a macro observation system or a micro observation system. In some cases, macro observation or micro observation of a defect portion on the surface of a substrate to be inspected is made possible by positioning the substrate on the inspection target.

【0004】[0004]

【発明が解決しようとする課題】ところで、最近、LC
Dの大型化にともないガラス基板のサイズは、ますます
大型化の傾向にあり、このため、このような大型サイズ
のガラス基板の欠陥検査において、上述したようなX−
YステージをX、Y方向の2次元方向に水平移動するよ
うにしたものでは、基板面積の4倍もの移動範囲が必要
となり、基板サイズの大型化とともに、装置の大型化を
免れない。また、ガラス基板上の欠陥部分を特定する照
明は、基板全面をカバーするためX−Yステージの中心
付近に位置せざるをえないことから、照明は、観察者か
ら遠く離れることとなり、微小な傷に対する目視による
検査がますます困難になっている。
Incidentally, recently, LC
As the size of the glass substrate becomes larger, the size of the glass substrate tends to become larger and larger.
In the case where the Y stage is horizontally moved in the two-dimensional directions of the X and Y directions, a movement range as large as four times the substrate area is required, and the increase in the size of the substrate and the size of the apparatus are unavoidable. In addition, since the illumination for identifying the defective portion on the glass substrate must be located near the center of the XY stage to cover the entire surface of the substrate, the illumination will be far away from the observer, and will be minute. Visual inspection of wounds is becoming increasingly difficult.

【0005】本発明は、上記事情に鑑みてなされたもの
で、被検査基板について精度の高い欠陥検査を効率よく
行うことができ、しかも小型化を実現できる基板検査装
置を提供することを目的とする。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a board inspection apparatus capable of efficiently performing a highly accurate defect inspection on a board to be inspected and realizing miniaturization. I do.

【0006】[0006]

【課題を解決するための手段】請求項1記載の発明は、
被検査基板を保持する固定された被検査基板保持手段
と、この被検査基板保持手段を跨ぐように配置されると
ともに、前記被検査基板面上の一方向に沿って移動可能
に設けられた観察ユニット支持手段と、この観察ユニッ
ト支持手段に、前記被検査基板面上での前記観察ユニッ
ト支持手段の移動方向と直交する方向に移動可能に設け
られたマクロ観察系とミクロ観察系を有する観察ユニッ
トとを具備し、前記観察ユニット支持手段の前記被検査
基板面上の一方向に沿った移動と前記観察ユニットの前
記被検査基板面上の前記観察ユニット支持手段の移動方
向と直交する方向の移動により、前記観察ユニットによ
るマクロ観察またはミクロ観察を可能にしている。
According to the first aspect of the present invention,
A fixed substrate-to-be-inspected holding means for holding the substrate-to-be-inspected, and an observation device arranged so as to straddle the substrate-to-be-inspected and movably provided along one direction on the surface of the substrate to be inspected. An observation unit having a macro observation system and a micro observation system which are provided on the inspection unit support means so as to be movable in a direction orthogonal to the moving direction of the observation unit support means on the substrate to be inspected. Movement of the observation unit support means in one direction on the inspection target substrate surface and movement of the observation unit on the inspection target substrate surface in a direction orthogonal to the movement direction of the observation unit support means. This enables macro observation or micro observation by the observation unit.

【0007】請求項2記載の発明は、請求項1記載にお
いて、前記観察ユニットは、前記被検査基板面を部分的
に照明するスポット照明を有するマクロ観察系と、指標
用照明および該指標用照明範囲に基づいて観察軸位置が
設定される対物レンズを含むミクロ観察系を有してい
る。
According to a second aspect of the present invention, in the first aspect, the observation unit includes a macro observation system having spot illumination for partially illuminating the surface of the substrate to be inspected, illumination for the index, and illumination for the index. It has a micro observation system including an objective lens whose observation axis position is set based on the range.

【0008】請求項3記載の発明は、請求項2記載にお
いて、観察ユニット支持手段は、前記観察ユニットの移
動方向に沿って配置されるとともに、前記被検査基板を
透過されるライン照明を一体に設けている。
According to a third aspect of the present invention, in the second aspect, the observation unit supporting means is arranged along a moving direction of the observation unit, and integrates line illumination transmitted through the substrate to be inspected. Provided.

【0009】この結果、請求項1記載の発明によれば、
被検査基板保持手段を固定して観察ユニット支持手段の
被検査基板面上の一方向に沿った移動と観察ユニットの
被検査基板面上の観察ユニット支持手段の移動方向と直
交する方向の移動により、観察ユニットを被検査基板面
上のいずれの位置にも移動させることができるようにし
たので、被検査基板保持手段を被検査基板面積とほぼ同
じ大きさに止めることができる。
As a result, according to the first aspect of the present invention,
By fixing the substrate holding means to be inspected and moving the observation unit support means in one direction on the surface of the substrate to be inspected and moving the observation unit in a direction orthogonal to the moving direction of the observation unit support means on the surface of the substrate to be inspected. Since the observation unit can be moved to any position on the surface of the substrate to be inspected, the substrate holding means to be inspected can be kept almost the same size as the area of the substrate to be inspected.

【0010】請求項2記載の発明によれば、被検査基板
面上で観察ユニットを移動させながら、被検査基板面を
部分的に照明するスポット照明によりマクロ観察を行う
ようになるので、狭いスポット照明の範囲において集中
して精度の高い欠陥検査を実現できる。
According to the second aspect of the present invention, the macro observation is performed by spot illumination for partially illuminating the inspection target substrate surface while moving the observation unit on the inspection target substrate surface. Highly accurate defect inspection can be realized concentrated in the range of illumination.

【0011】請求項3記載の発明によれば、被検査基板
を透過されるライン照明に沿って対物レンズによるミク
ロ観察を行うようになるので、眩しさが大幅に低減で
き、精度の高い欠陥検査を実現できる。
According to the third aspect of the present invention, the microscopic observation by the objective lens is performed along the line illumination transmitted through the substrate to be inspected, so that glare can be greatly reduced and a highly accurate defect inspection can be performed. Can be realized.

【0012】[0012]

【発明の実施の形態】以下、本発明の一実施の形態を図
面に従い説明する。図1乃至図3は、本発明の一実施の
形態が適用される基板検査装置の概略構成を示してい
る。図において、1は装置本体で、この装置本体1上に
は、被検査基板保持手段としてホルダ2を固定して設け
ている。このホルダ2は、LCDに用いられるガラス基
板のような大型の被検査基板3を載置保持するもので、
周縁部に沿って複数の基板押さえ部材201を配置し、
これら基板押さえ部材201によりホルダ2上の被検査
基板3の位置決めをするとともに、脱落しないように吸
着保持可能にしている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings. 1 to 3 show a schematic configuration of a substrate inspection apparatus to which an embodiment of the present invention is applied. In the drawing, reference numeral 1 denotes an apparatus main body, on which a holder 2 is fixedly provided as a substrate to be inspected holding means. This holder 2 holds and mounts a large substrate 3 to be inspected such as a glass substrate used for an LCD.
A plurality of substrate pressing members 201 are arranged along the peripheral edge,
The substrate pressing member 201 positions the substrate 3 to be inspected on the holder 2 and allows the substrate 3 to be suction-held so as not to fall off.

【0013】装置本体1上には、図3に示すようにホル
ダ2の両側縁に沿って一対のガイドレール4、4を平行
に配置している。また、ホルダ2上方には、このホルダ
2を跨ぐように観察ユニット支持部5を配置し、この観
察ユニット支持部5をガイドレール4に沿って被検査基
板3面上の図示Y軸方向に移動可能に設けている。
As shown in FIG. 3, a pair of guide rails 4 are arranged in parallel on the main body 1 along both side edges of the holder 2. An observation unit support 5 is disposed above the holder 2 so as to straddle the holder 2, and the observation unit support 5 is moved along the guide rail 4 in the illustrated Y-axis direction on the surface of the substrate 3 to be inspected. It is provided as possible.

【0014】観察ユニット支持部5には、観察ユニット
6が観察ユニット支持部5の移動方向(Y方向)と直交
する図示X軸方向に移動可能に支持されている。また、
観察ユニット支持部5には、観察ユニットの移動ライン
に対向するように透過ライン照明7が一体に設けられて
いる。この透過ライン照明7は、ホルダ2下方を通過す
る支持部5の裏板に図示X軸方向に沿って配置され、被
検査基板3の下方より透過する直線状の透過照明を行う
もので、観察ユニット支持部5とともに、図示Y軸方向
に移動可能になっている。
The observation unit 6 is supported by the observation unit support 5 so as to be movable in the X-axis direction shown in the drawing, which is orthogonal to the moving direction (Y direction) of the observation unit support 5. Also,
A transmission line illumination 7 is provided integrally with the observation unit support section 5 so as to face the movement line of the observation unit. The transmission line illumination 7 is disposed on the back plate of the support portion 5 passing below the holder 2 along the X-axis direction in the drawing, and performs linear transmission illumination transmitted from below the substrate 3 to be inspected. Together with the unit supporting portion 5, it is movable in the illustrated Y-axis direction.

【0015】ここで、透過ライン照明7は、例えば、図
4に示すように光源部71と中実のガラスロッド72を
有するもので、光源部71よりガラスロッド72の端部
に入射した光をガラスロッド72中を全反射伝送すると
ともに、ガラスロッド72の背部に沿って塗布加工され
た白色縞73により拡散させ、ガラスロッド72のレン
ズ作用によりライン状の光を射出するようにしたもので
ある。この透過ライン照明は、上記のものに限られるも
のでなく、蛍光灯などによるライン照明であってもよ
い。
Here, the transmission line illumination 7 has, for example, a light source 71 and a solid glass rod 72 as shown in FIG. 4, and transmits light incident on the end of the glass rod 72 from the light source 71. Along with the total reflection transmission in the glass rod 72, the light is diffused by white stripes 73 applied along the back of the glass rod 72, and linear light is emitted by the lens action of the glass rod 72. . The transmission line illumination is not limited to the above, and may be line illumination using a fluorescent lamp or the like.

【0016】観察ユニット6は、ミクロ観察用の指標用
照明8を設けたミクロ観察ユニット9とマクロ観察用の
マクロ照明10を有している。指標用照明8は、光学的
に集光されたスポット光を被検査基板3表面上の欠陥部
に投光するものである。このスポット光による被検査基
板3表面の反射光は、マクロ照明10による反射光より
明るくなっており、マクロ照明10によるマクロ観察中
でも目視観察できるようになっている。また、ミクロ観
察ユニット9は、対物レンズ91と接眼レンズ92およ
び図示しない落射照明を有する顕微鏡機能を備え、対物
レンズ91を介して被検査基板3表面の像を接眼レンズ
92により観察できるようになっている。また、ミクロ
観察ユニット9には、三眼鏡筒を介してTVカメラ93
が取り付けられており、目視によるミクロ観察が不要な
場合には、直筒を介してTVカメラ93のみを取り付け
ることもできる。このTVカメラ93は、対物レンズ9
1より得られる被検査基板3表面の観察像を撮像してT
Vモニタ12に表示するようにしている。
The observation unit 6 has a micro observation unit 9 provided with an index illumination 8 for micro observation and a macro illumination 10 for macro observation. The indicator illumination 8 projects the optically condensed spot light onto a defect on the surface of the substrate 3 to be inspected. The light reflected by the spot light on the surface of the substrate 3 to be inspected is brighter than the light reflected by the macro illumination 10, and can be visually observed even during macro observation by the macro illumination 10. Further, the micro observation unit 9 has an objective lens 91, an eyepiece lens 92, and a microscope function having an epi-illumination (not shown) so that an image on the surface of the substrate 3 to be inspected can be observed by the eyepiece lens 92 via the objective lens 91. ing. The micro observation unit 9 has a TV camera 93 through a trinocular tube.
Is attached, and when visual micro observation is not required, only the TV camera 93 can be attached via a straight tube. This TV camera 93 has an objective lens 9
1. Observe the observation image of the surface of the inspection target substrate 3 obtained from
It is displayed on the V monitor 12.

【0017】マクロ照明10は、マクロ観察に用いられ
るもので、ホルダ2上の被検査基板3表面の一部分をマ
クロ照明光101で照射するようにしている。また、こ
のマクロ照明10は、被検査基板3表面に対する照明角
度を、マクロ観察に最適な角度に調整できるようになっ
ている。
The macro illumination 10 is used for macro observation, and irradiates a part of the surface of the substrate 3 on the holder 2 with the macro illumination light 101. The macro illumination 10 can adjust an illumination angle with respect to the surface of the substrate 3 to be inspected to an optimum angle for macro observation.

【0018】なお、装置本体1には、観察ユニット支持
部5のY軸方向の位置座標を検出するYスケール13を
設け、観察ユニット支持部5には、観察ユニット6のX
方向の位置座標を検出するXスケール14を設けてい
る。また、制御部11は、Yスケール13およびXスケ
ール14の位置座標の管理や観察ユニット支持部5およ
び観察ユニット6の移動制御なども行うもので、指標用
照明8の光軸と対物レンズ91の光軸との間隔X0 を予
め記憶していて、指標用照明8のスポット光を被検査基
板3上の欠陥部に位置させた状態で所定の指示を与える
ことで、Yスケール13およびXスケール14のデータ
から欠陥部の位置座標を求めて、各欠陥部の位置座標を
記録するとともに、この位置座標と指標用照明8の光軸
と対物レンズ91の光軸との間隔データに基づいて、指
標用照明8で指定された欠陥部にミクロ観察ユニット9
の対物レンズ91の光軸が合致するるように観察ユニッ
ト支持部5および観察ユニット6を移動制御するように
している。
The apparatus main body 1 is provided with a Y scale 13 for detecting the position coordinates of the observation unit support 5 in the Y-axis direction.
An X scale 14 for detecting position coordinates in the direction is provided. The control unit 11 also manages the position coordinates of the Y scale 13 and the X scale 14, and controls the movement of the observation unit support unit 5 and the observation unit 6, and controls the optical axis of the indicator illumination 8 and the objective lens 91. The distance X0 from the optical axis is stored in advance, and a predetermined instruction is given in a state where the spot light of the indicator light 8 is located at a defect portion on the substrate 3 to be inspected. The position coordinates of each defective part are obtained from the data of the above, and the position coordinates of each defective part are recorded. Based on the position coordinates, the distance data between the optical axis of the indicator illumination 8 and the optical axis of the objective lens 91, the index is calculated. Micro-observation unit 9 at the defect designated by
The movement of the observation unit support 5 and the observation unit 6 is controlled so that the optical axes of the objective lenses 91 coincide with each other.

【0019】次に、以上のように構成した実施の形態の
動作を説明する。まず、被検査基板表面のマクロ観察を
行う場合、観察ユニット支持部5を図1に示す初期位置
に後退させた後、ホルダ2上に被検査基板3を供給し、
この状態で、基板押さえ部材201により被検査基板3
を位置決めするとともに、脱落しないように吸着保持
し、この状態から欠陥検査を開始する。
Next, the operation of the embodiment configured as described above will be described. First, when performing macro observation of the surface of a substrate to be inspected, the observation unit supporting portion 5 is retracted to the initial position shown in FIG.
In this state, the substrate 3 to be inspected is
Is positioned and suction-held so as not to fall off, and a defect inspection is started from this state.

【0020】次に、観察ユニット6のマクロ照明10を
点灯し、ホルダ2上の被検査基板3表面上にマクロ照明
光101を照射する。そして、この状態から、図3に示
すように観察ユニット6を観察ユニット支持部5に沿っ
てX軸方向に直線移動させ、さらに図2の実線から二点
鎖線に示すように観察ユニット支持部5をガイドレール
4に沿ってY軸方向に直線移動させて、マクロ照明光1
01によりホルダ2の被検査基板3上をラスタスキャン
し、被検査基板3全面について検査者の目視による傷や
汚れなどの欠陥検査が行われる。この場合、被検査基板
3上のマクロ照明光101は、最適なマクロ観察を行う
ことができる角度に調整されている。
Next, the macro illumination 10 of the observation unit 6 is turned on, and the surface of the substrate 3 to be inspected on the holder 2 is irradiated with macro illumination light 101. Then, from this state, the observation unit 6 is linearly moved in the X-axis direction along the observation unit support part 5 as shown in FIG. 3, and further, as shown by the two-dot chain line from the solid line in FIG. Is linearly moved along the guide rail 4 in the Y-axis direction to obtain the macro illumination light 1.
In step 01, the surface of the substrate 3 to be inspected in the holder 2 is raster-scanned, and a defect inspection such as a scratch or dirt is visually performed by the inspector on the entire surface of the substrate 3 to be inspected. In this case, the angle of the macro illumination light 101 on the inspection target substrate 3 is adjusted to an angle at which an optimal macro observation can be performed.

【0021】このようなマクロ観察において、検査者が
被検査基板3上のマクロ照明光101中で欠陥部を認識
した場合、検査者は、観察ユニット6をX、Y軸方向に
移動させ、被検査基板3上の欠陥部に指標用照明8のス
ポット光を位置させる。
In such a macro observation, when the inspector recognizes a defective portion in the macro illumination light 101 on the substrate 3 to be inspected, the inspector moves the observation unit 6 in the X and Y axis directions, and The spotlight of the indicator illumination 8 is positioned at a defect on the inspection substrate 3.

【0022】次いで、検査者より制御部11に所定の指
示を与えると、制御部11で、Yスケール13およびX
スケール14のデータに基づいて被検査基板3上の欠陥
部の位置座標が求められ、続けて、この位置座標データ
と予め記憶している指標用照明8の光軸と対物レンズ9
1の光軸との間隔データを用いて、観察ユニット支持部
5とミクロ観察ユニット9を移動制御し、検出した被検
査基板3上の欠陥部に対物レンズ91の光軸を合致させ
る。
Next, when the examiner gives a predetermined instruction to the control unit 11, the control unit 11 controls the Y scale 13 and the X scale.
The position coordinates of the defect on the substrate 3 to be inspected are obtained based on the data of the scale 14, and then the position coordinate data, the optical axis of the indicator illumination 8 and the objective lens 9 stored in advance.
The observation unit supporting unit 5 and the micro observation unit 9 are controlled to move using the data on the distance from the optical axis 1 and the optical axis of the objective lens 91 coincides with the detected defect on the substrate 3 to be inspected.

【0023】これにより、対物レンズ91の視野中心に
指定した欠陥部が持ち込まれ、対物レンズ91を介して
欠陥部のミクロ観察ができるとともに、同時に、TVカ
メラ93で、対物レンズ91より得られる被検査基板3
表面の欠陥部を撮像し、TVモニタ12上でミクロ観察
できる。この場合、欠陥の種類に応じて落射照明または
透過照明に切換えてミクロ観察を行うことができる。
As a result, the designated defect is brought into the center of the field of view of the objective lens 91, and the microscopic observation of the defect can be performed through the objective lens 91. Inspection board 3
An image of a defect on the surface can be taken and microscopically observed on the TV monitor 12. In this case, it is possible to perform micro-observation by switching to epi-illumination or transmitted illumination according to the type of defect.

【0024】その後、再び、検査者によりマクロ観察を
指示すると、被検査基板3上の欠陥部は、マクロ照明光
101の照射範囲に戻され、マクロ観察による欠陥確認
が行える。そして、続けて、マクロ照明光101による
他の欠陥部観察する場合には、上述した操作を繰り返す
ことになる。
Thereafter, when the inspector again instructs macro observation, the defect portion on the substrate 3 to be inspected is returned to the irradiation range of the macro illumination light 101, and the defect can be confirmed by macro observation. Then, when observing another defective portion with the macro illumination light 101, the above-described operation is repeated.

【0025】その後、マクロ観察が終了したならば、観
察者は、再び制御部11に所定の指示を与え、観察ユニ
ット支持部5を初期位置に復帰させ、ホルダ2から検査
済み被検査基板3を取り除き、新たな被検査基板3に交
換するようになる。
Thereafter, when the macro observation is completed, the observer gives a predetermined instruction to the control unit 11 again, returns the observation unit support unit 5 to the initial position, and removes the inspected inspected substrate 3 from the holder 2. The substrate 3 is removed and replaced with a new substrate 3 to be inspected.

【0026】なお、上述では、マクロ照明10によりホ
ルダ2の被検査基板3上の一部分を照明しながら、マク
ロ観察を行い、被検査基板3上に欠陥を認識すると、ミ
クロ観察に移行するような場合を述べたが、マクロ照明
10によるマクロ観察のみを行う場合は、観察ユニット
支持部5を初期位置に後退させ、ホルダ2上に被検査基
板3を載置保持した状態から、マクロ照明10を点灯し
て、ホルダ2上の被検査基板3表面に部分的なマクロ照
明光101を照射する。そして、この状態から、観察ユ
ニット6を観察ユニット支持部5に沿ってX軸方向に直
線移動させ、さらに観察ユニット支持部5をガイドレー
ル4に沿ってY軸方向に直線移動させながら、マクロ照
明光101によりホルダ2の被検査基板3上をラスタス
キャンすることで、被検査基板3全面について検査者の
目視による欠陥検査が行われるようになる。この場合、
マクロ照明光101中における欠陥部に指標用照明8の
スポット光を合わせ、欠陥部の位置座標を制御部11の
メモリに記憶することができる。
In the above description, macro observation is performed while illuminating a part of the holder 2 on the substrate 3 to be inspected by the macro illumination 10, and when a defect is recognized on the substrate 3 to be inspected, the operation shifts to micro observation. As described above, when performing only macro observation using the macro illumination 10, the observation unit support unit 5 is retracted to the initial position, and the macro illumination 10 is switched from the state in which the inspection target substrate 3 is placed and held on the holder 2. When turned on, the surface of the substrate 3 to be inspected on the holder 2 is irradiated with partial macro illumination light 101. From this state, the macro illumination is performed while the observation unit 6 is linearly moved in the X-axis direction along the observation unit support portion 5 and the observation unit support portion 5 is linearly moved in the Y-axis direction along the guide rail 4. By performing a raster scan on the substrate 3 to be inspected of the holder 2 with the light 101, the inspector visually inspects the entire surface of the substrate 3 for defect inspection. in this case,
The spot light of the index illumination 8 is matched with the defective part in the macro illumination light 101, and the position coordinates of the defective part can be stored in the memory of the control unit 11.

【0027】また、制御部11のメモリに記憶された各
欠陥部についてミクロ観察ユニット9によるミクロ観察
を行う場合は、観察ユニット支持部5を初期位置に後退
させた状態から、透過ライン照明7を点灯させ、ホルダ
2の下方からX軸方向にライン状の透過照明を照射させ
る。そして、この状態で、制御部11にてメモリに記憶
された各欠陥部の座標データおよび指標用照明8の光軸
と対物レンズ91の光軸との間隔データに基づいてミク
ロ観察ユニット9の対物レンズ91を透過ライン照明7
に沿ってX軸方向に直線移動させ、さらに観察ユニット
支持部5をガイドレール4に沿ってY軸方向に直線移動
させることで、指定された各欠陥部に対物レンズ91の
光軸を自動的に合わせ顕微鏡によるミクロ観察ができる
と同時に、TVカメラ93により、被検査基板3表面が
撮像され、TVモニタ12に表示される。この場合も、
欠陥部の種類に応じて透過照明に代えて落射照明に切換
えることができる。
When performing micro-observation by the micro-observation unit 9 for each defect portion stored in the memory of the control unit 11, the transmission line illumination 7 is turned on from the state where the observation unit support unit 5 is retracted to the initial position. The light is turned on, and linear transmission illumination is irradiated from below the holder 2 in the X-axis direction. In this state, the control unit 11 controls the objective of the micro-observation unit 9 based on the coordinate data of each defective part stored in the memory and the interval data between the optical axis of the indicator illumination 8 and the optical axis of the objective lens 91. Lens 91 is transmitted line illumination 7
By moving the observation unit support 5 linearly in the Y-axis direction along the guide rail 4, the optical axis of the objective lens 91 is automatically moved to each designated defect. At the same time, the microscopic observation with the microscope can be performed, and at the same time, the surface of the substrate 3 to be inspected is imaged by the TV camera 93 and displayed on the TV monitor 12. Again,
It is possible to switch to epi-illumination instead of transmitted illumination in accordance with the type of defect.

【0028】従って、このようにすれば被検査基板3を
保持する固定されたホルダ2を跨ぐように配置され、被
検査基板3面上をY軸方向に移動可能に観察ユニット支
持部5を設けるとともに、この観察ユニット支持部5
に、被検査基板3面上での観察ユニット支持部5のY軸
方向と直交するX軸方向に移動可能にミクロ観察用の指
標用照明8を設けたミクロ観察ユニット9とマクロ観察
用のマクロ照明10を有する観察ユニット6を設け、観
察ユニット支持部5の被検査基板3面上のY軸方向に沿
った移動と、観察ユニット6の被検査基板3面上の観察
ユニット支持部5の移動方向と直交するX軸方向の移動
により、マクロ観察用のマクロ照明10によるマクロ観
察または、ミクロ観察用の指標用照明8を設けたミクロ
観察ユニット9によるミクロ観察を行うようにしてい
る。これにより、ホルダ2を固定して観察ユニット支持
部5の被検査基板3面上の一方向に沿った移動と観察ユ
ニット6の被検査基板3面上の観察ユニット支持部5の
移動方向と直交する方向の移動により、観察ユニット6
を被検査基板3面上のいずれの位置にも移動させるよう
にできるので、ホルダ2を被検査基板3面積とほぼ同じ
大きさに止めることができ、装置の小型化を実現できる
とともに、装置の設置面積も大幅に小さくすることがで
きる。
Accordingly, in this case, the observation unit supporting portion 5 is provided so as to straddle the fixed holder 2 holding the substrate 3 to be inspected and is movable on the surface of the substrate 3 to be inspected in the Y-axis direction. Together with the observation unit support 5
A micro observation unit 9 provided with a micro observation index illumination 8 movably in the X axis direction orthogonal to the Y axis direction of the observation unit support 5 on the substrate 3 to be inspected, and a macro observation macro An observation unit 6 having illumination 10 is provided, and the observation unit support 5 moves on the surface of the substrate 3 to be inspected along the Y-axis direction, and the observation unit 6 moves on the surface of the substrate 3. By moving in the X-axis direction orthogonal to the direction, macro observation with macro illumination 10 for macro observation or micro observation with micro observation unit 9 provided with index illumination 8 for micro observation is performed. Thus, the holder 2 is fixed, and the observation unit support 5 moves in one direction on the surface of the substrate 3 to be inspected, and the observation unit 6 moves in a direction orthogonal to the movement direction of the observation unit support 5 on the surface of the substrate 3 to be inspected. Movement of the observation unit 6
Can be moved to any position on the surface of the substrate 3 to be inspected, so that the holder 2 can be kept almost the same size as the area of the substrate 3 to be inspected. The installation area can be significantly reduced.

【0029】また、被検査基板3面上で観察ユニット6
を移動させながら、被検査基板3面を部分的に照明する
マクロ照明10のマクロ照明光101の範囲でマクロ観
察を行うようになるので、限定された狭いスポット照明
光101の範囲で集中してマクロ観察を行うことがで
き、精度の高いマクロ観察による欠陥検査を実現できる
とともに、マクロ照明光101の近傍にミクロ観察ユニ
ットが配置されていることから、検査者は同じ場所にて
接眼レンズ92を覗くことが可能となり、欠陥部の状態
を直接目視で確認しながら顕微鏡によるミクロ観察がで
き、欠陥部の状態を正確に把握することができる。
The observation unit 6 is placed on the surface of the substrate 3 to be inspected.
Is moved, the macro observation is performed in the range of the macro illumination light 101 of the macro illumination 10 that partially illuminates the surface of the substrate 3 to be inspected. Since macro observation can be performed, defect inspection by high-precision macro observation can be realized, and since the micro observation unit is arranged near the macro illumination light 101, the inspector can mount the eyepiece 92 in the same place. It is possible to peep, and it is possible to perform microscopic observation with a microscope while directly confirming the state of the defective part with the naked eye, and to accurately grasp the state of the defective part.

【0030】さらに、透過ライン照明7による被検査基
板3を透過されるライン照明に沿ってミクロ観察ユニッ
ト9の対物レンズ91によるミクロ観察を行うようにし
たので、ミクロ観察のため被検査基板3全面が透過光に
より光るものと比べ、眩しさが大幅に低減でき、ライン
照明の範囲において精度の高いミクロ観察による欠陥検
査を実現できる。また、透過ライン照明7を観察ユニッ
ト支持部5に一体に設けてあるので、ランブハウスおよ
び集光レンズなどからなる透過照明ユニットを対物レン
ズの移動に追従させるものに比べて追従駆動機構が不要
になり、装置の小形化を得られるとともに、故障の少な
い透過照明を提供することができる。
Further, since the microscopic observation by the objective lens 91 of the microscopic observation unit 9 is performed along the line illumination transmitted through the substrate 3 to be inspected by the transmission line illumination 7, the entire surface of the substrate 3 to be inspected for microscopic observation. The glare can be greatly reduced as compared with the case of shining by transmitted light, and a highly accurate defect inspection by micro observation can be realized in the range of line illumination. In addition, since the transmission line illumination 7 is provided integrally with the observation unit support portion 5, a follow-up driving mechanism is not required as compared with a configuration in which a transmission illumination unit including a Rambehouse and a condenser lens follows the movement of the objective lens. In addition, the size of the apparatus can be reduced, and transmitted illumination with less failure can be provided.

【0031】[0031]

【発明の効果】以上述べたように本発明によれば、被検
査基板保持手段を固定して観察ユニット支持手段の被検
査基板面上の一方向に沿った移動と観察ユニットの被検
査基板面上の観察ユニット支持手段の移動方向と直交す
る方向の移動により、観察ユニットを被検査基板面上の
いずれの位置にも移動させることができるようにしたの
で、被検査基板保持手段を被検査基板面積とほぼ同じ大
きさに止めることができ、装置の小型化を実現できると
ともに、装置の設置面積も大幅に小さくすることができ
る。
As described above, according to the present invention, the substrate holding means to be inspected is fixed and the observation unit supporting means is moved in one direction on the surface of the substrate to be inspected, and the surface of the substrate to be inspected is moved by the observation unit. Since the observation unit can be moved to any position on the surface of the substrate to be inspected by moving the observation unit supporting means in the direction perpendicular to the moving direction of the observation unit supporting means, The size of the device can be reduced to approximately the same size, and the size of the device can be reduced, and the installation area of the device can be significantly reduced.

【0032】被検査基板面上で観察ユニットを移動させ
ながら、被検査基板面を部分的に照明するマクロ照明に
よりマクロ観察を行うようになるので、限定された狭い
スポット照明の範囲において集中してマクロ観察を行う
ようになり、精度の高い欠陥検査を実現できる。
Since the macro observation is performed by the macro illumination for partially illuminating the inspection target substrate surface while moving the observation unit on the inspection target substrate surface, the macro observation is performed in a limited narrow spot illumination range. Macro observation is performed, and highly accurate defect inspection can be realized.

【0033】被検査基板を透過されるライン照明に沿っ
て対物レンズによるミクロ観察を行うようになるので、
被検査基板全面が透過光により光るものと比べ、眩しさ
が大幅に低減できるとともに、ライン照明を観察支持部
材に一体に設けることにより、追従駆動機構が不要にな
る。
Since microscopic observation with an objective lens is performed along line illumination transmitted through the substrate to be inspected,
The glare can be greatly reduced as compared with the case where the entire surface of the substrate to be inspected shines by the transmitted light, and the follow-up drive mechanism becomes unnecessary by providing the line illumination integrally with the observation support member.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施の形態の概略構成を示す図。FIG. 1 is a diagram showing a schematic configuration of an embodiment of the present invention.

【図2】一実施の形態の概略構成を示す側面図。FIG. 2 is a side view showing a schematic configuration of the embodiment.

【図3】一実施の形態の概略構成を示す上面図。FIG. 3 is a top view illustrating a schematic configuration of an embodiment.

【図4】一実施の形態に用いられる透過ライン照明の概
略構成を示す図。
FIG. 4 is a diagram showing a schematic configuration of transmission line illumination used in one embodiment.

【符号の説明】[Explanation of symbols]

1…装置本体、 2…ホルダ、 201…基板押さえ部材、 3…被検査基板、 4…ガイドレール、 5…観察ユニット支持部、 6…観察ユニット、 7…透過ライン照明、 71…光源部、 72…ガラスロッド、 73…白色縞、 8…指標用照明、 9…ミクロ観察ユニット、 91…対物レンズ、 92…接眼レンズ、 93…TVカメラ、 10…マクロ照明、 101…マクロ照明光、 11…制御部、 12…TVモニタ、 13…Yスケール、 14…Xスケール。 DESCRIPTION OF SYMBOLS 1 ... Device main body, 2 ... Holder, 201 ... Board holding member, 3 ... Inspection board, 4 ... Guide rail, 5 ... Observation unit support part, 6 ... Observation unit, 7 ... Transmission line illumination, 71 ... Light source part, 72 ... glass rod, 73 ... white stripes, 8 ... indicator illumination, 9 ... micro observation unit, 91 ... objective lens, 92 ... eyepiece, 93 ... TV camera, 10 ... macro illumination, 101 ... macro illumination light, 11 ... control Part, 12 ... TV monitor, 13 ... Y scale, 14 ... X scale.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小野 順一 東京都渋谷区幡ヶ谷2丁目43番2号 オリ ンパス光学工業株式会社内 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Junichi Ono 2-43-2 Hatagaya, Shibuya-ku, Tokyo Inside Olympus Optical Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 被検査基板を保持する固定された被検査
基板保持手段と、 この被検査基板保持手段を跨ぐように配置されるととも
に、前記被検査基板面上の一方向に沿って移動可能に設
けられた観察ユニット支持手段と、 この観察ユニット支持手段に、前記被検査基板面上での
前記観察ユニット支持手段の移動方向と直交する方向に
移動可能に設けられたマクロ観察系とミクロ観察系を有
する観察ユニットと、 を具備し、 前記観察ユニット支持手段の前記被検査基板面上の一方
向に沿った移動と前記観察ユニットの前記被検査基板面
上の前記観察ユニット支持手段の移動方向と直交する方
向の移動により、前記観察ユニットによるマクロ観察ま
たはミクロ観察を可能にしたことを特徴とする基板検査
装置。
1. A fixed substrate-to-be-inspected holding means for holding a substrate-to-be-inspected, and arranged so as to straddle the substrate-to-be-inspected and capable of moving along one direction on the surface of the substrate to be inspected. A macro observation system and a micro observation system which are provided in the observation unit support means so as to be movable in a direction orthogonal to a moving direction of the observation unit support means on the substrate to be inspected. An observation unit having a system; and a movement of the observation unit support means in one direction on the surface of the substrate to be inspected and a moving direction of the observation unit support means on the surface of the substrate to be inspected. A substrate inspection apparatus, wherein a macro observation or a micro observation by the observation unit is enabled by a movement in a direction perpendicular to the substrate inspection apparatus.
【請求項2】 前記観察ユニットは、前記被検査基板面
を部分的に照明するマクロ照明を有するマクロ観察系
と、指標用照明および該指標用照明範囲に基づいて観察
軸位置が設定される対物レンズを含むミクロ観察系を有
することを特徴とする請求項1記載の基板検査装置。
2. An observation unit comprising: a macro observation system having macro illumination for partially illuminating the surface of the substrate to be inspected; an illumination for an index; and an object for setting an observation axis position based on the illumination range for the index. The substrate inspection apparatus according to claim 1, further comprising a micro observation system including a lens.
【請求項3】 観察ユニット支持手段は、前記観察ユニ
ットの移動方向に沿って配置されるとともに、前記被検
査基板を透過されるライン照明を一体に設けたことを特
徴とする請求項1記載の基板検査装置。
3. The observation unit supporting means according to claim 1, wherein the observation unit support means is arranged along a moving direction of the observation unit, and is integrally provided with line illumination transmitted through the substrate to be inspected. Board inspection equipment.
JP25855997A 1997-09-24 1997-09-24 Board inspection equipment Expired - Fee Related JP3944285B2 (en)

Priority Applications (1)

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JP25855997A JP3944285B2 (en) 1997-09-24 1997-09-24 Board inspection equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25855997A JP3944285B2 (en) 1997-09-24 1997-09-24 Board inspection equipment

Publications (2)

Publication Number Publication Date
JPH1194756A true JPH1194756A (en) 1999-04-09
JP3944285B2 JP3944285B2 (en) 2007-07-11

Family

ID=17321920

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP3944285B2 (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264255A (en) * 2000-03-21 2001-09-26 Olympus Optical Co Ltd Macro lighting system
JP2002098641A (en) * 2000-09-21 2002-04-05 Olympus Optical Co Ltd Large substrate inspecting apparatus
WO2003040711A1 (en) * 2001-11-05 2003-05-15 Olympus Corporation Substrate inspecting device
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